JP6952845B2 - 回路基板、パッケージおよびそれらの製造方法 - Google Patents
回路基板、パッケージおよびそれらの製造方法 Download PDFInfo
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Description
前記プレートを硬化するステップであって、その硬化時に、前記プレートの少なくとも1つの領域が、次のように変形される、すなわち、前記領域内に前記少なくとも導電性の層が窪みを有するように変形される、ステップと、
前記プレートの前記第1の面と反対側の第2の面に凹部を形成するステップと、
導体路パターンを好ましくは少なくとも前記窪み内において得るために前記少なくとも導電性の層をパターニングするステップであって、前記窪みと前記凹部とが互いに対向しており、前記凹部内にベアダイを装着して、回路基板の前記第1の面に配置された前記少なくとも導電性の材料からなる前記少なくとも導電性の層、特に前記導体路パターンと電気的に接触させることができる、ステップと、
前記窪みを、好ましくは前記窪みの縁部まで、第2の絶縁材料で充填するステップと、
を含むことによって解決される。
前記プレートを硬化するステップであって、その硬化時に、前記少なくとも導電性の層が前記プレートの少なくとも1つの領域内に窪みを有するように、前記プレートの少なくとも1つの領域が変形される、ステップと、
前記プレートの前記第1の面と反対側の第2の面に凹部を形成するステップと、
少なくとも1つのベアダイを前記凹部内に装着するステップと、
導体路パターンを得るために前記少なくとも導電性の層をパターニングするステップであって、前記窪みと前記凹部とが互いに対向しており、前記少なくとも1つのベアダイが前記少なくとも導電性の層と電気的に接触し、前記導体路パターンが好ましくは少なくとも前記窪み内に配置されており、特に前記少なくとも1つのベアダイが前記導体路パターンと電気的に接触する、ステップと、
前記窪みを第2の絶縁材料で充填するステップと、
を含むことによって解決される。
Claims (15)
- ベアダイを収容するための回路基板(1,100)であって、
前記回路基板(1,100)が第1及び第2の層(2,3)を含み、
前記回路基板(1,100)の前記第1の層(2)が導電性であって前記回路基板(1,100)の第1の面(7)に配置されており、
前記第1及び第2の層(2,3)が中間空間(4)を規定し、前記中間空間(4)が第1の絶縁材料(5)で充填されており、前記回路基板(1,100)は、前記回路基板(1,100)の前記第1の層(2)が、変形領域(6,600)内に窪み(8)を有するように変形された少なくとも1つの変形領域(6,600)を有し、
前記回路基板(1,100)の前記第1の層(2)が、少なくとも前記窪み(8)内に導体路パターン(9)を有し、
前記窪み(8)が第2の絶縁材料で充填されており、
前記回路基板(1,100)の前記第1の面(7)と反対側の第2の面(11,110)が、前記変形領域(6,600)内に凹部(12)を有し、
前記凹部(12)は、前記凹部(12)内にベアダイ(13)を装着して、その際に回路基板(1,100)の前記第1の面(7)に配置された前記第1の層(2)に電気的に接触させることができるように形成されている、
回路基板(1,100)。 - 前記第2の層(3)が、少なくとも熱伝導性および/又は導電性の材料からなる、請求項1に記載の回路基板。
- 前記第1の絶縁材料(5)が、熱変形可能なプラスチックである、請求項1又は2記載の回路基板。
- 前記第2の絶縁材料(10)が、樹脂又はプリプレグ材料である、請求項1乃至3のいずれか1項に記載の回路基板。
- 前記凹部(12)の底部(15)が、少なくとも部分的に、前記回路基板(1,100)の前記第1の面(7)に配置された前記第1の層(2)によって形成されている、請求項1乃至4のいずれか1項に記載の回路基板。
- ベアダイ(13)を収容するための請求項1乃至5のいずれか1項に記載の回路基板(1,100)の製造方法であって、
プレートを準備するステップであって、前記プレートが第1及び第2の層(2,3)を含み、前記プレートの前記第1の層(2)が、導電性であって、前記プレートの第1の面(7)に配置されており、前記第1及び第2の層(2,3)が中間空間(4)を規定し、前記中間空間(4)が第1の絶縁材料(5)で充填されている、ステップと、
前記プレートを硬化するステップであって、その硬化時に、前記プレートの少なくとも1つの領域(6,600)が次のように変形される、すなわち、前記領域(6,600)内に前記第1の層(2)が窪み(8)を有するように変形される、ステップと、
前記プレート(7)の前記第1の面(7)と反対側の第2の面(11,110)に凹部(12)を形成するステップと、
導体路パターン(9)を少なくとも前記窪み(8)内において得るために前記第1の層(2)をパターニングするステップであって、前記窪み(8)と前記凹部(12)とが互いに対向しており、前記凹部(12)内にベアダイ(13)を装着して、前記回路基板(1,100)の前記第1の面(7)に配置された前記第1の層(2)に電気的に接触させることができる、ステップと、
前記窪み(8)を第2の絶縁材料(10)で充填するステップと、
を含む方法。 - 前記硬化および変形は、プレス加工によって行われる、請求項6に記載の方法。
- 前記凹部(12)の形成が、深フライス加工又は打ち抜き加工によって行われる、請求項6又は7に記載の方法。
- 請求項1乃至5のいずれか1項に記載の回路基板と、少なくとも1つのベアダイ(13)とを含むパッケージであって、
前記ベアダイ(13)が、前記凹部(12)に装着されて前記第1の層(2)と電気的に接触している、パッケージ。 - 前記凹部(12)が、少なくとも部分的に第3の絶縁材料(16)で充填されている、請求項9記載のパッケージ。
- 前記ベアダイ(13)が複数の電気接続部(17)を有し、
前記電気接続部(17)が前記導体路パターン(9)に接触している、請求項9又は10に記載のパッケージ。 - 前記回路基板(1,100)の前記第1の面(7)とは反対の方を向いているベアダイ(13)の面に取り付けられている付加的な回路基板(18)が設けられている、請求項9乃至11のいずれか1項に記載のパッケージ。
- パッケージを製造する方法であって、
プレートを準備するステップであって、前記プレートが2つの層(2,3)を含み、前記プレートの両層(2,3)のうち少なくとも1つが、少なくとも導電性であって、前記プレートの第1の面(7)に配置されており、前記両層(2,3)が中間空間(4)を規定し、前記中間空間(4)が第1の絶縁材料(5)で充填される、ステップと、
前記プレートを硬化するステップであって、その硬化時に、前記少なくとも導電性の層(2)が前記プレートの少なくとも1つの領域(6,600)内に窪み(8)を有するように、前記プレートの少なくとも1つの領域(6,600)が変形する、ステップと、
前記プレートの前記第1の面(7)と反対側の第2の面(11,110)に凹部(12)を形成するステップと、
少なくとも1つのベアダイ(13)を前記凹部(12)内に装着するステップと、
導体路パターン(9)を得るために、前記少なくとも導電性の層(2)をパターニングするステップであって、前記窪み(8)と前記凹部(12)とが互いに対向しており、前記少なくとも1つのベアダイ(13)が前記少なくとも導電性の層(2)と電気的に接触し、前記導体路パターン(9)が少なくとも前記窪み(8)内に配置されており、前記少なくとも1つのベアダイ(13)が前記導体路パターン(9)と電気的に接触する、ステップと、
前記窪み(8)を第2の絶縁材料(10)で充填するステップと、
を含む方法。 - まず、前記準備されたプレートに前記凹部(12)が、打ち抜き加工により形成され、その後、装着されたプレートを得るために前記凹部(12)内に前記少なくとも1つのベアダイ(13)が装着され、その後、前記装着されたプレートが、硬化され、その硬化時に変形させられ、その硬化および変形は、前記少なくとも導電性の層(2)が前記凹部(12)と反対側の位置に前記窪み(8)を有する前記少なくとも1つの変形領域(6,600)を得るために、プレス加工によって行われ、前記変形の際に前記少なくとも1つのベアダイ(13)が前記第1の絶縁材料(5)で絶縁されるか、
又は、
まず、前記準備されたプレートが、硬化され、その硬化時に変形させられ、その硬化および変形は、前記少なくとも導電性の層(2)が前記窪み(8)を有する前記少なくとも1つの変形領域(6,600)を得るために、プレス加工によって行われ、その後、前記凹部(12)が、前記プレートの第1の面(7)と反対側の第2の面(11,110)において前記窪み(8)と反対側の位置に、深フライス加工により形成され、その後、前記少なくとも1つのベアダイ(13)が前記少なくとも導電性の層(2)に電気的に接触するように、前記少なくとも1つのベアダイ(13)が前記凹部(12)内に装着される、請求項13記載の方法。 - 請求項1乃至5のいずれか1項に記載の回路基板および/又は請求項9乃至12のいずれか1項に記載のパッケージを備えるコンバータ。
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