JP6911546B2 - 希薄薬液製造装置 - Google Patents
希薄薬液製造装置 Download PDFInfo
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- JP6911546B2 JP6911546B2 JP2017112012A JP2017112012A JP6911546B2 JP 6911546 B2 JP6911546 B2 JP 6911546B2 JP 2017112012 A JP2017112012 A JP 2017112012A JP 2017112012 A JP2017112012 A JP 2017112012A JP 6911546 B2 JP6911546 B2 JP 6911546B2
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- chemical solution
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- ultrapure water
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- 239000000126 substance Substances 0.000 title claims description 159
- 238000004519 manufacturing process Methods 0.000 title claims description 40
- 239000000243 solution Substances 0.000 claims description 140
- 239000007788 liquid Substances 0.000 claims description 56
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 52
- 239000012498 ultrapure water Substances 0.000 claims description 52
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 33
- 239000011550 stock solution Substances 0.000 claims description 23
- 229910021529 ammonia Inorganic materials 0.000 claims description 16
- 230000000740 bleeding effect Effects 0.000 claims description 16
- 238000002347 injection Methods 0.000 description 20
- 239000007924 injection Substances 0.000 description 20
- 238000003860 storage Methods 0.000 description 15
- 239000007789 gas Substances 0.000 description 12
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 10
- 235000011114 ammonium hydroxide Nutrition 0.000 description 10
- 238000007865 diluting Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010926 purge Methods 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004813 Perfluoroalkoxy alkane Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000520 microinjection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/06—Details or accessories
- B67D7/74—Devices for mixing two or more different liquids to be transferred
- B67D7/743—Devices for mixing two or more different liquids to be transferred electrically or electro-mechanically operated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/02—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
- B67D7/0227—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants by an ejection plunger
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/06—Details or accessories
- B67D7/36—Arrangements of flow- or pressure-control valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/06—Details or accessories
- B67D7/58—Arrangements of pumps
- B67D7/70—Arrangements of pumps of two or more pumps in series or parallel
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
-
- C11D2111/22—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
Description
図1及び図2に示す希薄薬液製造装置1を用い、薬液Sとして29%の濃度のアンモニア溶液を原液として用いて希薄アンモニア水S1を製造した。
図6及び図7に示す従来の希薄薬液製造装置を用い、薬液Sとして29%の濃度のアンモニア溶液を原液として用いて希薄薬液S1として希薄アンモニア水を製造した。
2 薬液貯槽(原液タンク)
3 薬液供給管(第2の配管)
4 プランジャポンプ
5 薬液供給手段
6 パージガス供給手段
7 第一の圧力計(圧力計測手段)
8 ドレン配管
9 エア抜きバルブ(エア抜き機構)
10 第二の圧力計(圧力計測手段)
11 注入点
12 超純水流路(第1の配管)
13 ボアスルー継手
14 エルボ部材
W 超純水(第1の液体)
S 薬液(第2の液体:アンモニア溶液)
S1 アンモニア希薄薬液(希薄薬液)
Claims (4)
- 第1の液体に対して第2の液体を添加することで該第2の液体の希薄薬液を製造する希薄薬液の製造装置であって、
前記第1の液体を流す第1の配管と、
前記第2の液体を貯留する原液タンクと、
前記原液タンクと前記第1の配管とを接続する第2の配管と、
前記前記第1の配管内に前記第2の配管を通じて前記第2の液体を添加するプランジャポンプとを備え、
前記原液タンクには加圧手段が付設されており、
前記第2の配管の先端が前記第1の配管の径方向の略中央の位置にまで挿入した状態で接続されており、
前記プランジャポンプにエア抜き機構が付設されている、希薄薬液製造装置。 - 前記第2の配管の前記プランジャポンプより下流側に圧力計測手段が設けられているとともに、前記圧力計測手段は前記エア抜き機構を制御する制御手段に接続しており、前記制御手段は、前記圧力計測手段の測定圧力が所定の値以下となったら、前記エア抜き機構を作動するように制御する、請求項1に記載の希薄薬液製造装置。
- 前記原液タンクに該原液タンク内の圧力を計測する圧力計測手段が設けられている、請求項1又は2に記載の希薄薬液製造装置。
- 前記第1の液体が超純水であり、前記第2の液体がアンモニアである、請求項1〜3のいずれかに記載の希薄薬液製造装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017112012A JP6911546B2 (ja) | 2017-06-06 | 2017-06-06 | 希薄薬液製造装置 |
CN201780091241.3A CN110663100B (zh) | 2017-06-06 | 2017-08-17 | 稀药液制造装置 |
PCT/JP2017/029509 WO2018225278A1 (ja) | 2017-06-06 | 2017-08-17 | 希薄薬液製造装置 |
US16/618,813 US11667515B2 (en) | 2017-06-06 | 2017-08-17 | Dilute chemical solution production device |
KR1020197031525A KR102427577B1 (ko) | 2017-06-06 | 2017-08-17 | 희박 약액 제조 장치 |
TW106128057A TWI745416B (zh) | 2017-06-06 | 2017-08-18 | 稀薄藥液製造裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017112012A JP6911546B2 (ja) | 2017-06-06 | 2017-06-06 | 希薄薬液製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018206998A JP2018206998A (ja) | 2018-12-27 |
JP6911546B2 true JP6911546B2 (ja) | 2021-07-28 |
Family
ID=64565771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017112012A Active JP6911546B2 (ja) | 2017-06-06 | 2017-06-06 | 希薄薬液製造装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11667515B2 (ja) |
JP (1) | JP6911546B2 (ja) |
KR (1) | KR102427577B1 (ja) |
CN (1) | CN110663100B (ja) |
TW (1) | TWI745416B (ja) |
WO (1) | WO2018225278A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6835126B2 (ja) * | 2019-03-28 | 2021-02-24 | 栗田工業株式会社 | 希薄薬液製造装置 |
JP6973534B2 (ja) * | 2020-03-10 | 2021-12-01 | 栗田工業株式会社 | 希薄薬液供給装置 |
JP6863498B1 (ja) | 2020-03-13 | 2021-04-21 | 栗田工業株式会社 | 希薄溶液製造装置 |
CN112525660A (zh) * | 2020-11-12 | 2021-03-19 | 核工业北京化工冶金研究院 | 基于微量体积的自动取样留样及浓度配比装置 |
KR102552181B1 (ko) * | 2021-07-06 | 2023-07-05 | (주)포스코이앤씨 | 유입유량의 균등분배 수처리장치 |
JP2022176057A (ja) * | 2022-01-11 | 2022-11-25 | 株式会社西村ケミテック | 薬液供給装置及び薬液供給方法 |
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2017
- 2017-06-06 JP JP2017112012A patent/JP6911546B2/ja active Active
- 2017-08-17 US US16/618,813 patent/US11667515B2/en active Active
- 2017-08-17 KR KR1020197031525A patent/KR102427577B1/ko active IP Right Grant
- 2017-08-17 WO PCT/JP2017/029509 patent/WO2018225278A1/ja active Application Filing
- 2017-08-17 CN CN201780091241.3A patent/CN110663100B/zh active Active
- 2017-08-18 TW TW106128057A patent/TWI745416B/zh active
Also Published As
Publication number | Publication date |
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JP2018206998A (ja) | 2018-12-27 |
US20200131022A1 (en) | 2020-04-30 |
TW201902566A (zh) | 2019-01-16 |
KR102427577B1 (ko) | 2022-07-29 |
KR20200016201A (ko) | 2020-02-14 |
US11667515B2 (en) | 2023-06-06 |
CN110663100A (zh) | 2020-01-07 |
TWI745416B (zh) | 2021-11-11 |
WO2018225278A1 (ja) | 2018-12-13 |
CN110663100B (zh) | 2023-09-05 |
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