JP6876737B2 - 位相反転ブランクマスク及びフォトマスク - Google Patents

位相反転ブランクマスク及びフォトマスク Download PDF

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JP6876737B2
JP6876737B2 JP2019053222A JP2019053222A JP6876737B2 JP 6876737 B2 JP6876737 B2 JP 6876737B2 JP 2019053222 A JP2019053222 A JP 2019053222A JP 2019053222 A JP2019053222 A JP 2019053222A JP 6876737 B2 JP6876737 B2 JP 6876737B2
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film
phase inversion
line
blank mask
phase
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JP2019091097A5 (https=
JP2019091097A (ja
Inventor
基 守 南
基 守 南
▲ちょる▼ 申
▲ちょる▼ 申
李　鍾　華
鍾 華 李
成 ▲みん▼ 徐
成 ▲みん▼ 徐
世 民 金
世 民 金
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エスアンドエス テック カンパニー リミテッド
エスアンドエス テック カンパニー リミテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2019053222A 2016-03-16 2019-03-20 位相反転ブランクマスク及びフォトマスク Active JP6876737B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2016-0031239 2016-03-16
KR20160031239 2016-03-16
KR10-2016-0107117 2016-08-23
KR1020160107117A KR101801101B1 (ko) 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크

Related Parent Applications (1)

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JP2016224972A Division JP6626813B2 (ja) 2016-03-16 2016-11-18 位相反転ブランクマスク及びフォトマスク

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JP2019091097A JP2019091097A (ja) 2019-06-13
JP2019091097A5 JP2019091097A5 (https=) 2019-10-31
JP6876737B2 true JP6876737B2 (ja) 2021-05-26

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JP2019053222A Active JP6876737B2 (ja) 2016-03-16 2019-03-20 位相反転ブランクマスク及びフォトマスク

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JP (1) JP6876737B2 (https=)
KR (1) KR101801101B1 (https=)
TW (1) TWI637231B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102587396B1 (ko) * 2022-08-18 2023-10-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6557381B1 (ja) * 2018-05-08 2019-08-07 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
TWI835695B (zh) 2018-11-30 2024-03-11 日商Ｈｏｙａ股份有限公司 光罩基底、光罩之製造方法及顯示裝置之製造方法
KR102511751B1 (ko) * 2019-11-05 2023-03-21 주식회사 에스앤에스텍 극자외선 리소그래피용 블랭크마스크 및 포토마스크
JP7413092B2 (ja) 2020-03-12 2024-01-15 Hoya株式会社 フォトマスクブランク、フォトマスクブランクの製造方法、フォトマスクの製造方法及び表示装置の製造方法
JP7527992B2 (ja) 2020-03-17 2024-08-05 Hoya株式会社 フォトマスクブランク、フォトマスクの製造方法及び表示装置の製造方法
KR102209617B1 (ko) * 2020-08-26 2021-01-28 에스케이씨 주식회사 블랭크 마스크 및 포토마스크
KR102229123B1 (ko) * 2020-08-31 2021-03-18 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20250053862A (ko) * 2022-08-30 2025-04-22 호야 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 그리고 반도체 장치의 제조 방법
JP2025037316A (ja) * 2023-09-06 2025-03-18 東京エレクトロン株式会社 半導体装置の製造方法、及び基板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4525893B2 (ja) * 2003-10-24 2010-08-18 信越化学工業株式会社 位相シフトマスクブランク、位相シフトマスク及びパターン転写方法
KR102198731B1 (ko) 2008-06-25 2021-01-05 호야 가부시키가이샤 위상 시프트 마스크 블랭크 및 위상 시프트 마스크
JP5313401B2 (ja) * 2010-04-09 2013-10-09 Ｈｏｙａ株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスク
KR101282040B1 (ko) * 2012-07-26 2013-07-04 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토 마스크
JP6101646B2 (ja) * 2013-02-26 2017-03-22 Hoya株式会社 位相シフトマスクブランク及びその製造方法、位相シフトマスク及びその製造方法、並びに表示装置の製造方法
JP6396118B2 (ja) * 2014-08-20 2018-09-26 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102587396B1 (ko) * 2022-08-18 2023-10-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크

Also Published As

Publication number Publication date
TW201802572A (zh) 2018-01-16
JP2019091097A (ja) 2019-06-13
TWI637231B (zh) 2018-10-01
KR101801101B1 (ko) 2017-11-27
KR20170116926A (ko) 2017-10-20

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