KR101801101B1 - 위상반전 블랭크 마스크 및 포토 마스크 - Google Patents

위상반전 블랭크 마스크 및 포토 마스크 Download PDF

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Publication number
KR101801101B1
KR101801101B1 KR1020160107117A KR20160107117A KR101801101B1 KR 101801101 B1 KR101801101 B1 KR 101801101B1 KR 1020160107117 A KR1020160107117 A KR 1020160107117A KR 20160107117 A KR20160107117 A KR 20160107117A KR 101801101 B1 KR101801101 B1 KR 101801101B1
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South Korea
Prior art keywords
film
phase reversal
reversal film
phase
pattern
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Korean (ko)
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KR20170116926A (ko
Inventor
남기수
신철
이종화
서성민
김세민
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주식회사 에스앤에스텍
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Priority to JP2016224972A priority Critical patent/JP6626813B2/ja
Priority to TW105142272A priority patent/TWI637231B/zh
Priority to CN201710066943.8A priority patent/CN107203091B/zh
Publication of KR20170116926A publication Critical patent/KR20170116926A/ko
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Publication of KR101801101B1 publication Critical patent/KR101801101B1/ko
Priority to JP2019053222A priority patent/JP6876737B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/0046—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • H01L21/0337—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020160107117A 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크 Active KR101801101B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016224972A JP6626813B2 (ja) 2016-03-16 2016-11-18 位相反転ブランクマスク及びフォトマスク
TW105142272A TWI637231B (zh) 2016-03-16 2016-12-20 相移底板掩模和光掩模
CN201710066943.8A CN107203091B (zh) 2016-03-16 2017-02-07 相移底板掩模和光掩模
JP2019053222A JP6876737B2 (ja) 2016-03-16 2019-03-20 位相反転ブランクマスク及びフォトマスク

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20160031239 2016-03-16
KR1020160031239 2016-03-16

Related Child Applications (1)

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KR1020170111732A Division KR20180022620A (ko) 2017-09-01 2017-09-01 위상반전 블랭크 마스크 및 포토 마스크

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Publication Number Publication Date
KR20170116926A KR20170116926A (ko) 2017-10-20
KR101801101B1 true KR101801101B1 (ko) 2017-11-27

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KR1020160107117A Active KR101801101B1 (ko) 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크

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JP (1) JP6876737B2 (https=)
KR (1) KR101801101B1 (https=)
TW (1) TWI637231B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200066178A (ko) 2018-11-30 2020-06-09 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116244A (ko) 2020-03-12 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116264A (ko) 2020-03-17 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6557381B1 (ja) * 2018-05-08 2019-08-07 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
KR102511751B1 (ko) * 2019-11-05 2023-03-21 주식회사 에스앤에스텍 극자외선 리소그래피용 블랭크마스크 및 포토마스크
KR102209617B1 (ko) * 2020-08-26 2021-01-28 에스케이씨 주식회사 블랭크 마스크 및 포토마스크
KR102229123B1 (ko) * 2020-08-31 2021-03-18 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102587396B1 (ko) * 2022-08-18 2023-10-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20250053862A (ko) * 2022-08-30 2025-04-22 호야 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 그리고 반도체 장치의 제조 방법
JP2025037316A (ja) * 2023-09-06 2025-03-18 東京エレクトロン株式会社 半導体装置の製造方法、及び基板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175932B2 (ja) 2008-06-25 2013-04-03 Ｈｏｙａ株式会社 位相シフトマスクブランクおよび位相シフトマスク
KR101282040B1 (ko) * 2012-07-26 2013-07-04 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토 마스크

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4525893B2 (ja) * 2003-10-24 2010-08-18 信越化学工業株式会社 位相シフトマスクブランク、位相シフトマスク及びパターン転写方法
JP5313401B2 (ja) * 2010-04-09 2013-10-09 Ｈｏｙａ株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスク
JP6101646B2 (ja) * 2013-02-26 2017-03-22 Hoya株式会社 位相シフトマスクブランク及びその製造方法、位相シフトマスク及びその製造方法、並びに表示装置の製造方法
JP6396118B2 (ja) * 2014-08-20 2018-09-26 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5175932B2 (ja) 2008-06-25 2013-04-03 Ｈｏｙａ株式会社 位相シフトマスクブランクおよび位相シフトマスク
KR101282040B1 (ko) * 2012-07-26 2013-07-04 주식회사 에스앤에스텍 플랫 패널 디스플레이용 위상반전 블랭크 마스크 및 포토 마스크

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200066178A (ko) 2018-11-30 2020-06-09 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20230065208A (ko) 2018-11-30 2023-05-11 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20240017031A (ko) 2018-11-30 2024-02-06 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20240165301A (ko) 2018-11-30 2024-11-22 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116244A (ko) 2020-03-12 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
KR20210116264A (ko) 2020-03-17 2021-09-27 호야 가부시키가이샤 포토마스크 블랭크, 포토마스크의 제조 방법 및 표시 장치의 제조 방법

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Publication number Publication date
TW201802572A (zh) 2018-01-16
JP6876737B2 (ja) 2021-05-26
JP2019091097A (ja) 2019-06-13
TWI637231B (zh) 2018-10-01
KR20170116926A (ko) 2017-10-20

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