TWI637231B - 相移底板掩模和光掩模 - Google Patents

相移底板掩模和光掩模 Download PDF

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Publication number
TWI637231B
TWI637231B TW105142272A TW105142272A TWI637231B TW I637231 B TWI637231 B TW I637231B TW 105142272 A TW105142272 A TW 105142272A TW 105142272 A TW105142272 A TW 105142272A TW I637231 B TWI637231 B TW I637231B
Authority
TW
Taiwan
Prior art keywords
film
phase shift
phase
mask
shifted
Prior art date
Application number
TW105142272A
Other languages
English (en)
Chinese (zh)
Other versions
TW201802572A (zh
Inventor
Kee-Soo Nam
南基守
Cheol Shin
申澈
Jong-Hwa Lee
李鍾華
Sung-Min Seo
徐成旼
Se-Min Kim
金世民
Original Assignee
S&S Tech Co., Ltd.
韓商Ｓ＆Ｓ技術股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by S&S Tech Co., Ltd., 韓商Ｓ＆Ｓ技術股份有限公司 filed Critical S&S Tech Co., Ltd.
Publication of TW201802572A publication Critical patent/TW201802572A/zh
Application granted granted Critical
Publication of TWI637231B publication Critical patent/TWI637231B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4085—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by the processes involved to create the masks

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW105142272A 2016-03-16 2016-12-20 相移底板掩模和光掩模 TWI637231B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2016-0031239 2016-03-16
KR20160031239 2016-03-16
KR10-2016-0107117 2016-08-23
KR1020160107117A KR101801101B1 (ko) 2016-03-16 2016-08-23 위상반전 블랭크 마스크 및 포토 마스크

Publications (2)

Publication Number Publication Date
TW201802572A TW201802572A (zh) 2018-01-16
TWI637231B true TWI637231B (zh) 2018-10-01

Family

ID=60299307

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105142272A TWI637231B (zh) 2016-03-16 2016-12-20 相移底板掩模和光掩模

Country Status (3)

Country Link
JP (1) JP6876737B2 (https=)
KR (1) KR101801101B1 (https=)
TW (1) TWI637231B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6557381B1 (ja) * 2018-05-08 2019-08-07 エスアンドエス テック カンパニー リミテッド 位相反転ブランクマスク及びフォトマスク
TWI835695B (zh) 2018-11-30 2024-03-11 日商Ｈｏｙａ股份有限公司 光罩基底、光罩之製造方法及顯示裝置之製造方法
KR102511751B1 (ko) * 2019-11-05 2023-03-21 주식회사 에스앤에스텍 극자외선 리소그래피용 블랭크마스크 및 포토마스크
JP7413092B2 (ja) 2020-03-12 2024-01-15 Hoya株式会社 フォトマスクブランク、フォトマスクブランクの製造方法、フォトマスクの製造方法及び表示装置の製造方法
JP7527992B2 (ja) 2020-03-17 2024-08-05 Hoya株式会社 フォトマスクブランク、フォトマスクの製造方法及び表示装置の製造方法
KR102209617B1 (ko) * 2020-08-26 2021-01-28 에스케이씨 주식회사 블랭크 마스크 및 포토마스크
KR102229123B1 (ko) * 2020-08-31 2021-03-18 에스케이씨솔믹스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR102587396B1 (ko) * 2022-08-18 2023-10-10 에스케이엔펄스 주식회사 블랭크 마스크 및 이를 이용한 포토마스크
KR20250053862A (ko) * 2022-08-30 2025-04-22 호야 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크 및 그 제조 방법, 그리고 반도체 장치의 제조 방법
JP2025037316A (ja) * 2023-09-06 2025-03-18 東京エレクトロン株式会社 半導体装置の製造方法、及び基板

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200527122A (en) * 2003-10-24 2005-08-16 Shinetsu Chemical Co Phase shift mask blank, phase shift mask, and pattern transfer method
TW201405238A (zh) * 2012-07-26 2014-02-01 Ｓ＆Ｓ技術股份有限公司 用於平面顯示器之相位移位空白光罩及光罩
TW201610559A (zh) * 2010-04-09 2016-03-16 Ｈｏｙａ股份有限公司 相移光罩基底及其製造方法、與相移光罩
JP2016045233A (ja) * 2014-08-20 2016-04-04 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102198731B1 (ko) 2008-06-25 2021-01-05 호야 가부시키가이샤 위상 시프트 마스크 블랭크 및 위상 시프트 마스크
JP6101646B2 (ja) * 2013-02-26 2017-03-22 Hoya株式会社 位相シフトマスクブランク及びその製造方法、位相シフトマスク及びその製造方法、並びに表示装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200527122A (en) * 2003-10-24 2005-08-16 Shinetsu Chemical Co Phase shift mask blank, phase shift mask, and pattern transfer method
TW201610559A (zh) * 2010-04-09 2016-03-16 Ｈｏｙａ股份有限公司 相移光罩基底及其製造方法、與相移光罩
TW201405238A (zh) * 2012-07-26 2014-02-01 Ｓ＆Ｓ技術股份有限公司 用於平面顯示器之相位移位空白光罩及光罩
JP2016045233A (ja) * 2014-08-20 2016-04-04 Hoya株式会社 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法

Also Published As

Publication number Publication date
TW201802572A (zh) 2018-01-16
JP6876737B2 (ja) 2021-05-26
JP2019091097A (ja) 2019-06-13
KR101801101B1 (ko) 2017-11-27
KR20170116926A (ko) 2017-10-20

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