JP6861596B2 - ペリクルフレーム及びペリクル - Google Patents

ペリクルフレーム及びペリクル Download PDF

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Publication number
JP6861596B2
JP6861596B2 JP2017152245A JP2017152245A JP6861596B2 JP 6861596 B2 JP6861596 B2 JP 6861596B2 JP 2017152245 A JP2017152245 A JP 2017152245A JP 2017152245 A JP2017152245 A JP 2017152245A JP 6861596 B2 JP6861596 B2 JP 6861596B2
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JP
Japan
Prior art keywords
pellicle
film
inclined surface
adhesive layer
edge side
Prior art date
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Active
Application number
JP2017152245A
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English (en)
Japanese (ja)
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JP2019032388A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2017152245A priority Critical patent/JP6861596B2/ja
Priority to TW107126974A priority patent/TWI779072B/zh
Priority to TW111132443A priority patent/TWI834264B/zh
Priority to KR1020180091372A priority patent/KR102635619B1/ko
Priority to CN201810891458.9A priority patent/CN109388017A/zh
Publication of JP2019032388A publication Critical patent/JP2019032388A/ja
Application granted granted Critical
Publication of JP6861596B2 publication Critical patent/JP6861596B2/ja
Active legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Packaging Frangible Articles (AREA)
JP2017152245A 2017-08-07 2017-08-07 ペリクルフレーム及びペリクル Active JP6861596B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2017152245A JP6861596B2 (ja) 2017-08-07 2017-08-07 ペリクルフレーム及びペリクル
TW107126974A TWI779072B (zh) 2017-08-07 2018-08-03 防護薄膜組件、貼附有防護薄膜組件之光罩、曝光方法、半導體之製造方法、及顯示器之製造方法
TW111132443A TWI834264B (zh) 2017-08-07 2018-08-03 防護薄膜框架、防護薄膜組件、貼附有防護薄膜組件的光罩、曝光方法、半導體之製造方法、及顯示器之製造方法
KR1020180091372A KR102635619B1 (ko) 2017-08-07 2018-08-06 펠리클 프레임 및 펠리클
CN201810891458.9A CN109388017A (zh) 2017-08-07 2018-08-07 表膜构件框架和表膜构件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017152245A JP6861596B2 (ja) 2017-08-07 2017-08-07 ペリクルフレーム及びペリクル

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020158766A Division JP7063962B2 (ja) 2020-09-23 2020-09-23 ペリクルフレーム及びペリクル

Publications (2)

Publication Number Publication Date
JP2019032388A JP2019032388A (ja) 2019-02-28
JP6861596B2 true JP6861596B2 (ja) 2021-04-21

Family

ID=65367395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017152245A Active JP6861596B2 (ja) 2017-08-07 2017-08-07 ペリクルフレーム及びペリクル

Country Status (4)

Country Link
JP (1) JP6861596B2 (ko)
KR (1) KR102635619B1 (ko)
CN (1) CN109388017A (ko)
TW (1) TWI779072B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220073761A1 (en) * 2019-03-28 2022-03-10 Nippon Steel Stainless Steel Corporation Clear-coated stainless steel sheet
US11454881B2 (en) 2019-07-31 2022-09-27 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle design for mask application
KR20240017642A (ko) 2022-08-01 2024-02-08 주식회사 참그래핀 극자외선 노광공정의 포토마스크 보호용 펠리클 및 그 제조방법
KR20240017447A (ko) 2022-08-01 2024-02-08 주식회사 참그래핀 극자외선 노광공정의 포토마스크 보호용 펠리클 및 그 제조방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09319069A (ja) * 1996-05-29 1997-12-12 Nikon Corp ペリクル光学素子
JP4380910B2 (ja) * 2000-12-14 2009-12-09 信越化学工業株式会社 ペリクル
JP2005308901A (ja) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd ペリクルフレーム及びそれを用いたフォトリソグラフィー用ペリクル
JP4358683B2 (ja) * 2004-05-31 2009-11-04 信越化学工業株式会社 ペリクルフレーム及びフォトリソグラフィー用ペリクル
JP4921184B2 (ja) 2007-01-19 2012-04-25 信越化学工業株式会社 ペリクルフレームへの膜接着剤の塗布方法
TWI537674B (zh) * 2008-09-12 2016-06-11 Asahi Kasei E Materials Corp Mask mask film, mask mask and mask mask the use of the box
JP4870788B2 (ja) * 2009-01-27 2012-02-08 信越化学工業株式会社 リソグラフィー用ペリクル
US8349525B2 (en) * 2009-06-18 2013-01-08 Nikon Corporation Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
JP5152870B2 (ja) * 2009-12-07 2013-02-27 信越化学工業株式会社 リソグラフィ用ペリクル及びその製造方法
JP5189614B2 (ja) * 2010-03-29 2013-04-24 信越化学工業株式会社 ペリクル及びその取り付け方法、並びにペリクル付マスク及びマスク
KR200469200Y1 (ko) * 2010-05-10 2013-09-26 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클 수납 용기
JP5684752B2 (ja) * 2012-03-29 2015-03-18 信越化学工業株式会社 ペリクル収納容器
JP5854511B2 (ja) * 2012-10-16 2016-02-09 信越化学工業株式会社 ペリクルおよびペリクルの貼付け方法
JP6156998B2 (ja) * 2013-10-22 2017-07-05 信越化学工業株式会社 ペリクル
JP6150300B2 (ja) * 2014-04-04 2017-06-21 信越化学工業株式会社 ペリクルの貼り付け部確認方法

Also Published As

Publication number Publication date
KR20190016005A (ko) 2019-02-15
JP2019032388A (ja) 2019-02-28
KR102635619B1 (ko) 2024-02-08
TW202248749A (zh) 2022-12-16
CN109388017A (zh) 2019-02-26
TWI779072B (zh) 2022-10-01
TW201931005A (zh) 2019-08-01

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