JP6833763B2 - エチレン化合物、紫外線吸収剤および樹脂組成物 - Google Patents

エチレン化合物、紫外線吸収剤および樹脂組成物 Download PDF

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JP6833763B2
JP6833763B2 JP2018117942A JP2018117942A JP6833763B2 JP 6833763 B2 JP6833763 B2 JP 6833763B2 JP 2018117942 A JP2018117942 A JP 2018117942A JP 2018117942 A JP2018117942 A JP 2018117942A JP 6833763 B2 JP6833763 B2 JP 6833763B2
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group
resin composition
resin
compound
ethylene compound
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JP2019014707A5 (enrdf_load_stackoverflow
JP2019014707A (ja
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正矩 青木
正矩 青木
愛 松本
愛 松本
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Nippon Shokubai Co Ltd
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Nippon Shokubai Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C321/00—Thiols, sulfides, hydropolysulfides or polysulfides
    • C07C321/24—Thiols, sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C07C321/28—Sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D239/00—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
    • C07D239/02—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
    • C07D239/24—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
    • C07D239/28—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
    • C07D239/46—Two or more oxygen, sulphur or nitrogen atoms
    • C07D239/60—Three or more oxygen or sulfur atoms
    • C07D239/62—Barbituric acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/372—Sulfides, e.g. R-(S)x-R'
    • C08K5/3725—Sulfides, e.g. R-(S)x-R' containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/375—Thiols containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/378—Thiols containing heterocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2018117942A 2017-07-06 2018-06-21 エチレン化合物、紫外線吸収剤および樹脂組成物 Active JP6833763B2 (ja)

Applications Claiming Priority (2)

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JP2017132977 2017-07-06
JP2017132977 2017-07-06

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JP2020087131A Division JP7027483B2 (ja) 2017-07-06 2020-05-19 エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法

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JP2019014707A JP2019014707A (ja) 2019-01-31
JP2019014707A5 JP2019014707A5 (enrdf_load_stackoverflow) 2020-04-09
JP6833763B2 true JP6833763B2 (ja) 2021-02-24

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JP2020087131A Active JP7027483B2 (ja) 2017-07-06 2020-05-19 エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法

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JP (2) JP6833763B2 (enrdf_load_stackoverflow)
KR (1) KR102253364B1 (enrdf_load_stackoverflow)
CN (1) CN110809573B (enrdf_load_stackoverflow)
TW (1) TWI731248B (enrdf_load_stackoverflow)
WO (1) WO2019009093A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019151708A (ja) * 2018-03-01 2019-09-12 株式会社日本触媒 樹脂組成物および光学フィルター

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7231430B2 (ja) * 2019-02-14 2023-03-01 株式会社日本触媒 樹脂組成物、インクおよび光学フィルター
CN116635756A (zh) * 2021-02-03 2023-08-22 三井化学株式会社 光学材料的制造方法、光学材料用聚合性组合物及光学材料
US20240377565A1 (en) * 2021-05-14 2024-11-14 Nippon Sheet Glass Company, Limited Light-absorbing composition, light-absorbing film, method for producing light-absorbing film, and optical filter
JP2023013321A (ja) * 2021-07-15 2023-01-26 東洋インキＳｃホールディングス株式会社 組成物、成形体および塗膜
JP2023128389A (ja) * 2022-03-03 2023-09-14 株式会社日本触媒 ドープ、フィルム、及びフィルムの製造方法
JPWO2023218937A1 (enrdf_load_stackoverflow) * 2022-05-13 2023-11-16
WO2024024442A1 (ja) * 2022-07-25 2024-02-01 株式会社日本触媒 樹脂組成物
WO2024122571A1 (ja) * 2022-12-07 2024-06-13 株式会社日本触媒 樹脂組成物、及びその用途

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GB1348142A (en) * 1970-05-14 1974-03-13 Sandoz Ltd Derivatives of alpha-cyanacrylic acid their production and use as stabilizers for organic materials
US3850960A (en) * 1971-05-04 1974-11-26 Sandoz Ltd Derivatives of alpha-cyanacrylic acid
US4591545A (en) * 1983-05-10 1986-05-27 Dainippon Ink And Chemicals, Inc. Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender
JPH07100792B2 (ja) * 1986-05-13 1995-11-01 三菱化学株式会社 液晶組成物
US4749774A (en) * 1986-12-29 1988-06-07 Eastman Kodak Company Condensation polymer containing the residue of a poly-methine compound and shaped articles produced therefrom
US4994512A (en) * 1989-05-01 1991-02-19 Eastman Kodak Company Poly-methine compounds, condensation polymer having a poly-methine compound admixed therein and shaped articles produced therefrom
US5057594A (en) * 1989-08-17 1991-10-15 Eastman Kodak Company Ultraviolet light-absorbing compounds and sunscreen formulations and polymeric materials containing such compounds or residues thereof
US6576797B1 (en) 1994-03-31 2003-06-10 Ciba Specialty Chemicals Corporation Thioether substituted hydroxybenzophenones and stabilized compositions
JP2000136176A (ja) * 1998-10-28 2000-05-16 Chemiprokasei Kaisha Ltd ポリメチン化合物、その製造方法および用途
JP4612219B2 (ja) * 2000-04-20 2011-01-12 三井化学株式会社 置換芳香族化合物の製造方法
JP2003026942A (ja) 2001-05-11 2003-01-29 Kanegafuchi Chem Ind Co Ltd 樹脂組成物
JP2003043259A (ja) 2001-08-01 2003-02-13 Konica Corp 光学フィルム、偏光板及び表示装置
KR100479405B1 (ko) * 2002-05-24 2005-03-30 주식회사 싸이제닉 신남산 이합체, 그 제조방법 및 퇴행성 뇌질환 치료를위한 그의 용도
WO2009112403A2 (en) * 2008-03-13 2009-09-17 Basf Se Dimeric benzylidene malonates
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JP2010100787A (ja) 2008-10-27 2010-05-06 Fujifilm Corp 紫外線吸収剤およびこれを含む高分子材料
WO2013047411A1 (ja) 2011-09-29 2013-04-04 富士フイルム株式会社 新規なトリアジン誘導体、紫外線吸収剤

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019151708A (ja) * 2018-03-01 2019-09-12 株式会社日本触媒 樹脂組成物および光学フィルター
JP7128633B2 (ja) 2018-03-01 2022-08-31 株式会社日本触媒 樹脂組成物および光学フィルター

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Publication number Publication date
JP2020154320A (ja) 2020-09-24
TW201906813A (zh) 2019-02-16
CN110809573B (zh) 2022-03-08
JP7027483B2 (ja) 2022-03-01
KR102253364B1 (ko) 2021-05-17
CN110809573A (zh) 2020-02-18
TWI731248B (zh) 2021-06-21
WO2019009093A1 (ja) 2019-01-10
KR20190132522A (ko) 2019-11-27
JP2019014707A (ja) 2019-01-31

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