JP2019014707A5 - - Google Patents

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Publication number
JP2019014707A5
JP2019014707A5 JP2018117942A JP2018117942A JP2019014707A5 JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5 JP 2018117942 A JP2018117942 A JP 2018117942A JP 2018117942 A JP2018117942 A JP 2018117942A JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5
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JP
Japan
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group
resin composition
ethylene compound
hydrogen atom
composition according
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JP2018117942A
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English (en)
Japanese (ja)
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JP6833763B2 (ja
JP2019014707A (ja
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Publication of JP2019014707A5 publication Critical patent/JP2019014707A5/ja
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JP2018117942A 2017-07-06 2018-06-21 エチレン化合物、紫外線吸収剤および樹脂組成物 Active JP6833763B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017132977 2017-07-06
JP2017132977 2017-07-06

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020087131A Division JP7027483B2 (ja) 2017-07-06 2020-05-19 エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法

Publications (3)

Publication Number Publication Date
JP2019014707A JP2019014707A (ja) 2019-01-31
JP2019014707A5 true JP2019014707A5 (enrdf_load_stackoverflow) 2020-04-09
JP6833763B2 JP6833763B2 (ja) 2021-02-24

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ID=64949980

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JP2018117942A Active JP6833763B2 (ja) 2017-07-06 2018-06-21 エチレン化合物、紫外線吸収剤および樹脂組成物
JP2020087131A Active JP7027483B2 (ja) 2017-07-06 2020-05-19 エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法

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JP2020087131A Active JP7027483B2 (ja) 2017-07-06 2020-05-19 エチレン化合物の製造方法、樹脂組成物の製造方法、硬化物の製造方法、光学フィルターの製造方法、センサーの製造方法

Country Status (5)

Country Link
JP (2) JP6833763B2 (enrdf_load_stackoverflow)
KR (1) KR102253364B1 (enrdf_load_stackoverflow)
CN (1) CN110809573B (enrdf_load_stackoverflow)
TW (1) TWI731248B (enrdf_load_stackoverflow)
WO (1) WO2019009093A1 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7128633B2 (ja) * 2018-03-01 2022-08-31 株式会社日本触媒 樹脂組成物および光学フィルター
JP7231430B2 (ja) * 2019-02-14 2023-03-01 株式会社日本触媒 樹脂組成物、インクおよび光学フィルター
CN116635756A (zh) * 2021-02-03 2023-08-22 三井化学株式会社 光学材料的制造方法、光学材料用聚合性组合物及光学材料
US20240377565A1 (en) * 2021-05-14 2024-11-14 Nippon Sheet Glass Company, Limited Light-absorbing composition, light-absorbing film, method for producing light-absorbing film, and optical filter
JP2023013321A (ja) * 2021-07-15 2023-01-26 東洋インキScホールディングス株式会社 組成物、成形体および塗膜
JP2023128389A (ja) * 2022-03-03 2023-09-14 株式会社日本触媒 ドープ、フィルム、及びフィルムの製造方法
JPWO2023218937A1 (enrdf_load_stackoverflow) * 2022-05-13 2023-11-16
WO2024024442A1 (ja) * 2022-07-25 2024-02-01 株式会社日本触媒 樹脂組成物
WO2024122571A1 (ja) * 2022-12-07 2024-06-13 株式会社日本触媒 樹脂組成物、及びその用途

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1348142A (en) * 1970-05-14 1974-03-13 Sandoz Ltd Derivatives of alpha-cyanacrylic acid their production and use as stabilizers for organic materials
US3850960A (en) * 1971-05-04 1974-11-26 Sandoz Ltd Derivatives of alpha-cyanacrylic acid
US4591545A (en) * 1983-05-10 1986-05-27 Dainippon Ink And Chemicals, Inc. Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender
JPH07100792B2 (ja) * 1986-05-13 1995-11-01 三菱化学株式会社 液晶組成物
US4749774A (en) * 1986-12-29 1988-06-07 Eastman Kodak Company Condensation polymer containing the residue of a poly-methine compound and shaped articles produced therefrom
US4994512A (en) * 1989-05-01 1991-02-19 Eastman Kodak Company Poly-methine compounds, condensation polymer having a poly-methine compound admixed therein and shaped articles produced therefrom
US5057594A (en) * 1989-08-17 1991-10-15 Eastman Kodak Company Ultraviolet light-absorbing compounds and sunscreen formulations and polymeric materials containing such compounds or residues thereof
US6576797B1 (en) 1994-03-31 2003-06-10 Ciba Specialty Chemicals Corporation Thioether substituted hydroxybenzophenones and stabilized compositions
JP2000136176A (ja) * 1998-10-28 2000-05-16 Chemiprokasei Kaisha Ltd ポリメチン化合物、その製造方法および用途
JP4612219B2 (ja) * 2000-04-20 2011-01-12 三井化学株式会社 置換芳香族化合物の製造方法
JP2003026942A (ja) 2001-05-11 2003-01-29 Kanegafuchi Chem Ind Co Ltd 樹脂組成物
JP2003043259A (ja) 2001-08-01 2003-02-13 Konica Corp 光学フィルム、偏光板及び表示装置
KR100479405B1 (ko) * 2002-05-24 2005-03-30 주식회사 싸이제닉 신남산 이합체, 그 제조방법 및 퇴행성 뇌질환 치료를위한 그의 용도
WO2009112403A2 (en) * 2008-03-13 2009-09-17 Basf Se Dimeric benzylidene malonates
JP2010059235A (ja) * 2008-09-01 2010-03-18 Fujifilm Corp 紫外線吸収剤組成物
JP2010100787A (ja) 2008-10-27 2010-05-06 Fujifilm Corp 紫外線吸収剤およびこれを含む高分子材料
WO2013047411A1 (ja) 2011-09-29 2013-04-04 富士フイルム株式会社 新規なトリアジン誘導体、紫外線吸収剤

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