JP2019014707A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019014707A5 JP2019014707A5 JP2018117942A JP2018117942A JP2019014707A5 JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5 JP 2018117942 A JP2018117942 A JP 2018117942A JP 2018117942 A JP2018117942 A JP 2018117942A JP 2019014707 A5 JP2019014707 A5 JP 2019014707A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- ethylene compound
- hydrogen atom
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005977 Ethylene Substances 0.000 claims 5
- -1 ethylene compound Chemical class 0.000 claims 5
- 239000011342 resin composition Substances 0.000 claims 5
- 125000002252 acyl group Chemical group 0.000 claims 4
- 125000003368 amide group Chemical group 0.000 claims 4
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 4
- 150000001733 carboxylic acid esters Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 230000003287 optical Effects 0.000 claims 2
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000000862 absorption spectrum Methods 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000004434 sulfur atoms Chemical group 0.000 claims 1
Claims (10)
［式（１）中、Ｌは２価以上の連結基を表し、ａは２以上の整数を表し、Ａはそれぞれ独立して下記式（２）で示される基を表す。］
［式（２）中、
Ｒ1はシアノ基、アシル基、カルボキシル基、カルボン酸エステル基、アミド基またはハロゲノアルキル基を表し、
Ｒ2は水素原子、シアノ基、アシル基、カルボキシル基、カルボン酸エステル基、アミド基、炭化水素基またはヘテロアリール基を表し、
Ｒ1とＲ2がともにアシル基、カルボン酸エステル基またはアミド基である場合、Ｒ1とＲ2は互いに連結して環を形成していてもよく、
Ｒ3は水素原子またはアルキル基を表し、
Ｒ4は水素原子、有機基または極性官能基を表し、複数のＲ4は互いに同一または異なっていてもよく、
Ｘは硫黄原子を表し、
＊は式（１）の連結基Ｌとの結合部位を表す。］ An ethylene compound represented by the following formula (1):
[In the formula (1), L represents a divalent or higher valent linking group, a represents an integer of 2 or more, and A independently represents a group represented by the following formula (2). ]
[In equation (2),
R 1 represents a cyano group, an acyl group, a carboxyl group, a carboxylic ester group, an amide group or a halogenoalkyl group;
R 2 represents a hydrogen atom, a cyano group, an acyl group, a carboxyl group, a carboxylic ester group, an amide group, a hydrocarbon group or a heteroaryl group;
When R 1 and R 2 are both an acyl group, a carboxylic acid ester group or an amide group, R 1 and R 2 may be linked to each other to form a ring;
R 3 represents a hydrogen atom or an alkyl group,
R 4 represents a hydrogen atom, an organic group or a polar functional group, and a plurality of R 4 may be the same or different from each other;
X represents a sulfur atom,
* Represents a binding site to the linking group L in the formula (1). ]
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017132977 | 2017-07-06 | ||
| JP2017132977 | 2017-07-06 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020087131A Division JP7027483B2 (en) | 2017-07-06 | 2020-05-19 | Ethylene compound manufacturing method, resin composition manufacturing method, cured product manufacturing method, optical filter manufacturing method, sensor manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019014707A JP2019014707A (en) | 2019-01-31 |
| JP2019014707A5 true JP2019014707A5 (en) | 2020-04-09 |
| JP6833763B2 JP6833763B2 (en) | 2021-02-24 |
Family
ID=64949980
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018117942A Active JP6833763B2 (en) | 2017-07-06 | 2018-06-21 | Ethylene compound, UV absorber and resin composition |
| JP2020087131A Active JP7027483B2 (en) | 2017-07-06 | 2020-05-19 | Ethylene compound manufacturing method, resin composition manufacturing method, cured product manufacturing method, optical filter manufacturing method, sensor manufacturing method |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020087131A Active JP7027483B2 (en) | 2017-07-06 | 2020-05-19 | Ethylene compound manufacturing method, resin composition manufacturing method, cured product manufacturing method, optical filter manufacturing method, sensor manufacturing method |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP6833763B2 (en) |
| KR (1) | KR102253364B1 (en) |
| CN (1) | CN110809573B (en) |
| TW (1) | TWI731248B (en) |
| WO (1) | WO2019009093A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7128633B2 (en) * | 2018-03-01 | 2022-08-31 | 株式会社日本触媒 | Resin composition and optical filter |
| JP7231430B2 (en) * | 2019-02-14 | 2023-03-01 | 株式会社日本触媒 | resin composition, ink and optical filter |
| EP4289879A1 (en) * | 2021-02-03 | 2023-12-13 | Mitsui Chemicals, Inc. | Optical material production method, polymerizable composition for optical material, and optical material |
| KR20240008309A (en) * | 2021-05-14 | 2024-01-18 | 니혼 이타가라스 가부시키가이샤 | Light-absorbing composition, light-absorbing film, method for producing light-absorbing film, and optical filter |
| WO2023218937A1 (en) * | 2022-05-13 | 2023-11-16 | Ａｇｃ株式会社 | Optical filter and uv pigment |
| WO2024024442A1 (en) * | 2022-07-25 | 2024-02-01 | 株式会社日本触媒 | Resin composition |
| WO2024122571A1 (en) * | 2022-12-07 | 2024-06-13 | 株式会社日本触媒 | Resin composition and use thereof |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1348142A (en) * | 1970-05-14 | 1974-03-13 | Sandoz Ltd | Derivatives of alpha-cyanacrylic acid their production and use as stabilizers for organic materials |
| US3850960A (en) * | 1971-05-04 | 1974-11-26 | Sandoz Ltd | Derivatives of alpha-cyanacrylic acid |
| US4591545A (en) * | 1983-05-10 | 1986-05-27 | Dainippon Ink And Chemicals, Inc. | Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender |
| JPH07100792B2 (en) * | 1986-05-13 | 1995-11-01 | 三菱化学株式会社 | Liquid crystal composition |
| US4749774A (en) * | 1986-12-29 | 1988-06-07 | Eastman Kodak Company | Condensation polymer containing the residue of a poly-methine compound and shaped articles produced therefrom |
| US4994512A (en) * | 1989-05-01 | 1991-02-19 | Eastman Kodak Company | Poly-methine compounds, condensation polymer having a poly-methine compound admixed therein and shaped articles produced therefrom |
| US5057594A (en) * | 1989-08-17 | 1991-10-15 | Eastman Kodak Company | Ultraviolet light-absorbing compounds and sunscreen formulations and polymeric materials containing such compounds or residues thereof |
| US6576797B1 (en) | 1994-03-31 | 2003-06-10 | Ciba Specialty Chemicals Corporation | Thioether substituted hydroxybenzophenones and stabilized compositions |
| JP2000136176A (en) * | 1998-10-28 | 2000-05-16 | Chemiprokasei Kaisha Ltd | Polymethine compound and its production and use |
| JP4612219B2 (en) * | 2000-04-20 | 2011-01-12 | 三井化学株式会社 | Process for producing substituted aromatic compounds |
| JP2003026942A (en) | 2001-05-11 | 2003-01-29 | Kanegafuchi Chem Ind Co Ltd | Resin composition |
| JP2003043259A (en) | 2001-08-01 | 2003-02-13 | Konica Corp | Optical film, polarizing plate and display device |
| KR100479405B1 (en) * | 2002-05-24 | 2005-03-30 | 주식회사 싸이제닉 | Cinnamic acid dimers, their preparation and the use thereof for treating neurodegenerative disease |
| WO2009112403A2 (en) * | 2008-03-13 | 2009-09-17 | Basf Se | Dimeric benzylidene malonates |
| JP2010059235A (en) * | 2008-09-01 | 2010-03-18 | Fujifilm Corp | Ultraviolet absorbent composition |
| JP2010100787A (en) | 2008-10-27 | 2010-05-06 | Fujifilm Corp | Ultraviolet absorber and polymeric material containing the same |
| WO2013047411A1 (en) | 2011-09-29 | 2013-04-04 | 富士フイルム株式会社 | Novel triazine derivative and ultraviolet absorbent |
-
2018
- 2018-06-21 KR KR1020197033137A patent/KR102253364B1/en active IP Right Grant
- 2018-06-21 CN CN201880044437.1A patent/CN110809573B/en active Active
- 2018-06-21 JP JP2018117942A patent/JP6833763B2/en active Active
- 2018-06-21 WO PCT/JP2018/023663 patent/WO2019009093A1/en active Application Filing
- 2018-06-28 TW TW107122248A patent/TWI731248B/en active
-
2020
- 2020-05-19 JP JP2020087131A patent/JP7027483B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019014707A5 (en) | ||
| RU2014139009A (en) | BLACK TONER CONTAINING A COMPOUND HAVING A AZOKARKAS | |
| Zhang et al. | A well-defined ladder polyphenylsilsesquioxane (Ph-LPSQ) synthesized via a new three-step approach: monomer self-Organization− Lyophilization—surface-confined polycondensation | |
| JP2014518311A5 (en) | ||
| RU2014138980A (en) | PURPLE TONER CONTAINING A COMPOUND HAVING A AZOKARKAS | |
| JP2014501804A5 (en) | ||
| JP2013178478A5 (en) | ||
| EP2055741A4 (en) | Curable composition | |
| JP2015509660A5 (en) | ||
| ATE546492T1 (en) | CURABLE COMPOSITION AND CATALYST COMPOSITION | |
| JP2008518988A5 (en) | ||
| JP2020154320A5 (en) | Ethylene compound manufacturing method, resin composition manufacturing method, cured product manufacturing method, optical filter manufacturing method, sensor manufacturing method | |
| JP2016503461A5 (en) | ||
| MY146807A (en) | Antireflective coating compositions | |
| EP2055746A3 (en) | Colored curable composition, color filter, method of producing the same, and solid state image pickup device. | |
| RU2017102385A (en) | A COPOLYMER CONTAINING OXAZOLINE MONOMERS AND ITS APPLICATION AS A BINDING AGENT | |
| JP2016506431A5 (en) | ||
| EP2557103A4 (en) | Epoxy compound, curable composition, and cured product thereof | |
| JP2016530302A5 (en) | ||
| CN102079713A (en) | Cross-linked polyquaternary ammonium salt type antibiosis monomer, preparation method of cross-linked polyquaternary ammonium salt type antibiosis monomer and application of cross-linked polyquaternary ammonium salt type antibiosis monomer in dentistry repairing materials | |
| JP2006045507A5 (en) | ||
| JP2009251481A5 (en) | ||
| JP2015129210A (en) | Block carboxylic acid type photoalignment material | |
| JP2009525203A5 (en) | ||
| RU2012137721A (en) | SENSITIVE POLYMERIC COMPOSITION, METHODS FOR PRODUCING A STRUCTURE AND A HEAD FOR A FLOW |