JP6814662B2 - 切削装置 - Google Patents
切削装置 Download PDFInfo
- Publication number
- JP6814662B2 JP6814662B2 JP2017038158A JP2017038158A JP6814662B2 JP 6814662 B2 JP6814662 B2 JP 6814662B2 JP 2017038158 A JP2017038158 A JP 2017038158A JP 2017038158 A JP2017038158 A JP 2017038158A JP 6814662 B2 JP6814662 B2 JP 6814662B2
- Authority
- JP
- Japan
- Prior art keywords
- cutting
- current value
- load current
- workpiece
- spindle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005520 cutting process Methods 0.000 title claims description 159
- 238000003754 machining Methods 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Milling Processes (AREA)
Description
上記切削装置において、前記制御手段は、負荷電流値の値に応じ、加工予定ラインを色分け、線種分けのいずれか一方又は双方により前記表示手段に表示することが好ましい。
10:チャックテーブル 100:吸着部 100a:保持面 101:枠体
102:カバー 103:回転手段
11:切削手段
110:ハウジング 111:スピンドル 112:モータ 113:切削ブレード
114:ブレードカバー 115:切削水供給ノズル
12:切削送り手段
120:ボールネジ 121:ガイドレール 122:モータ 123:可動板
13:割り出し送り手段
130:ボールネジ 131:ガイドレール 132:モータ 133:可動板
14:切り込み送り手段
140:ボールネジ 141:ガイドレール 142:モータ 143:ホルダー
145:壁部
15:負荷電流値検出手段
16:制御手段 17:記憶手段 18:表示手段
19:アライメント手段 190:撮像手段
W:被加工物
Wa:表面
Wb:裏面
T:ダイシングテープ F:環状フレーム
G:切削溝
Claims (2)
- 被加工物を保持するチャックテーブルと、回転駆動されるスピンドルと、該スピンドルの先端に装着され該チャックテーブルに保持された被加工物を切削する切削ブレードと、を備え、該被加工物を加工予定ラインに沿って切削加工する切削装置であって、
切削加工時における該スピンドルの負荷電流値を検出する負荷電流値検出手段と、
該負荷電流値検出手段により検出した負荷電流値を表示する表示手段と、
少なくとも該負荷電流値検出手段と該表示手段とを制御する制御手段と、
を備え、
該制御手段は、加工予定ラインと該加工予定ラインの加工時の該スピンドルの負荷電流値とを対応付けて該表示手段に表示する
切削装置。 - 前記制御手段は、前記スピンドルの負荷電流値の値に応じ、加工予定ラインを色分け、線種分けのいずれか一方又は双方により前記表示手段に表示する
請求項1に記載の切削装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017038158A JP6814662B2 (ja) | 2017-03-01 | 2017-03-01 | 切削装置 |
TW107103993A TWI745541B (zh) | 2017-03-01 | 2018-02-05 | 切割裝置 |
CN201810159197.1A CN108538718B (zh) | 2017-03-01 | 2018-02-26 | 切削装置 |
KR1020180024563A KR102341606B1 (ko) | 2017-03-01 | 2018-02-28 | 절삭 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017038158A JP6814662B2 (ja) | 2017-03-01 | 2017-03-01 | 切削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018147913A JP2018147913A (ja) | 2018-09-20 |
JP6814662B2 true JP6814662B2 (ja) | 2021-01-20 |
Family
ID=63486097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017038158A Active JP6814662B2 (ja) | 2017-03-01 | 2017-03-01 | 切削装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6814662B2 (ja) |
KR (1) | KR102341606B1 (ja) |
CN (1) | CN108538718B (ja) |
TW (1) | TWI745541B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018204402A1 (de) * | 2018-03-22 | 2019-09-26 | Siemens Aktiengesellschaft | Verfahren und Vorrichtung zur Entnahme einer Probe sowie Verwendung einer solchen Vorrichtung |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH085010B2 (ja) * | 1990-12-28 | 1996-01-24 | 株式会社ノリタケカンパニーリミテド | 回転体を利用した切断機及び切断方法 |
JPH11224116A (ja) * | 1998-02-06 | 1999-08-17 | Mitsubishi Electric Corp | 工作機械における加工情報表示方法および装置 |
US6165051A (en) * | 1998-10-29 | 2000-12-26 | Kulicke & Soffa Investments, Inc. | Monitoring system for dicing saws |
JP2006235776A (ja) * | 2005-02-23 | 2006-09-07 | Mitsubishi Heavy Ind Ltd | 工作機械及びこの工作機械による加工方法 |
JP5134216B2 (ja) * | 2006-06-23 | 2013-01-30 | 株式会社ディスコ | ウエーハの加工結果管理方法 |
JP2008004885A (ja) * | 2006-06-26 | 2008-01-10 | Disco Abrasive Syst Ltd | 加工装置 |
JP5149072B2 (ja) * | 2008-05-21 | 2013-02-20 | 株式会社ディスコ | 切削装置 |
JP5561222B2 (ja) * | 2011-03-29 | 2014-07-30 | 株式会社デンソー | 切削装置、切削装置を用いた切削方法、および部品の製造方法 |
JP6280459B2 (ja) * | 2014-06-27 | 2018-02-14 | 株式会社ディスコ | テープ拡張装置 |
JP6444717B2 (ja) * | 2014-12-12 | 2018-12-26 | Towa株式会社 | 切断装置及び切断方法 |
JP6695102B2 (ja) * | 2015-05-26 | 2020-05-20 | 株式会社ディスコ | 加工システム |
-
2017
- 2017-03-01 JP JP2017038158A patent/JP6814662B2/ja active Active
-
2018
- 2018-02-05 TW TW107103993A patent/TWI745541B/zh active
- 2018-02-26 CN CN201810159197.1A patent/CN108538718B/zh active Active
- 2018-02-28 KR KR1020180024563A patent/KR102341606B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2018147913A (ja) | 2018-09-20 |
KR102341606B1 (ko) | 2021-12-22 |
TW201834045A (zh) | 2018-09-16 |
CN108538718B (zh) | 2024-05-17 |
CN108538718A (zh) | 2018-09-14 |
KR20180100497A (ko) | 2018-09-11 |
TWI745541B (zh) | 2021-11-11 |
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