JP6805248B2 - 保護素子を有する光学アセンブリおよびそのような光学アセンブリを有する光学装置 - Google Patents

保護素子を有する光学アセンブリおよびそのような光学アセンブリを有する光学装置 Download PDF

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JP6805248B2
JP6805248B2 JP2018522015A JP2018522015A JP6805248B2 JP 6805248 B2 JP6805248 B2 JP 6805248B2 JP 2018522015 A JP2018522015 A JP 2018522015A JP 2018522015 A JP2018522015 A JP 2018522015A JP 6805248 B2 JP6805248 B2 JP 6805248B2
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optical
thin film
optical assembly
facet
oxide
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JP2018533770A (ja
JP2018533770A5 (enExample
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ハインリッヒ エーム ディルク
ハインリッヒ エーム ディルク
シュミット ステファン−ウォルフガング
シュミット ステファン−ウォルフガング
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2018522015A 2015-10-29 2016-10-26 保護素子を有する光学アセンブリおよびそのような光学アセンブリを有する光学装置 Active JP6805248B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015221209.2 2015-10-29
DE102015221209.2A DE102015221209A1 (de) 2015-10-29 2015-10-29 Optische Baugruppe mit einem Schutzelement und optische Anordnung damit
PCT/EP2016/075845 WO2017072195A1 (en) 2015-10-29 2016-10-26 Optical assembly with a protective element and optical arrangement therewith

Publications (3)

Publication Number Publication Date
JP2018533770A JP2018533770A (ja) 2018-11-15
JP2018533770A5 JP2018533770A5 (enExample) 2019-12-05
JP6805248B2 true JP6805248B2 (ja) 2020-12-23

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JP2018522015A Active JP6805248B2 (ja) 2015-10-29 2016-10-26 保護素子を有する光学アセンブリおよびそのような光学アセンブリを有する光学装置

Country Status (6)

Country Link
US (1) US11022893B2 (enExample)
EP (1) EP3368948B1 (enExample)
JP (1) JP6805248B2 (enExample)
DE (1) DE102015221209A1 (enExample)
TW (1) TWI745312B (enExample)
WO (1) WO2017072195A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11272606B2 (en) 2017-06-27 2022-03-08 Taiwan Semiconductor Manufacturing Co., Ltd. EUV light source and apparatus for lithography
DE102017211443A1 (de) * 2017-07-05 2019-01-10 Carl Zeiss Smt Gmbh Metrologiesystem mit einer EUV-Optik
DE102018110251B4 (de) * 2018-04-27 2021-03-25 Friedrich-Schiller-Universität Jena Kontaminationsabweisender Spiegel und Verfahren zu dessen Herstellung
DE102019117964A1 (de) 2019-07-03 2020-07-23 Asml Netherlands B.V. Lithographieanlage mit einer Überwachungseinrichtung für ein Pellikel
MX2022001060A (es) * 2019-07-26 2022-04-20 Deka Products Lp Sistema y metodo para estimacion de espacio libre.
DE102019214269A1 (de) * 2019-09-19 2021-03-25 Carl Zeiss Smt Gmbh Facettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage
DE102022121000B4 (de) 2021-08-23 2024-03-07 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage mit einer Schutzvorrichtung zum Schutz der optischen Wirkfläche und EUV-Projektionsbelichtungsanlage
DE102021211619A1 (de) 2021-10-14 2023-04-20 Carl Zeiss Smt Gmbh EUV- Mehrfachspiegelanordnung
DE102022209427A1 (de) * 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Mikrospiegelanordnung mit federnd gelagerten Einzelspiegelelementen

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US6445844B1 (en) * 1999-09-15 2002-09-03 Xros, Inc. Flexible, modular, compact fiber optic switch
US6701512B2 (en) * 2001-01-24 2004-03-02 Kabushiki Kaisha Toshiba Focus monitoring method, exposure apparatus, and exposure mask
US6594073B2 (en) * 2001-05-30 2003-07-15 Micro Lithography, Inc. Antistatic optical pellicle
DE602004003015T2 (de) 2003-10-06 2007-02-08 Asml Netherlands B.V. Verfahren und Gerät zur Herstellung einer Schutzschicht auf einem Spiegel
US7633073B2 (en) 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008153396A (ja) * 2006-12-15 2008-07-03 Nikon Corp 照度均一化装置、露光装置、露光方法および半導体デバイスの製造方法
US20080259298A1 (en) * 2007-04-19 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7829248B2 (en) 2007-07-24 2010-11-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle stress relief
DE102008041436A1 (de) 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Optisches Membranelement
DE102008028868A1 (de) * 2008-06-19 2009-12-24 Carl Zeiss Smt Ag Optische Baugruppe
CN102695988B (zh) * 2009-12-23 2015-09-02 Asml荷兰有限公司 光刻设备以及器件制造方法
JP2012216743A (ja) * 2010-06-16 2012-11-08 Gigaphoton Inc スペクトル純度フィルタ及びそれを備える極端紫外光生成装置
JP5886279B2 (ja) * 2010-06-25 2016-03-16 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびリソグラフィ方法
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
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Also Published As

Publication number Publication date
TW201727277A (zh) 2017-08-01
JP2018533770A (ja) 2018-11-15
EP3368948A1 (en) 2018-09-05
US20180246413A1 (en) 2018-08-30
TWI745312B (zh) 2021-11-11
WO2017072195A1 (en) 2017-05-04
DE102015221209A1 (de) 2017-05-04
US11022893B2 (en) 2021-06-01
EP3368948B1 (en) 2019-09-18

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