JP6791211B2 - 掃引信号発生装置 - Google Patents
掃引信号発生装置 Download PDFInfo
- Publication number
- JP6791211B2 JP6791211B2 JP2018123373A JP2018123373A JP6791211B2 JP 6791211 B2 JP6791211 B2 JP 6791211B2 JP 2018123373 A JP2018123373 A JP 2018123373A JP 2018123373 A JP2018123373 A JP 2018123373A JP 6791211 B2 JP6791211 B2 JP 6791211B2
- Authority
- JP
- Japan
- Prior art keywords
- sweep
- sweep signal
- output unit
- signal
- offset value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000010355 oscillation Effects 0.000 claims description 31
- 238000002347 injection Methods 0.000 claims description 20
- 239000007924 injection Substances 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 238000010408 sweeping Methods 0.000 claims description 9
- 239000007789 gas Substances 0.000 description 43
- 239000004065 semiconductor Substances 0.000 description 34
- 230000031700 light absorption Effects 0.000 description 31
- 238000000862 absorption spectrum Methods 0.000 description 28
- 238000005259 measurement Methods 0.000 description 21
- 238000010586 diagram Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 10
- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 description 9
- 238000005070 sampling Methods 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 5
- 238000002835 absorbance Methods 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 206010022000 influenza Diseases 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06817—Noise reduction
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0261—Non-optical elements, e.g. laser driver components, heaters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06804—Stabilisation of laser output parameters by monitoring an external parameter, e.g. temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06808—Stabilisation of laser output parameters by monitoring the electrical laser parameters, e.g. voltage or current
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06821—Stabilising other output parameters than intensity or frequency, e.g. phase, polarisation or far-fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06825—Protecting the laser, e.g. during switch-on/off, detection of malfunctioning or degradation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0427—Electrical excitation ; Circuits therefor for applying modulation to the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/0622—Controlling the frequency of the radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
Description
図1は、第1実施形態に係る掃引信号発生装置10を含む光学測定系1の一例を示す模式図である。図1に示すとおり、光学測定系1は、発光側を構成する発光装置2と、受光側を構成する受光装置3とを含む。発光装置2は、掃引信号発生装置10と、掃引信号発生装置10に接続されている発光部20とを有する。光学測定系1は、測定対象となる被測定ガスGを含む。発光装置2から照射された光は被測定ガスGを透過して受光装置3に集光される。
図3は、第2実施形態に係る掃引信号発生装置10を含む光学測定系1の一例を示す模式図である。以下、図3を参照しながら、第2実施形態に係る掃引信号発生装置10の構成及び機能について主に説明する。第1実施形態と同様の構成部については同一の符号を付し、その説明を省略する。第1実施形態と異なる点について主に説明する。
2 発光装置
3 受光装置
10 掃引信号発生装置
11 制御部
12 第1出力部
13 第2出力部
14 加算部
15 変換部
20 発光部
G 被測定ガス
S 基準レベル
Claims (5)
- 掃引の基準レベルから第1オフセット値だけ加算又は減算された掃引信号であって、周期ごとに前記第1オフセット値が異なる前記掃引信号を複数周期にわたって出力する第1出力部と、
前記第1オフセット値と足し合わせると前記基準レベルに一致するような第2オフセット値を前記周期ごとに有するオフセット信号を前記複数周期にわたって出力する第2出力部と、
前記第1出力部から出力された前記掃引信号と、前記第2出力部から出力された前記オフセット信号とを加算する加算部と、
を備える、
掃引信号発生装置。 - 一の周期における前記第1オフセット値と、前記一の周期に続く周期における前記第1オフセット値との差分は、前記複数周期にわたり一定である、
請求項1に記載の掃引信号発生装置。 - 掃引信号に重畳する非線形ノイズに起因した前記掃引信号の非線形性が、掃引の基準レベルにあるときの前記非線形性よりも小さくなるように前記基準レベルからの第1オフセット値及び第2オフセット値を決定する制御部と、
前記制御部によって決定された前記第1オフセット値だけ加算又は減算された掃引信号を一以上の周期にわたって出力する第1出力部と、
前記制御部によって決定された前記第2オフセット値を有するオフセット信号を前記一以上の周期にわたって出力する第2出力部と、
前記第1出力部から出力された前記掃引信号と、前記第2出力部から出力された前記オフセット信号とを加算する加算部と、
を備える、
掃引信号発生装置。 - 前記掃引信号は、掃引電圧を含み、
前記オフセット信号は、定電圧を含み、
前記加算部から出力された、前記掃引電圧と前記定電圧との加算電圧は、光源の波長の掃引に用いられる、
請求項1乃至3のいずれか1項に記載の掃引信号発生装置。 - 前記加算電圧を、レーザの発振波長を掃引する注入電流に変換する変換部をさらに備える、
請求項4に記載の掃引信号発生装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018123373A JP6791211B2 (ja) | 2018-06-28 | 2018-06-28 | 掃引信号発生装置 |
US16/440,566 US10727646B2 (en) | 2018-06-28 | 2019-06-13 | Sweeping signal generating device |
EP19180313.9A EP3591773B1 (en) | 2018-06-28 | 2019-06-14 | Sweeping signal generating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018123373A JP6791211B2 (ja) | 2018-06-28 | 2018-06-28 | 掃引信号発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020003355A JP2020003355A (ja) | 2020-01-09 |
JP6791211B2 true JP6791211B2 (ja) | 2020-11-25 |
Family
ID=66867048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018123373A Active JP6791211B2 (ja) | 2018-06-28 | 2018-06-28 | 掃引信号発生装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10727646B2 (ja) |
EP (1) | EP3591773B1 (ja) |
JP (1) | JP6791211B2 (ja) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5799046A (en) * | 1980-12-11 | 1982-06-19 | Matsushita Electric Ind Co Ltd | Optical transmitter |
JPH01308090A (ja) * | 1988-06-07 | 1989-12-12 | Fujitsu Ltd | 半導体レーザの発振周波数安定化方法 |
JP4432459B2 (ja) * | 2003-10-30 | 2010-03-17 | 日亜化学工業株式会社 | 半導体レーザダイオードの駆動方法及び発光装置 |
JP5176535B2 (ja) | 2007-02-02 | 2013-04-03 | 富士電機株式会社 | レーザ式ガス分析計 |
JP5103412B2 (ja) | 2009-01-28 | 2012-12-19 | アンリツ株式会社 | 波長掃引光源 |
JP2013037274A (ja) * | 2011-08-10 | 2013-02-21 | Sony Corp | 信号処理装置および方法、信号処理システム、並びにプログラム |
US9784674B2 (en) * | 2014-09-22 | 2017-10-10 | NGP Inc | Analytes monitoring by differential swept wavelength absorption spectroscopy methods |
JP2016200558A (ja) * | 2015-04-14 | 2016-12-01 | 横河電機株式会社 | ガス濃度分析装置 |
US10587094B2 (en) * | 2017-09-27 | 2020-03-10 | Emcore Corporation | Wavelength-stabilized semiconductor laser source |
CN109596538B (zh) * | 2017-10-03 | 2023-08-25 | 株式会社堀场制作所 | 分析装置和分析方法 |
CN107991267B (zh) * | 2017-11-29 | 2020-03-17 | 珠海任驰光电科技有限公司 | 波长捷变的可调谐半导体激光吸收光谱气体检测装置及方法 |
-
2018
- 2018-06-28 JP JP2018123373A patent/JP6791211B2/ja active Active
-
2019
- 2019-06-13 US US16/440,566 patent/US10727646B2/en active Active
- 2019-06-14 EP EP19180313.9A patent/EP3591773B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20200006918A1 (en) | 2020-01-02 |
US10727646B2 (en) | 2020-07-28 |
JP2020003355A (ja) | 2020-01-09 |
EP3591773B1 (en) | 2022-04-27 |
EP3591773A1 (en) | 2020-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5907442B2 (ja) | レーザ式ガス分析計 | |
US9546902B2 (en) | Method and system for correcting incident light fluctuations in absorption spectroscopy | |
JP6624505B2 (ja) | レーザ式ガス分析計 | |
WO2014112502A1 (ja) | レーザガス分析装置 | |
JP6513762B2 (ja) | 分析装置、分析装置用プログラム及び分析方法 | |
JP7135608B2 (ja) | ガス吸収分光装置、及びガス吸収分光方法 | |
JP5440524B2 (ja) | レーザガス分析装置 | |
JPWO2019159581A1 (ja) | ガス吸収分光装置 | |
JP6791214B2 (ja) | 分光分析装置 | |
JP5163360B2 (ja) | レーザ式ガス分析計及びガス濃度測定方法 | |
JP7334502B2 (ja) | レーザ式ガス分析計 | |
JP6791211B2 (ja) | 掃引信号発生装置 | |
JP6791213B2 (ja) | 分光分析装置及び分光分析方法 | |
JP7395846B2 (ja) | レーザ式ガス分析計 | |
JP5170034B2 (ja) | ガス分析装置 | |
CN111948172B (zh) | 光谱测定装置和光谱测定方法 | |
JP7014701B2 (ja) | 光学分析装置、並びに光学分析装置に用いられる機械学習装置及びその方法 | |
JP7215632B1 (ja) | レーザ式ガス分析計 | |
US20120281220A1 (en) | Actuation and evaluation circuit, measuring device and method for measuring the concentration of a gas | |
JP6269438B2 (ja) | レーザ式分析装置 | |
JP2022090283A (ja) | レーザ式ガス分析計 | |
JP2023159724A (ja) | レーザ式ガス分析計 | |
JP2023157238A (ja) | レーザ式ガス分析計 | |
JP2021128141A (ja) | レーザ式ガス分析計 | |
JP2019027963A (ja) | ガス分析装置およびガス分析方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190618 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200603 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200804 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200910 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20201006 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20201019 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6791211 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |