JP6788615B2 - 表面処理用線形誘電体バリア放電プラズマ発生装置 - Google Patents
表面処理用線形誘電体バリア放電プラズマ発生装置 Download PDFInfo
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- JP6788615B2 JP6788615B2 JP2017559699A JP2017559699A JP6788615B2 JP 6788615 B2 JP6788615 B2 JP 6788615B2 JP 2017559699 A JP2017559699 A JP 2017559699A JP 2017559699 A JP2017559699 A JP 2017559699A JP 6788615 B2 JP6788615 B2 JP 6788615B2
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- 238000004381 surface treatment Methods 0.000 title description 18
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- 238000000926 separation method Methods 0.000 description 13
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- 229910001092 metal group alloy Inorganic materials 0.000 description 4
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- 239000000919 ceramic Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2015-0070145 | 2015-05-20 | ||
| KR1020150070145A KR101682903B1 (ko) | 2015-05-20 | 2015-05-20 | 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치 |
| PCT/KR2016/005218 WO2016186431A1 (ko) | 2015-05-20 | 2016-05-18 | 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018521454A JP2018521454A (ja) | 2018-08-02 |
| JP2018521454A5 JP2018521454A5 (enExample) | 2019-08-15 |
| JP6788615B2 true JP6788615B2 (ja) | 2020-11-25 |
Family
ID=57320659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017559699A Active JP6788615B2 (ja) | 2015-05-20 | 2016-05-18 | 表面処理用線形誘電体バリア放電プラズマ発生装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6788615B2 (enExample) |
| KR (1) | KR101682903B1 (enExample) |
| CN (1) | CN107624268B (enExample) |
| WO (1) | WO2016186431A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110124482A (zh) * | 2018-02-09 | 2019-08-16 | 中国石油化工股份有限公司 | 低温等离子体反应器和分解硫化氢的方法 |
| RU2753275C1 (ru) * | 2018-02-09 | 2021-08-12 | Чайна Петролиум энд Кемикал Корпорейшн | Устройство для осуществления низкотемпературной плазменной реакции и способ разложения сероводорода |
| KR102024568B1 (ko) * | 2018-02-13 | 2019-09-24 | 한국기초과학지원연구원 | 환형 면방전 플라즈마 장치를 이용한 점상 식각 모듈 및 점상 식각 모듈의 식각 프로파일을 제어하는 방법 |
| KR102376127B1 (ko) * | 2018-05-30 | 2022-03-18 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 활성 가스 생성 장치 |
| DE102019101063B4 (de) * | 2019-01-16 | 2021-02-25 | Cinogy Gmbh | Plasma-Behandlungsanordnung und Verfahren zur Anpassung der Größe einer Auflagefläche der Plasma-Behandlungsanordnung an die Größe der zu behandelnden Oberfläche |
| CN110035594B (zh) * | 2019-03-18 | 2021-04-13 | 西安交通大学 | 基于介质阻挡放电等离子体的材料改性装置、系统及方法 |
| CN115717233B (zh) * | 2022-04-14 | 2025-05-27 | 南京工业大学 | 一种多模式低温等离子体金属表面薄膜沉积装置及方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100253723B1 (ko) * | 1997-07-03 | 2000-04-15 | 지종기 | 진공 분위기를 형성하여 전극의 내구성을 높인 고온 직류 플라즈마 토취 |
| JP2934852B1 (ja) * | 1998-03-23 | 1999-08-16 | 科学技術振興事業団 | プラズマ処理装置 |
| EP0997926B1 (en) * | 1998-10-26 | 2006-01-04 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and method |
| EP1073091A3 (en) * | 1999-07-27 | 2004-10-06 | Matsushita Electric Works, Ltd. | Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus |
| JP2002018276A (ja) * | 2000-07-10 | 2002-01-22 | Pearl Kogyo Kk | 大気圧プラズマ処理装置 |
| JP2003208999A (ja) * | 2002-01-10 | 2003-07-25 | Sekisui Chem Co Ltd | 放電プラズマ処理方法及びその装置 |
| KR20030091438A (ko) * | 2002-05-28 | 2003-12-03 | (주)플라젠 | 플라즈마 분사장치 및 그 장치를 이용한 표면처리방법 |
| KR100530735B1 (ko) * | 2002-09-12 | 2005-11-28 | 송석균 | 상압 플라즈마 발생장치 |
| CN100553400C (zh) * | 2003-05-14 | 2009-10-21 | 积水化学工业株式会社 | 制造等离子处理设备的方法 |
| CN1826843A (zh) * | 2003-07-23 | 2006-08-30 | 积水化学工业株式会社 | 等离子处理装置和电极结构 |
| JP2006040667A (ja) | 2004-07-26 | 2006-02-09 | Sharp Corp | プラズマ表面処理装置 |
| JP2006306687A (ja) * | 2005-05-02 | 2006-11-09 | Hino Motors Ltd | 燃料改質器 |
| US8328982B1 (en) * | 2005-09-16 | 2012-12-11 | Surfx Technologies Llc | Low-temperature, converging, reactive gas source and method of use |
| KR100789562B1 (ko) * | 2005-12-01 | 2007-12-28 | 주식회사 엘지화학 | 금속적층판의 제조방법 및 이에 의해 제조된 금속적층판 |
| KR100760551B1 (ko) * | 2006-06-27 | 2007-09-20 | 주식회사 에이피피 | 상압 플라즈마 발생장치 |
| KR100872682B1 (ko) * | 2007-02-02 | 2008-12-10 | 강방권 | 균일한 상압 플라즈마 발생장치 |
| CN101277575A (zh) * | 2007-03-28 | 2008-10-01 | 赖中平 | 在彩色滤光片上提高喷墨打印产出量率的制程方法及其装置 |
| KR101092963B1 (ko) * | 2010-01-26 | 2011-12-12 | 비아이 이엠티 주식회사 | 대기압 플라즈마 발생장치 |
| CN103889138B (zh) * | 2012-12-24 | 2016-06-29 | 中国科学院微电子研究所 | 等离子体放电装置 |
-
2015
- 2015-05-20 KR KR1020150070145A patent/KR101682903B1/ko active Active
-
2016
- 2016-05-18 CN CN201680028625.6A patent/CN107624268B/zh active Active
- 2016-05-18 JP JP2017559699A patent/JP6788615B2/ja active Active
- 2016-05-18 WO PCT/KR2016/005218 patent/WO2016186431A1/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN107624268A (zh) | 2018-01-23 |
| KR101682903B1 (ko) | 2016-12-20 |
| CN107624268B (zh) | 2019-11-05 |
| WO2016186431A1 (ko) | 2016-11-24 |
| KR20160136551A (ko) | 2016-11-30 |
| JP2018521454A (ja) | 2018-08-02 |
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