KR101682903B1 - 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치 - Google Patents

표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치 Download PDF

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KR101682903B1
KR101682903B1 KR1020150070145A KR20150070145A KR101682903B1 KR 101682903 B1 KR101682903 B1 KR 101682903B1 KR 1020150070145 A KR1020150070145 A KR 1020150070145A KR 20150070145 A KR20150070145 A KR 20150070145A KR 101682903 B1 KR101682903 B1 KR 101682903B1
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South Korea
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electrode
power
dielectric barrier
ground electrode
power supply
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Korean (ko)
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KR20160136551A (ko
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임유봉
이원오
박상후
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주식회사 플라즈맵
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Priority to KR1020150070145A priority Critical patent/KR101682903B1/ko
Priority to PCT/KR2016/005218 priority patent/WO2016186431A1/ko
Priority to JP2017559699A priority patent/JP6788615B2/ja
Priority to CN201680028625.6A priority patent/CN107624268B/zh
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020150070145A 2015-05-20 2015-05-20 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치 Active KR101682903B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020150070145A KR101682903B1 (ko) 2015-05-20 2015-05-20 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치
PCT/KR2016/005218 WO2016186431A1 (ko) 2015-05-20 2016-05-18 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치
JP2017559699A JP6788615B2 (ja) 2015-05-20 2016-05-18 表面処理用線形誘電体バリア放電プラズマ発生装置
CN201680028625.6A CN107624268B (zh) 2015-05-20 2016-05-18 用于表面处理的线性介质阻挡放电等离子体发生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150070145A KR101682903B1 (ko) 2015-05-20 2015-05-20 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치

Related Child Applications (1)

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KR1020160085533A Division KR20160137452A (ko) 2016-07-06 2016-07-06 표면 처리용 선형 유전체 장벽 방전 플라즈마 발생장치

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KR20160136551A KR20160136551A (ko) 2016-11-30
KR101682903B1 true KR101682903B1 (ko) 2016-12-20

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JP (1) JP6788615B2 (enExample)
KR (1) KR101682903B1 (enExample)
CN (1) CN107624268B (enExample)
WO (1) WO2016186431A1 (enExample)

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* Cited by examiner, † Cited by third party
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CN110124482A (zh) * 2018-02-09 2019-08-16 中国石油化工股份有限公司 低温等离子体反应器和分解硫化氢的方法
RU2753275C1 (ru) * 2018-02-09 2021-08-12 Чайна Петролиум энд Кемикал Корпорейшн Устройство для осуществления низкотемпературной плазменной реакции и способ разложения сероводорода
KR102024568B1 (ko) * 2018-02-13 2019-09-24 한국기초과학지원연구원 환형 면방전 플라즈마 장치를 이용한 점상 식각 모듈 및 점상 식각 모듈의 식각 프로파일을 제어하는 방법
KR102376127B1 (ko) * 2018-05-30 2022-03-18 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 활성 가스 생성 장치
DE102019101063B4 (de) * 2019-01-16 2021-02-25 Cinogy Gmbh Plasma-Behandlungsanordnung und Verfahren zur Anpassung der Größe einer Auflagefläche der Plasma-Behandlungsanordnung an die Größe der zu behandelnden Oberfläche
CN110035594B (zh) * 2019-03-18 2021-04-13 西安交通大学 基于介质阻挡放电等离子体的材料改性装置、系统及方法
CN115717233B (zh) * 2022-04-14 2025-05-27 南京工业大学 一种多模式低温等离子体金属表面薄膜沉积装置及方法

Citations (2)

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JP2002018276A (ja) * 2000-07-10 2002-01-22 Pearl Kogyo Kk 大気圧プラズマ処理装置
JP2006040667A (ja) 2004-07-26 2006-02-09 Sharp Corp プラズマ表面処理装置

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JP2934852B1 (ja) * 1998-03-23 1999-08-16 科学技術振興事業団 プラズマ処理装置
EP0997926B1 (en) * 1998-10-26 2006-01-04 Matsushita Electric Works, Ltd. Plasma treatment apparatus and method
EP1073091A3 (en) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
JP2003208999A (ja) * 2002-01-10 2003-07-25 Sekisui Chem Co Ltd 放電プラズマ処理方法及びその装置
KR20030091438A (ko) * 2002-05-28 2003-12-03 (주)플라젠 플라즈마 분사장치 및 그 장치를 이용한 표면처리방법
KR100530735B1 (ko) * 2002-09-12 2005-11-28 송석균 상압 플라즈마 발생장치
CN100553400C (zh) * 2003-05-14 2009-10-21 积水化学工业株式会社 制造等离子处理设备的方法
CN1826843A (zh) * 2003-07-23 2006-08-30 积水化学工业株式会社 等离子处理装置和电极结构
JP2006306687A (ja) * 2005-05-02 2006-11-09 Hino Motors Ltd 燃料改質器
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KR100789562B1 (ko) * 2005-12-01 2007-12-28 주식회사 엘지화학 금속적층판의 제조방법 및 이에 의해 제조된 금속적층판
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KR100872682B1 (ko) * 2007-02-02 2008-12-10 강방권 균일한 상압 플라즈마 발생장치
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KR101092963B1 (ko) * 2010-01-26 2011-12-12 비아이 이엠티 주식회사 대기압 플라즈마 발생장치
CN103889138B (zh) * 2012-12-24 2016-06-29 中国科学院微电子研究所 等离子体放电装置

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JP2002018276A (ja) * 2000-07-10 2002-01-22 Pearl Kogyo Kk 大気圧プラズマ処理装置
JP2006040667A (ja) 2004-07-26 2006-02-09 Sharp Corp プラズマ表面処理装置

Also Published As

Publication number Publication date
CN107624268A (zh) 2018-01-23
CN107624268B (zh) 2019-11-05
WO2016186431A1 (ko) 2016-11-24
JP6788615B2 (ja) 2020-11-25
KR20160136551A (ko) 2016-11-30
JP2018521454A (ja) 2018-08-02

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