JP6767970B2 - 投影露光装置のための照明光学アセンブリ - Google Patents

投影露光装置のための照明光学アセンブリ Download PDF

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JP6767970B2
JP6767970B2 JP2017512829A JP2017512829A JP6767970B2 JP 6767970 B2 JP6767970 B2 JP 6767970B2 JP 2017512829 A JP2017512829 A JP 2017512829A JP 2017512829 A JP2017512829 A JP 2017512829A JP 6767970 B2 JP6767970 B2 JP 6767970B2
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Prior art keywords
facet
illumination
individual mirrors
optical assembly
mirror
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Japanese (ja)
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JP2017527855A (ja
JP2017527855A5 (enExample
Inventor
マルティン エントレス
マルティン エントレス
スティグ ビーリング
スティグ ビーリング
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
JP2017512829A 2014-09-03 2015-08-24 投影露光装置のための照明光学アセンブリ Active JP6767970B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014217620.4 2014-09-03
DE102014217620.4A DE102014217620A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für eine Projektionsbelichtungsanlage
PCT/EP2015/069371 WO2016034450A2 (en) 2014-09-03 2015-08-24 Illumination optical assembly for a projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2017527855A JP2017527855A (ja) 2017-09-21
JP2017527855A5 JP2017527855A5 (enExample) 2018-10-04
JP6767970B2 true JP6767970B2 (ja) 2020-10-14

Family

ID=53900836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017512829A Active JP6767970B2 (ja) 2014-09-03 2015-08-24 投影露光装置のための照明光学アセンブリ

Country Status (5)

Country Link
US (1) US10133182B2 (enExample)
JP (1) JP6767970B2 (enExample)
DE (1) DE102014217620A1 (enExample)
TW (1) TWI680355B (enExample)
WO (1) WO2016034450A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017004586A1 (de) * 2017-05-12 2018-11-15 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit Mikrospiegelanordnung zur Erzeugung eines optisch variablen Effekts und Herstellverfahren für das Sicherheitselement
US11543753B2 (en) * 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems
DE102022209908A1 (de) 2022-09-21 2024-03-21 Carl Zeiss Smt Gmbh Facettenspiegel, Beleuchtungsoptik, Anordnung eines Facettenspiegels, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines nanostrukturierten Bauelements

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10317667A1 (de) 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optisches Element für ein Beleuchtungssystem
CN101946190B (zh) * 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
DE102008042462B4 (de) 2008-09-30 2010-11-04 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Mikrolithographie
JP5525550B2 (ja) * 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
NL2004429A (en) * 2009-08-25 2011-02-28 Asml Netherlands Bv Illumination system, lithographic apparatus and method of adjusting an illumination mode.
DE102010001388A1 (de) * 2010-01-29 2011-08-04 Carl Zeiss SMT GmbH, 73447 Facettenspiegel zum Einsatz in der Mikrolithografie
DE102010029765A1 (de) 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102011006100A1 (de) * 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012201235B4 (de) * 2012-01-30 2013-08-29 Carl Zeiss Smt Gmbh Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie
DE102012204273B4 (de) * 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102012212453A1 (de) * 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik

Also Published As

Publication number Publication date
WO2016034450A2 (en) 2016-03-10
DE102014217620A1 (de) 2016-03-03
US20170160643A1 (en) 2017-06-08
US10133182B2 (en) 2018-11-20
JP2017527855A (ja) 2017-09-21
TW201610607A (zh) 2016-03-16
WO2016034450A3 (en) 2016-06-09
TWI680355B (zh) 2019-12-21

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