TWI680355B - 用於投影曝光裝置的照明光學總成 - Google Patents
用於投影曝光裝置的照明光學總成 Download PDFInfo
- Publication number
- TWI680355B TWI680355B TW104128172A TW104128172A TWI680355B TW I680355 B TWI680355 B TW I680355B TW 104128172 A TW104128172 A TW 104128172A TW 104128172 A TW104128172 A TW 104128172A TW I680355 B TWI680355 B TW I680355B
- Authority
- TW
- Taiwan
- Prior art keywords
- facet
- mirror
- facets
- optical assembly
- illumination
- Prior art date
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 121
- 230000003287 optical effect Effects 0.000 title claims abstract description 87
- 230000005855 radiation Effects 0.000 claims abstract description 63
- 210000001747 pupil Anatomy 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 13
- 238000002834 transmittance Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 210000000887 face Anatomy 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 12
- 238000006073 displacement reaction Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000011449 brick Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 101001119763 Bacillus subtilis (strain 168) RNA polymerase sigma-B factor Proteins 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000003455 independent Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014217620.4 | 2014-09-03 | ||
| DE102014217620.4A DE102014217620A1 (de) | 2014-09-03 | 2014-09-03 | Beleuchtungsoptik für eine Projektionsbelichtungsanlage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201610607A TW201610607A (zh) | 2016-03-16 |
| TWI680355B true TWI680355B (zh) | 2019-12-21 |
Family
ID=53900836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104128172A TWI680355B (zh) | 2014-09-03 | 2015-08-27 | 用於投影曝光裝置的照明光學總成 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10133182B2 (enExample) |
| JP (1) | JP6767970B2 (enExample) |
| DE (1) | DE102014217620A1 (enExample) |
| TW (1) | TWI680355B (enExample) |
| WO (1) | WO2016034450A2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017004586A1 (de) * | 2017-05-12 | 2018-11-15 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit Mikrospiegelanordnung zur Erzeugung eines optisch variablen Effekts und Herstellverfahren für das Sicherheitselement |
| US11543753B2 (en) * | 2019-10-30 | 2023-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tunable illuminator for lithography systems |
| DE102022209908A1 (de) | 2022-09-21 | 2024-03-21 | Carl Zeiss Smt Gmbh | Facettenspiegel, Beleuchtungsoptik, Anordnung eines Facettenspiegels, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines nanostrukturierten Bauelements |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010029765A1 (de) * | 2010-06-08 | 2011-12-08 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
| US20120154777A1 (en) * | 2009-08-25 | 2012-06-21 | Asml Netherlands B.V. | Illumination system, lithographic apparatus and method of adjusting an illumination mode |
| DE102012204273A1 (de) * | 2012-03-19 | 2013-09-19 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10317667A1 (de) | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| CN101946190B (zh) * | 2008-02-15 | 2013-06-19 | 卡尔蔡司Smt有限责任公司 | 微光刻的投射曝光设备使用的分面镜 |
| DE102008042462B4 (de) | 2008-09-30 | 2010-11-04 | Carl Zeiss Smt Ag | Beleuchtungssystem für die EUV-Mikrolithographie |
| JP5525550B2 (ja) * | 2009-03-06 | 2014-06-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ用の照明光学系及び光学系 |
| DE102010001388A1 (de) * | 2010-01-29 | 2011-08-04 | Carl Zeiss SMT GmbH, 73447 | Facettenspiegel zum Einsatz in der Mikrolithografie |
| DE102011006100A1 (de) * | 2011-03-25 | 2012-09-27 | Carl Zeiss Smt Gmbh | Spiegel-Array |
| DE102012201235B4 (de) * | 2012-01-30 | 2013-08-29 | Carl Zeiss Smt Gmbh | Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie |
| DE102012212453A1 (de) * | 2012-07-17 | 2014-01-23 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
-
2014
- 2014-09-03 DE DE102014217620.4A patent/DE102014217620A1/de not_active Ceased
-
2015
- 2015-08-24 JP JP2017512829A patent/JP6767970B2/ja active Active
- 2015-08-24 WO PCT/EP2015/069371 patent/WO2016034450A2/en not_active Ceased
- 2015-08-27 TW TW104128172A patent/TWI680355B/zh active
-
2017
- 2017-02-17 US US15/436,452 patent/US10133182B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120154777A1 (en) * | 2009-08-25 | 2012-06-21 | Asml Netherlands B.V. | Illumination system, lithographic apparatus and method of adjusting an illumination mode |
| DE102010029765A1 (de) * | 2010-06-08 | 2011-12-08 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
| DE102012204273A1 (de) * | 2012-03-19 | 2013-09-19 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016034450A2 (en) | 2016-03-10 |
| DE102014217620A1 (de) | 2016-03-03 |
| US20170160643A1 (en) | 2017-06-08 |
| US10133182B2 (en) | 2018-11-20 |
| JP2017527855A (ja) | 2017-09-21 |
| JP6767970B2 (ja) | 2020-10-14 |
| TW201610607A (zh) | 2016-03-16 |
| WO2016034450A3 (en) | 2016-06-09 |
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