DE102014217620A1 - Beleuchtungsoptik für eine Projektionsbelichtungsanlage - Google Patents

Beleuchtungsoptik für eine Projektionsbelichtungsanlage Download PDF

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Publication number
DE102014217620A1
DE102014217620A1 DE102014217620.4A DE102014217620A DE102014217620A1 DE 102014217620 A1 DE102014217620 A1 DE 102014217620A1 DE 102014217620 A DE102014217620 A DE 102014217620A DE 102014217620 A1 DE102014217620 A1 DE 102014217620A1
Authority
DE
Germany
Prior art keywords
facets
illumination
facet
mirror
individual mirrors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102014217620.4A
Other languages
German (de)
English (en)
Inventor
Martin Endres
Stig Bieling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102014217620.4A priority Critical patent/DE102014217620A1/de
Priority to JP2017512829A priority patent/JP6767970B2/ja
Priority to PCT/EP2015/069371 priority patent/WO2016034450A2/en
Priority to TW104128172A priority patent/TWI680355B/zh
Publication of DE102014217620A1 publication Critical patent/DE102014217620A1/de
Priority to US15/436,452 priority patent/US10133182B2/en
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
DE102014217620.4A 2014-09-03 2014-09-03 Beleuchtungsoptik für eine Projektionsbelichtungsanlage Ceased DE102014217620A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102014217620.4A DE102014217620A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für eine Projektionsbelichtungsanlage
JP2017512829A JP6767970B2 (ja) 2014-09-03 2015-08-24 投影露光装置のための照明光学アセンブリ
PCT/EP2015/069371 WO2016034450A2 (en) 2014-09-03 2015-08-24 Illumination optical assembly for a projection exposure apparatus
TW104128172A TWI680355B (zh) 2014-09-03 2015-08-27 用於投影曝光裝置的照明光學總成
US15/436,452 US10133182B2 (en) 2014-09-03 2017-02-17 Illumination optical assembly for a projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014217620.4A DE102014217620A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für eine Projektionsbelichtungsanlage

Publications (1)

Publication Number Publication Date
DE102014217620A1 true DE102014217620A1 (de) 2016-03-03

Family

ID=53900836

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014217620.4A Ceased DE102014217620A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für eine Projektionsbelichtungsanlage

Country Status (5)

Country Link
US (1) US10133182B2 (enExample)
JP (1) JP6767970B2 (enExample)
DE (1) DE102014217620A1 (enExample)
TW (1) TWI680355B (enExample)
WO (1) WO2016034450A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018206148A1 (de) * 2017-05-12 2018-11-15 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit mikrospiegelanordnung zur erzeugung eines optisch variablen effekts und herstellverfahren für das sicherheitselement

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11543753B2 (en) * 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems
DE102022209908A1 (de) 2022-09-21 2024-03-21 Carl Zeiss Smt Gmbh Facettenspiegel, Beleuchtungsoptik, Anordnung eines Facettenspiegels, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines nanostrukturierten Bauelements

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060132747A1 (en) 2003-04-17 2006-06-22 Carl Zeiss Smt Ag Optical element for an illumination system
WO2010037437A1 (en) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Illumination system for euv microlithography
WO2010099807A1 (de) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Beleuchtungsoptik sowie optische systeme für die mikrolithographie
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012201235A1 (de) * 2012-01-30 2013-08-01 Carl Zeiss Smt Gmbh Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie
DE102012212453A1 (de) * 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101593712B1 (ko) * 2008-02-15 2016-02-12 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투영 노광 장치에 사용하기 위한 패싯 미러
WO2011023419A1 (en) * 2009-08-25 2011-03-03 Asml Netherlands B.V. Illumination system, lithographic apparatus and method of adjusting an illumination mode
DE102010001388A1 (de) * 2010-01-29 2011-08-04 Carl Zeiss SMT GmbH, 73447 Facettenspiegel zum Einsatz in der Mikrolithografie
DE102010029765A1 (de) 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102012204273B4 (de) 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060132747A1 (en) 2003-04-17 2006-06-22 Carl Zeiss Smt Ag Optical element for an illumination system
WO2010037437A1 (en) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Illumination system for euv microlithography
WO2010099807A1 (de) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Beleuchtungsoptik sowie optische systeme für die mikrolithographie
DE102011006100A1 (de) 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102012201235A1 (de) * 2012-01-30 2013-08-01 Carl Zeiss Smt Gmbh Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie
DE102012212453A1 (de) * 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018206148A1 (de) * 2017-05-12 2018-11-15 Giesecke+Devrient Currency Technology Gmbh Sicherheitselement mit mikrospiegelanordnung zur erzeugung eines optisch variablen effekts und herstellverfahren für das sicherheitselement

Also Published As

Publication number Publication date
JP2017527855A (ja) 2017-09-21
WO2016034450A2 (en) 2016-03-10
WO2016034450A3 (en) 2016-06-09
TW201610607A (zh) 2016-03-16
JP6767970B2 (ja) 2020-10-14
TWI680355B (zh) 2019-12-21
US10133182B2 (en) 2018-11-20
US20170160643A1 (en) 2017-06-08

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