JP2017527854A5 - - Google Patents

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Publication number
JP2017527854A5
JP2017527854A5 JP2017512828A JP2017512828A JP2017527854A5 JP 2017527854 A5 JP2017527854 A5 JP 2017527854A5 JP 2017512828 A JP2017512828 A JP 2017512828A JP 2017512828 A JP2017512828 A JP 2017512828A JP 2017527854 A5 JP2017527854 A5 JP 2017527854A5
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JP
Japan
Prior art keywords
illumination
facet
pupil
optical assembly
object field
Prior art date
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Application number
JP2017512828A
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English (en)
Japanese (ja)
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JP6683688B2 (ja
JP2017527854A (ja
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Priority claimed from DE102014217610.7A external-priority patent/DE102014217610A1/de
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Publication of JP2017527854A publication Critical patent/JP2017527854A/ja
Publication of JP2017527854A5 publication Critical patent/JP2017527854A5/ja
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Publication of JP6683688B2 publication Critical patent/JP6683688B2/ja
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JP2017512828A 2014-09-03 2015-08-21 投影リソグラフィのための照明光学アセンブリ Active JP6683688B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014217610.7A DE102014217610A1 (de) 2014-09-03 2014-09-03 Beleuchtungsoptik für die Projektionslithografie
DE102014217610.7 2014-09-03
PCT/EP2015/069216 WO2016034436A1 (en) 2014-09-03 2015-08-21 Illumination optical assembly for projection lithography

Publications (3)

Publication Number Publication Date
JP2017527854A JP2017527854A (ja) 2017-09-21
JP2017527854A5 true JP2017527854A5 (enExample) 2018-10-04
JP6683688B2 JP6683688B2 (ja) 2020-04-22

Family

ID=53872082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017512828A Active JP6683688B2 (ja) 2014-09-03 2015-08-21 投影リソグラフィのための照明光学アセンブリ

Country Status (6)

Country Link
US (1) US9996010B2 (enExample)
JP (1) JP6683688B2 (enExample)
KR (1) KR102618763B1 (enExample)
DE (1) DE102014217610A1 (enExample)
TW (1) TWI691797B (enExample)
WO (1) WO2016034436A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020116091A1 (de) * 2019-10-30 2021-05-06 Taiwan Semiconductor Manufacturing Co., Ltd. Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10317667A1 (de) 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Optisches Element für ein Beleuchtungssystem
DE102007045396A1 (de) * 2007-09-21 2009-04-23 Carl Zeiss Smt Ag Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
CN101946190B (zh) * 2008-02-15 2013-06-19 卡尔蔡司Smt有限责任公司 微光刻的投射曝光设备使用的分面镜
DE102008009600A1 (de) * 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102008002749A1 (de) * 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
JP5525550B2 (ja) 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
DE102012210961A1 (de) * 2012-06-27 2013-06-06 Carl Zeiss Smt Gmbh Baugruppe für eine Projektionsbelichtungsanlage für die EUV-Projektionslithografie
DE102014203187A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie

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