JP6747527B2 - ストッカ - Google Patents
ストッカ Download PDFInfo
- Publication number
- JP6747527B2 JP6747527B2 JP2018566802A JP2018566802A JP6747527B2 JP 6747527 B2 JP6747527 B2 JP 6747527B2 JP 2018566802 A JP2018566802 A JP 2018566802A JP 2018566802 A JP2018566802 A JP 2018566802A JP 6747527 B2 JP6747527 B2 JP 6747527B2
- Authority
- JP
- Japan
- Prior art keywords
- duct
- storage area
- stocker
- air
- fan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67379—Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67396—Closed carriers characterised by the presence of antistatic elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Warehouses Or Storage Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Ventilation (AREA)
- Liquid Crystal (AREA)
Description
M・・・物品
CL・・・天井部
CF・・・天井ファン
10・・・本体部
11・・・壁部
11a・・・接続壁部
11b・・・蓋部
12・・・保管領域
13・・・ダクト
13P・・・上側部分
13Q・・・下側部分
13a・・・導入口
13b・・・流通規制部
13c、13d・・・噴出口
14・・・ファン
20・・・棚部
30・・・移載装置
40・・・搬送機構
100、100A、100B・・・ストッカ
Claims (5)
- ストッカ内外を区画する壁部と、
前記壁部の内側に配置され、物品が保管される保管領域と、
前記保管領域の前記壁部側に配置され、上下方向に延在するダクトと、
前記ダクトの上端に設けられ、下方に向けて流れる空気を前記ダクトに導入する導入口と、
前記ダクトの上側と下側との間の空気の流通を規制する流通規制部と、
前記ダクトの前記保管領域側に設けられ、前記保管領域に空気を噴き出す噴出口と、
前記ダクトのうち前記流通規制部の下側に設けられ、外部の空気を吸引して前記ダクト内に導入するファンと、を備える、ストッカ。 - 前記噴出口は、前記ダクトの上側部分において、上部から下部にわたって開口率が大きくなる、請求項1に記載のストッカ。
- 前記導入口は、前記ストッカが設置される建屋の天井部に備える天井ファンによって下方に流れる空気を前記ダクト内に導入する、請求項1又は請求項2に記載のストッカ。
- 前記壁部の上部から前記天井部に延びて設けられる接続壁部と、前記保管領域の上端を閉塞する蓋部と、を備える、請求項3に記載のストッカ。
- 前記ファンは、前記ダクトに導入した外部の空気を前記噴出口から前記保管領域に向けて噴出させる、請求項1から請求項4のいずれか一項に記載のストッカ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017020226 | 2017-02-07 | ||
JP2017020226 | 2017-02-07 | ||
PCT/JP2018/000436 WO2018146987A1 (ja) | 2017-02-07 | 2018-01-11 | ストッカ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2018146987A1 JPWO2018146987A1 (ja) | 2019-11-14 |
JP6747527B2 true JP6747527B2 (ja) | 2020-08-26 |
Family
ID=63108091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018566802A Active JP6747527B2 (ja) | 2017-02-07 | 2018-01-11 | ストッカ |
Country Status (9)
Country | Link |
---|---|
US (1) | US10889438B2 (ja) |
EP (1) | EP3582255B1 (ja) |
JP (1) | JP6747527B2 (ja) |
KR (1) | KR102227862B1 (ja) |
CN (1) | CN110249419B (ja) |
IL (1) | IL268308B2 (ja) |
SG (1) | SG11201906992YA (ja) |
TW (1) | TWI732992B (ja) |
WO (1) | WO2018146987A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102552597B1 (ko) * | 2017-07-11 | 2023-07-06 | 코닝 인코포레이티드 | 유리 처리 장치 및 방법들 |
JP6895341B2 (ja) * | 2017-08-10 | 2021-06-30 | 株式会社荏原製作所 | 基板処理装置 |
TWI779134B (zh) * | 2017-11-27 | 2022-10-01 | 荷蘭商Asm智慧財產控股私人有限公司 | 用於儲存晶圓匣的儲存裝置及批爐總成 |
US11854851B2 (en) * | 2021-03-05 | 2023-12-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interface tool |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62217056A (ja) * | 1986-03-18 | 1987-09-24 | Mitsubishi Electric Corp | ストツカ |
JPH06345206A (ja) * | 1993-04-12 | 1994-12-20 | Daifuku Co Ltd | クリーン装置付き荷保管設備 |
JP2000016521A (ja) | 1998-07-02 | 2000-01-18 | Murata Mach Ltd | 自動倉庫 |
JP3939101B2 (ja) * | 2000-12-04 | 2007-07-04 | 株式会社荏原製作所 | 基板搬送方法および基板搬送容器 |
JP4696394B2 (ja) * | 2001-05-18 | 2011-06-08 | ムラテックオートメーション株式会社 | ストッカ |
JP3818434B2 (ja) * | 2001-09-10 | 2006-09-06 | 株式会社ダイフク | 浄化空気通風式の保管設備 |
JP2006347734A (ja) * | 2005-06-17 | 2006-12-28 | Rorze Corp | 貯蔵装置 |
TWM299274U (en) * | 2006-05-04 | 2006-10-11 | Ind Tech Res Inst | Automatically cleaned storage and retrieve system |
JP4899939B2 (ja) * | 2007-03-05 | 2012-03-21 | ムラテックオートメーション株式会社 | クリーンルーム用ストッカ |
WO2009151046A1 (ja) | 2008-06-11 | 2009-12-17 | 株式会社Ihi | ストッカー |
JP5925474B2 (ja) * | 2011-12-06 | 2016-05-25 | 株式会社日立ハイテクマニファクチャ&サービス | ウエハ処理装置 |
US20130251493A1 (en) * | 2012-03-26 | 2013-09-26 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Stacking device and air purification system thereof |
JP6358143B2 (ja) * | 2015-03-26 | 2018-07-18 | 株式会社ダイフク | 半導体容器保管設備 |
JP6097980B2 (ja) | 2015-07-09 | 2017-03-22 | 三井金属アクト株式会社 | 車両用ドアロック装置 |
JP6345206B2 (ja) | 2016-06-14 | 2018-06-20 | ヤフー株式会社 | 配信装置、配信方法、配信プログラム、端末装置、表示方法、及び表示プログラム |
-
2018
- 2018-01-11 JP JP2018566802A patent/JP6747527B2/ja active Active
- 2018-01-11 WO PCT/JP2018/000436 patent/WO2018146987A1/ja unknown
- 2018-01-11 KR KR1020197022699A patent/KR102227862B1/ko active IP Right Grant
- 2018-01-11 EP EP18751047.4A patent/EP3582255B1/en active Active
- 2018-01-11 US US16/483,066 patent/US10889438B2/en active Active
- 2018-01-11 CN CN201880010180.8A patent/CN110249419B/zh active Active
- 2018-01-11 SG SG11201906992YA patent/SG11201906992YA/en unknown
- 2018-02-06 TW TW107104086A patent/TWI732992B/zh active
-
2019
- 2019-07-28 IL IL268308A patent/IL268308B2/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR102227862B1 (ko) | 2021-03-15 |
IL268308B (en) | 2022-10-01 |
US20190375587A1 (en) | 2019-12-12 |
TWI732992B (zh) | 2021-07-11 |
KR20190101448A (ko) | 2019-08-30 |
IL268308A (en) | 2019-09-26 |
CN110249419A (zh) | 2019-09-17 |
JPWO2018146987A1 (ja) | 2019-11-14 |
EP3582255A4 (en) | 2020-12-30 |
WO2018146987A1 (ja) | 2018-08-16 |
EP3582255B1 (en) | 2021-09-29 |
EP3582255A1 (en) | 2019-12-18 |
SG11201906992YA (en) | 2019-08-27 |
TW201829268A (zh) | 2018-08-16 |
US10889438B2 (en) | 2021-01-12 |
CN110249419B (zh) | 2023-04-18 |
IL268308B2 (en) | 2023-02-01 |
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