JP6722298B2 - 成膜装置、マスクフレーム、アライメント方法 - Google Patents
成膜装置、マスクフレーム、アライメント方法 Download PDFInfo
- Publication number
- JP6722298B2 JP6722298B2 JP2018553171A JP2018553171A JP6722298B2 JP 6722298 B2 JP6722298 B2 JP 6722298B2 JP 2018553171 A JP2018553171 A JP 2018553171A JP 2018553171 A JP2018553171 A JP 2018553171A JP 6722298 B2 JP6722298 B2 JP 6722298B2
- Authority
- JP
- Japan
- Prior art keywords
- mask frame
- alignment
- mask
- film forming
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 claims description 48
- 230000015572 biosynthetic process Effects 0.000 claims description 23
- 241000332371 Abutilon x hybridum Species 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 123
- 238000004544 sputter deposition Methods 0.000 description 35
- 239000011521 glass Substances 0.000 description 17
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 15
- 230000001105 regulatory effect Effects 0.000 description 14
- 239000000428 dust Substances 0.000 description 13
- 238000012546 transfer Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 230000005484 gravity Effects 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 239000012636 effector Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017129466 | 2017-06-30 | ||
| JP2017129466 | 2017-06-30 | ||
| PCT/JP2018/021552 WO2019003827A1 (ja) | 2017-06-30 | 2018-06-05 | 成膜装置、マスクフレーム、アライメント方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2019003827A1 JPWO2019003827A1 (ja) | 2019-06-27 |
| JP6722298B2 true JP6722298B2 (ja) | 2020-07-15 |
Family
ID=64741537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018553171A Active JP6722298B2 (ja) | 2017-06-30 | 2018-06-05 | 成膜装置、マスクフレーム、アライメント方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6722298B2 (zh) |
| KR (1) | KR102153644B1 (zh) |
| CN (1) | CN109429499A (zh) |
| TW (1) | TWI673375B (zh) |
| WO (1) | WO2019003827A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102676831B1 (ko) * | 2023-11-14 | 2024-06-20 | 파인원 주식회사 | 블랭크-존 코팅이 가능한 마스크용 트레이 시스템 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS539150B1 (zh) | 1970-12-30 | 1978-04-04 | ||
| JPS5347683A (en) | 1976-10-12 | 1978-04-28 | Nippon Steel Corp | Cargo forwarding and receiving system |
| JP3200265B2 (ja) * | 1993-11-30 | 2001-08-20 | キヤノン株式会社 | マスク保持方法とマスク、並びにこれを用いたデバイス製造方法 |
| JP4890833B2 (ja) | 2005-10-27 | 2012-03-07 | 株式会社日立国際電気 | 基板処理装置 |
| WO2007094407A1 (ja) * | 2006-02-16 | 2007-08-23 | Nikon Corporation | 露光装置、露光方法及びデバイス製造方法 |
| JP5074368B2 (ja) | 2008-12-15 | 2012-11-14 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
| JP5337632B2 (ja) * | 2009-02-13 | 2013-11-06 | 株式会社日立ハイテクノロジーズ | 成膜装置及び有機ｅｌデバイス製造装置 |
| JP5232112B2 (ja) * | 2009-09-17 | 2013-07-10 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
| JP5639431B2 (ja) * | 2010-09-30 | 2014-12-10 | キヤノントッキ株式会社 | 成膜装置 |
| KR101365078B1 (ko) * | 2011-01-28 | 2014-02-20 | 주식회사 에스에프에이 | 진공 증착 시스템 |
| CN103383531B (zh) * | 2012-05-02 | 2016-07-06 | 上海微电子装备有限公司 | 掩模对准装置及使用该装置的光刻设备 |
| JP2013237914A (ja) * | 2012-05-17 | 2013-11-28 | Hitachi High-Technologies Corp | 成膜装置及び成膜方法 |
-
2018
- 2018-06-05 TW TW107119274A patent/TWI673375B/zh active
- 2018-06-05 JP JP2018553171A patent/JP6722298B2/ja active Active
- 2018-06-05 KR KR1020187032286A patent/KR102153644B1/ko active IP Right Grant
- 2018-06-05 CN CN201880001918.4A patent/CN109429499A/zh active Pending
- 2018-06-05 WO PCT/JP2018/021552 patent/WO2019003827A1/ja active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| CN109429499A (zh) | 2019-03-05 |
| TW201907028A (zh) | 2019-02-16 |
| JPWO2019003827A1 (ja) | 2019-06-27 |
| WO2019003827A1 (ja) | 2019-01-03 |
| KR20190013733A (ko) | 2019-02-11 |
| KR102153644B1 (ko) | 2020-09-09 |
| TWI673375B (zh) | 2019-10-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100948205B1 (ko) | 스퍼터링 장치 | |
| US7229532B2 (en) | Sputtering apparatus | |
| WO2016152395A1 (ja) | 成膜装置及び成膜ワーク製造方法 | |
| US9721771B2 (en) | Film forming apparatus | |
| WO2016047486A1 (ja) | Ｘｙステージ、アライメント装置、蒸着装置 | |
| JP2006330656A (ja) | 液晶配向膜用真空蒸着装置およびその成膜方法 | |
| JP7450372B2 (ja) | 成膜装置、成膜方法、及び電子デバイスの製造方法 | |
| JP4679172B2 (ja) | 表示用パネル基板の露光装置、表示用パネル基板の露光方法、及び表示用パネル基板の製造方法 | |
| JP6722298B2 (ja) | 成膜装置、マスクフレーム、アライメント方法 | |
| KR102590797B1 (ko) | 흡착 시스템, 흡착 방법, 및 이를 이용한 성막 장치, 성막 방법, 전자 디바이스의 제조 방법 | |
| JP6742513B2 (ja) | スパッタリング装置 | |
| JP7048696B2 (ja) | 成膜装置 | |
| KR20200069817A (ko) | 정전척, 정전척 시스템, 성막 장치, 흡착 방법, 성막 방법 및 전자 디바이스의 제조 방법 | |
| CN111434797B (zh) | 成膜装置以及电子器件的制造装置 | |
| TWI684659B (zh) | 成膜裝置 | |
| JP7051969B2 (ja) | 成膜装置 | |
| KR20200034455A (ko) | 정전척 시스템, 성막 장치, 피흡착체 분리방법, 성막 방법 및 전자 디바이스의 제조방법 | |
| KR102717514B1 (ko) | 얼라인먼트 장치, 성막 장치 및 조정 방법 | |
| JP2008291294A (ja) | 真空成膜装置 | |
| JP2024024380A (ja) | 基板処理装置 | |
| KR100773466B1 (ko) | 요축 및 피치축 각도 조절이 가능한 박막증착장치 | |
| JP2020111823A (ja) | 成膜装置及び電子デバイスの製造装置 | |
| JPH03160719A (ja) | エッチング装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20181009 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190709 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190905 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200128 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200317 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200602 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200619 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6722298 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |