JP6700794B2 - インプリント材吐出装置 - Google Patents

インプリント材吐出装置 Download PDF

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Publication number
JP6700794B2
JP6700794B2 JP2016002753A JP2016002753A JP6700794B2 JP 6700794 B2 JP6700794 B2 JP 6700794B2 JP 2016002753 A JP2016002753 A JP 2016002753A JP 2016002753 A JP2016002753 A JP 2016002753A JP 6700794 B2 JP6700794 B2 JP 6700794B2
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JP
Japan
Prior art keywords
imprint material
opening
imprint
discharge
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016002753A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016197710A (ja
JP2016197710A5 (enrdf_load_stackoverflow
Inventor
裕 三田
裕 三田
新井　剛
剛 新井
祐一 ▲高▼橋
祐一 ▲高▼橋
義雅 荒木
義雅 荒木
達 石橋
達 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to SG10201602050WA priority Critical patent/SG10201602050WA/en
Priority to TW105108098A priority patent/TWI614110B/zh
Priority to US15/083,028 priority patent/US20160288378A1/en
Priority to EP16000752.2A priority patent/EP3076238B1/en
Priority to CN201610197474.9A priority patent/CN106042650B/zh
Priority to MYPI2016000579A priority patent/MY177437A/en
Priority to KR1020160040231A priority patent/KR101986877B1/ko
Publication of JP2016197710A publication Critical patent/JP2016197710A/ja
Publication of JP2016197710A5 publication Critical patent/JP2016197710A5/ja
Application granted granted Critical
Publication of JP6700794B2 publication Critical patent/JP6700794B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/17—Ink jet characterised by ink handling
    • B41J2/175—Ink supply systems ; Circuit parts therefor
    • B41J2/17563—Ink filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads

Landscapes

  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Ink Jet (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Coating Apparatus (AREA)
JP2016002753A 2015-04-03 2016-01-08 インプリント材吐出装置 Active JP6700794B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SG10201602050WA SG10201602050WA (en) 2015-04-03 2016-03-16 Imprint material discharging device
TW105108098A TWI614110B (zh) 2015-04-03 2016-03-16 壓印材料排出裝置及壓印設備
US15/083,028 US20160288378A1 (en) 2015-04-03 2016-03-28 Imprint material discharging device
CN201610197474.9A CN106042650B (zh) 2015-04-03 2016-03-31 压印材料排出装置及压印设备
EP16000752.2A EP3076238B1 (en) 2015-04-03 2016-03-31 Imprint material discharging device
MYPI2016000579A MY177437A (en) 2015-04-03 2016-03-31 Imprint material discharge device
KR1020160040231A KR101986877B1 (ko) 2015-04-03 2016-04-01 임프린트재 토출 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015076992 2015-04-03
JP2015076992 2015-04-03

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020071663A Division JP6882574B2 (ja) 2015-04-03 2020-04-13 インプリント材吐出装置

Publications (3)

Publication Number Publication Date
JP2016197710A JP2016197710A (ja) 2016-11-24
JP2016197710A5 JP2016197710A5 (enrdf_load_stackoverflow) 2019-02-14
JP6700794B2 true JP6700794B2 (ja) 2020-05-27

Family

ID=57358607

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016002753A Active JP6700794B2 (ja) 2015-04-03 2016-01-08 インプリント材吐出装置
JP2020071663A Active JP6882574B2 (ja) 2015-04-03 2020-04-13 インプリント材吐出装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2020071663A Active JP6882574B2 (ja) 2015-04-03 2020-04-13 インプリント材吐出装置

Country Status (4)

Country Link
JP (2) JP6700794B2 (enrdf_load_stackoverflow)
CN (1) CN106042650B (enrdf_load_stackoverflow)
SG (1) SG10201602050WA (enrdf_load_stackoverflow)
TW (1) TWI614110B (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI680063B (zh) * 2017-09-06 2019-12-21 日商佳能股份有限公司 噴出材料接收單元、噴出材料噴出設備及撓性構件之製造方法
US10421283B2 (en) 2017-09-06 2019-09-24 Canon Kabushiki Kaisha Ejection material receiving unit, ejection material ejecting apparatus, and manufacturing method of flexible member
JP6983587B2 (ja) * 2017-09-06 2021-12-17 キヤノン株式会社 吐出材収容ユニットおよび吐出材吐出装置
JP2019125619A (ja) * 2018-01-12 2019-07-25 キヤノン株式会社 吐出装置およびインプリント装置
US10894420B2 (en) * 2018-04-11 2021-01-19 Canon Kabushiki Kaisha Ejection-material injecting method, ejection-material ejection apparatus, and imprinting apparatus
JP7277127B2 (ja) * 2018-04-11 2023-05-18 キヤノン株式会社 吐出材充填方法、吐出材吐出装置、およびインプリント装置
CN110394979B (zh) * 2018-04-25 2021-09-21 中国航发商用航空发动机有限责任公司 光固化成形设备
JP2023109066A (ja) * 2022-01-26 2023-08-07 東芝テック株式会社 液体循環装置及び液体吐出装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3706294B2 (ja) * 2000-03-27 2005-10-12 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP2002273113A (ja) * 2001-03-15 2002-09-24 Koganei Corp 濾過器および薬液供給装置並びに薬液供給方法
JP2003251821A (ja) * 2001-10-05 2003-09-09 Canon Inc 液体収納容器、液体供給システム、液体使用装置、インクタンク、インク供給システム、インクジェット記録ヘッド及び記録装置
KR20130061770A (ko) * 2003-10-22 2013-06-11 가부시키가이샤 니콘 노광 장치, 노광 방법, 디바이스의 제조 방법
JP4716677B2 (ja) * 2004-06-01 2011-07-06 キヤノンファインテック株式会社 インク供給装置、記録装置、インク供給方法、および記録方法
TWI362059B (en) * 2004-11-25 2012-04-11 Az Electronic Mat Ip Japan Kk Photoresist coating solution supply system and method for supplying photoresist coating solution using thereof, and photoresist coating system using thereof
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
JP4755119B2 (ja) * 2007-02-14 2011-08-24 株式会社リコー 液体吐出ヘッド用液体供給部材、液体吐出装置及び画像形成装置
US8864296B2 (en) * 2008-01-30 2014-10-21 Hewlett-Packard Development Company, L.P. System for priming a fluid dispenser by expanding gas bubbles
JP5209431B2 (ja) * 2008-09-30 2013-06-12 富士フイルム株式会社 インクジェット記録装置
US20100102471A1 (en) * 2008-10-24 2010-04-29 Molecular Imprints, Inc. Fluid transport and dispensing
US20100101493A1 (en) * 2008-10-27 2010-04-29 Molecular Imprints, Inc. Dispense System
JP2010120340A (ja) * 2008-11-21 2010-06-03 Canon Inc 流体排出装置および記録装置
JP5277506B2 (ja) * 2009-02-09 2013-08-28 キヤノンファインテック株式会社 インクジェット記録ヘッド、インク貯留装置
US20110140304A1 (en) * 2009-12-10 2011-06-16 Molecular Imprints, Inc. Imprint lithography template
JP5451450B2 (ja) * 2010-02-24 2014-03-26 キヤノン株式会社 インプリント装置及びそのテンプレート並びに物品の製造方法
JP5335717B2 (ja) * 2010-03-16 2013-11-06 富士フイルム株式会社 レジスト組成物配置装置及びパターン形成体の製造方法
JP2013022491A (ja) * 2011-07-19 2013-02-04 Seiko Epson Corp 描画装置
JP5686779B2 (ja) * 2011-10-14 2015-03-18 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6159072B2 (ja) * 2011-11-30 2017-07-05 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP5824379B2 (ja) * 2012-02-07 2015-11-25 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP5930832B2 (ja) * 2012-04-27 2016-06-08 キヤノン株式会社 光硬化物の製造方法
JP5995567B2 (ja) * 2012-07-12 2016-09-21 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
US9887095B2 (en) * 2013-03-12 2018-02-06 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for an etch process with silicon concentration control
JP2014216471A (ja) * 2013-04-25 2014-11-17 大日本印刷株式会社 インプリント装置及びインプリント方法
JP6362109B2 (ja) * 2013-10-04 2018-07-25 キヤノン株式会社 インプリント装置および部品の製造方法
JP6264888B2 (ja) * 2014-01-07 2018-01-24 セイコーエプソン株式会社 液体噴射装置

Also Published As

Publication number Publication date
TW201636225A (zh) 2016-10-16
TWI614110B (zh) 2018-02-11
SG10201602050WA (en) 2016-11-29
JP2020129671A (ja) 2020-08-27
JP2016197710A (ja) 2016-11-24
CN106042650A (zh) 2016-10-26
JP6882574B2 (ja) 2021-06-02
CN106042650B (zh) 2018-01-02

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