JP6698453B2 - 波長変換装置 - Google Patents

波長変換装置 Download PDF

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Publication number
JP6698453B2
JP6698453B2 JP2016138438A JP2016138438A JP6698453B2 JP 6698453 B2 JP6698453 B2 JP 6698453B2 JP 2016138438 A JP2016138438 A JP 2016138438A JP 2016138438 A JP2016138438 A JP 2016138438A JP 6698453 B2 JP6698453 B2 JP 6698453B2
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JP
Japan
Prior art keywords
wavelength
laser beam
pulse laser
delay time
wavelength conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016138438A
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English (en)
Japanese (ja)
Other versions
JP2018010123A (ja
Inventor
圭司 能丸
圭司 能丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Priority to JP2016138438A priority Critical patent/JP6698453B2/ja
Priority to TW106119306A priority patent/TWI756229B/zh
Priority to KR1020170087191A priority patent/KR102213577B1/ko
Priority to CN201710564618.4A priority patent/CN107639342B/zh
Publication of JP2018010123A publication Critical patent/JP2018010123A/ja
Application granted granted Critical
Publication of JP6698453B2 publication Critical patent/JP6698453B2/ja
Active legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08086—Multiple-wavelength emission
    • H01S3/0809—Two-wavelenghth emission
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Lasers (AREA)
JP2016138438A 2016-07-13 2016-07-13 波長変換装置 Active JP6698453B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016138438A JP6698453B2 (ja) 2016-07-13 2016-07-13 波長変換装置
TW106119306A TWI756229B (zh) 2016-07-13 2017-06-09 波長變換裝置
KR1020170087191A KR102213577B1 (ko) 2016-07-13 2017-07-10 파장 변환 장치
CN201710564618.4A CN107639342B (zh) 2016-07-13 2017-07-12 波长转换装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016138438A JP6698453B2 (ja) 2016-07-13 2016-07-13 波長変換装置

Publications (2)

Publication Number Publication Date
JP2018010123A JP2018010123A (ja) 2018-01-18
JP6698453B2 true JP6698453B2 (ja) 2020-05-27

Family

ID=60995576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016138438A Active JP6698453B2 (ja) 2016-07-13 2016-07-13 波長変換装置

Country Status (4)

Country Link
JP (1) JP6698453B2 (zh)
KR (1) KR102213577B1 (zh)
CN (1) CN107639342B (zh)
TW (1) TWI756229B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021024890A1 (ja) * 2019-08-02 2021-02-11 ウシオ電機株式会社 広帯域パルス光源装置、分光測定装置、分光測定方法及び分光分析方法
JP7355637B2 (ja) 2019-12-16 2023-10-03 株式会社ディスコ 検出装置
CN114447752A (zh) * 2020-11-05 2022-05-06 中国科学院微电子研究所 波长可选择激光系统
CN112569477B (zh) * 2020-12-04 2022-07-29 锐可医疗科技(上海)有限公司 激光治疗仪及存储介质

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0212227A (ja) * 1988-06-30 1990-01-17 Hamamatsu Photonics Kk 光パルス発生装置
CN2379950Y (zh) * 1999-07-15 2000-05-24 赵珂 激光调整与转换装置
US6515792B1 (en) * 2000-04-12 2003-02-04 Massachusetts Institute Of Technology Fast optical wavelength shifter
JP2002151771A (ja) * 2000-11-10 2002-05-24 Mitsubishi Cable Ind Ltd 高出力パルス光発生装置
US7145715B2 (en) * 2004-09-23 2006-12-05 Lucent Technologies Inc. Multiple pump parametric apparatus having no idler broadening
JP4527488B2 (ja) 2004-10-07 2010-08-18 株式会社ディスコ レーザ加工装置
US7542490B2 (en) * 2006-04-25 2009-06-02 R. J. Dwayne Miller Reduction of surface heating effects in nonlinear crystals for high power frequency conversion of laser light
US8456736B2 (en) * 2006-12-01 2013-06-04 Cornell University Divided-pulse amplification of short pulses
JP5450101B2 (ja) * 2008-01-21 2014-03-26 パナソニック株式会社 波長変換レーザ、画像表示装置、及びレーザ加工装置
US8309885B2 (en) * 2009-01-15 2012-11-13 Electro Scientific Industries, Inc. Pulse temporal programmable ultrafast burst mode laser for micromachining
JP5914329B2 (ja) * 2010-05-24 2016-05-11 ギガフォトン株式会社 固体レーザ装置およびレーザシステム
JP2013156448A (ja) * 2012-01-30 2013-08-15 Nikon Corp レーザ装置、露光装置及び検査装置
JP5964621B2 (ja) * 2012-03-16 2016-08-03 株式会社ディスコ レーザー加工装置
CN103296569A (zh) * 2013-06-25 2013-09-11 中国人民解放军国防科学技术大学 基于双波段种子源铒-镱共掺光纤放大器的超连续谱光源
JP6287152B2 (ja) * 2013-12-12 2018-03-07 沖電気工業株式会社 光源装置、並びに相関光子対発生装置、偏光量子もつれ光子対発生装置、及び時間位置量子もつれ光子対発生装置
JP5679386B1 (ja) * 2014-02-24 2015-03-04 レーザーテック株式会社 レーザ光源装置、及び検査装置

Also Published As

Publication number Publication date
KR20180007683A (ko) 2018-01-23
TW201812422A (zh) 2018-04-01
CN107639342B (zh) 2022-03-11
TWI756229B (zh) 2022-03-01
JP2018010123A (ja) 2018-01-18
CN107639342A (zh) 2018-01-30
KR102213577B1 (ko) 2021-02-05

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