JP6694074B2 - 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ - Google Patents

磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ Download PDF

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Publication number
JP6694074B2
JP6694074B2 JP2018550300A JP2018550300A JP6694074B2 JP 6694074 B2 JP6694074 B2 JP 6694074B2 JP 2018550300 A JP2018550300 A JP 2018550300A JP 2018550300 A JP2018550300 A JP 2018550300A JP 6694074 B2 JP6694074 B2 JP 6694074B2
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Prior art keywords
glass
magnetic recording
recording medium
content
less
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Japanese (ja)
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JPWO2018088563A1 (ja
Inventor
佐藤　浩一
浩一 佐藤
橋本　和明
和明 橋本
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Hoya Corp
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Hoya Corp
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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Holding Or Fastening Of Disk On Rotational Shaft (AREA)
JP2018550300A 2016-11-14 2017-11-14 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ Active JP6694074B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016221389 2016-11-14
JP2016221389 2016-11-14
PCT/JP2017/040833 WO2018088563A1 (ja) 2016-11-14 2017-11-14 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

Related Child Applications (1)

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JP2020073228A Division JP7135024B2 (ja) 2016-11-14 2020-04-16 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

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JPWO2018088563A1 JPWO2018088563A1 (ja) 2019-10-10
JP6694074B2 true JP6694074B2 (ja) 2020-05-13

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JP2020073228A Active JP7135024B2 (ja) 2016-11-14 2020-04-16 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ
JP2022138270A Active JP7454021B2 (ja) 2016-11-14 2022-08-31 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ
JP2024035418A Active JP7734777B2 (ja) 2016-11-14 2024-03-08 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

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JP2022138270A Active JP7454021B2 (ja) 2016-11-14 2022-08-31 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ
JP2024035418A Active JP7734777B2 (ja) 2016-11-14 2024-03-08 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体および磁気記録再生装置用ガラススペーサ

Country Status (5)

Country Link
US (4) US11081133B2 (enExample)
JP (4) JP6694074B2 (enExample)
CN (2) CN115072991B (enExample)
SG (1) SG10202102247RA (enExample)
WO (1) WO2018088563A1 (enExample)

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JPWO2019221102A1 (ja) * 2018-05-16 2021-03-18 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置

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WO2022186393A1 (ja) * 2021-03-05 2022-09-09 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
CN117486486A (zh) * 2022-07-20 2024-02-02 荣耀终端有限公司 一种钇铝硅酸盐玻璃、制备方法及电子设备
CN119836403A (zh) * 2022-09-08 2025-04-15 豪雅株式会社 磁记录介质基板用玻璃、磁记录介质基板和磁记录再生装置
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JPWO2019221102A1 (ja) * 2018-05-16 2021-03-18 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
JP6999806B2 (ja) 2018-05-16 2022-01-19 Hoya株式会社 磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
JP2022046613A (ja) * 2018-05-16 2022-03-23 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
US11447414B2 (en) 2018-05-16 2022-09-20 Hoya Corporation Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium, glass spacer for magnetic recording and reproducing apparatus, and magnetic recording and reproducing apparatus
JP7328313B2 (ja) 2018-05-16 2023-08-16 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
US11884584B2 (en) 2018-05-16 2024-01-30 Hoya Corporation Glass for magnetic recording medium substrate or for glass spacer for magnetic recording and reproducing
US12479755B2 (en) 2018-05-16 2025-11-25 Hoya Corporation Glass for magnetic recording medium substrate or for glass spacer for magnetic recording and reproducing apparatus

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US12040003B2 (en) 2024-07-16
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