SG10202102247RA - Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus - Google Patents

Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus

Info

Publication number
SG10202102247RA
SG10202102247RA SG10202102247RA SG10202102247RA SG10202102247RA SG 10202102247R A SG10202102247R A SG 10202102247RA SG 10202102247R A SG10202102247R A SG 10202102247RA SG 10202102247R A SG10202102247R A SG 10202102247RA SG 10202102247R A SG10202102247R A SG 10202102247RA
Authority
SG
Singapore
Prior art keywords
magnetic recording
recording medium
glass
medium substrate
reproducing apparatus
Prior art date
Application number
SG10202102247RA
Other languages
English (en)
Inventor
Koichi Sato
Kazuaki Hashimoto
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG10202102247RA publication Critical patent/SG10202102247RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Glass Compositions (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Holding Or Fastening Of Disk On Rotational Shaft (AREA)
SG10202102247RA 2016-11-14 2017-11-14 Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus SG10202102247RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016221389 2016-11-14

Publications (1)

Publication Number Publication Date
SG10202102247RA true SG10202102247RA (en) 2021-04-29

Family

ID=62109170

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202102247RA SG10202102247RA (en) 2016-11-14 2017-11-14 Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus

Country Status (5)

Country Link
US (4) US11081133B2 (enExample)
JP (4) JP6694074B2 (enExample)
CN (2) CN115072991B (enExample)
SG (1) SG10202102247RA (enExample)
WO (1) WO2018088563A1 (enExample)

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US11081133B2 (en) * 2016-11-14 2021-08-03 Hoya Corporation Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus
WO2018152845A1 (en) * 2017-02-27 2018-08-30 Schott Glass Technologies (Suzhou) Co. Ltd. Lithium containing aluminosilicate glass with low expansion after chemical toughening
WO2019221102A1 (ja) * 2018-05-16 2019-11-21 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
JP7389545B2 (ja) * 2018-12-10 2023-11-30 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体
JP7229357B2 (ja) * 2019-07-22 2023-02-27 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
KR102809471B1 (ko) * 2019-07-29 2025-05-19 에이지씨 가부시키가이샤 지지 유리 기판
US11697608B2 (en) * 2019-10-01 2023-07-11 Owens-Brockway Glass Container Inc. Selective chemical fining of small bubbles in glass
JP7392909B2 (ja) * 2019-11-25 2023-12-06 日本電気硝子株式会社 磁気記録媒体用ガラス基板及びそれを用いた磁気記録装置
WO2021117897A1 (ja) 2019-12-13 2021-06-17 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
CN116964013A (zh) * 2021-03-05 2023-10-27 豪雅株式会社 磁记录介质基板用玻璃或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置
WO2022186393A1 (ja) * 2021-03-05 2022-09-09 Hoya株式会社 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置
CN117486486A (zh) * 2022-07-20 2024-02-02 荣耀终端有限公司 一种钇铝硅酸盐玻璃、制备方法及电子设备
CN119836403A (zh) * 2022-09-08 2025-04-15 豪雅株式会社 磁记录介质基板用玻璃、磁记录介质基板和磁记录再生装置
JPWO2024190443A1 (enExample) * 2023-03-13 2024-09-19
WO2024219375A1 (ja) * 2023-04-17 2024-10-24 Ａｇｃ株式会社 ガラス
WO2024238181A1 (en) * 2023-05-18 2024-11-21 Corning Incorporated Lithium-free ion exchangeable glasses
WO2025206374A1 (ja) * 2024-03-29 2025-10-02 Hoya株式会社 磁気記録装置、及び積層構造体

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CN107207325A (zh) * 2015-02-10 2017-09-26 日本板硝子株式会社 激光加工用玻璃以及使用其的带孔玻璃的制造方法
US11081133B2 (en) * 2016-11-14 2021-08-03 Hoya Corporation Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus
WO2019221102A1 (ja) * 2018-05-16 2019-11-21 Hoya株式会社 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置

Also Published As

Publication number Publication date
CN115072991A (zh) 2022-09-20
JP6694074B2 (ja) 2020-05-13
JP2024069356A (ja) 2024-05-21
JP7734777B2 (ja) 2025-09-05
CN109923083A (zh) 2019-06-21
US20190362754A1 (en) 2019-11-28
JP7454021B2 (ja) 2024-03-21
US20230103236A1 (en) 2023-03-30
JP2020121920A (ja) 2020-08-13
CN115072991B (zh) 2024-07-19
US12040003B2 (en) 2024-07-16
WO2018088563A1 (ja) 2018-05-17
JPWO2018088563A1 (ja) 2019-10-10
US20240321310A1 (en) 2024-09-26
US11551714B2 (en) 2023-01-10
CN109923083B (zh) 2022-07-26
JP7135024B2 (ja) 2022-09-12
US11081133B2 (en) 2021-08-03
US20210387896A1 (en) 2021-12-16
JP2022180402A (ja) 2022-12-06

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