JP6660179B2 - 露光装置、および物品の製造方法 - Google Patents

露光装置、および物品の製造方法 Download PDF

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Publication number
JP6660179B2
JP6660179B2 JP2015257324A JP2015257324A JP6660179B2 JP 6660179 B2 JP6660179 B2 JP 6660179B2 JP 2015257324 A JP2015257324 A JP 2015257324A JP 2015257324 A JP2015257324 A JP 2015257324A JP 6660179 B2 JP6660179 B2 JP 6660179B2
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Japan
Prior art keywords
space
exposure apparatus
gas
air guide
unit
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JP2015257324A
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English (en)
Japanese (ja)
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JP2017120340A5 (enExample
JP2017120340A (ja
Inventor
高井　亮
亮 高井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2015257324A priority Critical patent/JP6660179B2/ja
Priority to US15/376,840 priority patent/US10197926B2/en
Publication of JP2017120340A publication Critical patent/JP2017120340A/ja
Publication of JP2017120340A5 publication Critical patent/JP2017120340A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2015257324A 2015-12-28 2015-12-28 露光装置、および物品の製造方法 Active JP6660179B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015257324A JP6660179B2 (ja) 2015-12-28 2015-12-28 露光装置、および物品の製造方法
US15/376,840 US10197926B2 (en) 2015-12-28 2016-12-13 Exposure apparatus and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015257324A JP6660179B2 (ja) 2015-12-28 2015-12-28 露光装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2017120340A JP2017120340A (ja) 2017-07-06
JP2017120340A5 JP2017120340A5 (enExample) 2018-12-13
JP6660179B2 true JP6660179B2 (ja) 2020-03-11

Family

ID=59086276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015257324A Active JP6660179B2 (ja) 2015-12-28 2015-12-28 露光装置、および物品の製造方法

Country Status (2)

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US (1) US10197926B2 (enExample)
JP (1) JP6660179B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102819643B1 (ko) * 2019-07-25 2025-06-12 캐논 가부시끼가이샤 광학장치, 노광 장치 및 물품의 제조 방법
EP3923075A1 (en) * 2020-06-08 2021-12-15 ASML Netherlands B.V. Apparatus for use in a metrology process or lithographic process
JP7033168B2 (ja) * 2020-06-30 2022-03-09 キヤノン株式会社 露光装置、および物品の製造方法
JP7500370B2 (ja) * 2020-09-17 2024-06-17 キヤノン株式会社 気体供給装置、リソグラフィ装置、および物品製造方法
CN112255890B (zh) * 2020-10-28 2024-05-31 上海图双精密装备有限公司 改善吹风洁净度的光刻机系统
JP7646449B2 (ja) * 2021-05-14 2025-03-17 キヤノン株式会社 基板処理装置及び物品の製造方法
JP7655642B2 (ja) * 2021-05-24 2025-04-02 東京エレクトロン株式会社 接合装置、及び接合方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1092735A (ja) * 1996-09-13 1998-04-10 Nikon Corp 露光装置
US5870197A (en) * 1996-10-24 1999-02-09 Nikon Corporation Precision stage interferometer system with local single air duct
JP3689510B2 (ja) * 1996-11-15 2005-08-31 キヤノン株式会社 露光装置およびデバイス製造方法
US6765647B1 (en) * 1998-11-18 2004-07-20 Nikon Corporation Exposure method and device
WO2001006548A1 (en) * 1999-07-16 2001-01-25 Nikon Corporation Exposure method and system
JP2001118783A (ja) * 1999-10-21 2001-04-27 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
WO2002101804A1 (fr) * 2001-06-11 2002-12-19 Nikon Corporation Dispositif d'exposition, procede de fabrication et element de passage de flux de stabilisation de temperature
JP2003115451A (ja) * 2001-07-30 2003-04-18 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JP2004228497A (ja) * 2003-01-27 2004-08-12 Nikon Corp 露光装置及び電子デバイスの製造方法
JP2004335631A (ja) * 2003-05-06 2004-11-25 Canon Inc ステージ装置
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080239257A1 (en) * 2004-09-10 2008-10-02 Shigeru Hagiwara Stage Apparatus and Exposure Apparatus
JP5245740B2 (ja) * 2008-11-13 2013-07-24 株式会社ニコン 露光装置及び露光方法

Also Published As

Publication number Publication date
US20170184983A1 (en) 2017-06-29
US10197926B2 (en) 2019-02-05
JP2017120340A (ja) 2017-07-06

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