JP6640561B2 - コーティングを備えた基材を得る方法 - Google Patents
コーティングを備えた基材を得る方法 Download PDFInfo
- Publication number
- JP6640561B2 JP6640561B2 JP2015553149A JP2015553149A JP6640561B2 JP 6640561 B2 JP6640561 B2 JP 6640561B2 JP 2015553149 A JP2015553149 A JP 2015553149A JP 2015553149 A JP2015553149 A JP 2015553149A JP 6640561 B2 JP6640561 B2 JP 6640561B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- heat treatment
- heating means
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000576 coating method Methods 0.000 title claims description 124
- 239000000758 substrate Substances 0.000 title claims description 119
- 239000011248 coating agent Substances 0.000 title claims description 116
- 238000000034 method Methods 0.000 title claims description 51
- 238000010438 heat treatment Methods 0.000 claims description 162
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 33
- 229910052709 silver Inorganic materials 0.000 claims description 33
- 239000004332 silver Substances 0.000 claims description 33
- 238000005259 measurement Methods 0.000 claims description 23
- 230000003287 optical effect Effects 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000011521 glass Substances 0.000 claims description 17
- 238000011144 upstream manufacturing Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims description 6
- 239000002241 glass-ceramic Substances 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- 230000006978 adaptation Effects 0.000 claims description 2
- 239000000155 melt Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 25
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 24
- 239000007789 gas Substances 0.000 description 17
- 210000002381 plasma Anatomy 0.000 description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 14
- 238000010521 absorption reaction Methods 0.000 description 12
- 238000000151 deposition Methods 0.000 description 12
- 230000008021 deposition Effects 0.000 description 12
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 12
- 239000011787 zinc oxide Substances 0.000 description 12
- 238000012545 processing Methods 0.000 description 11
- 238000011282 treatment Methods 0.000 description 10
- 238000002425 crystallisation Methods 0.000 description 8
- 230000008025 crystallization Effects 0.000 description 8
- 229910052718 tin Inorganic materials 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000009736 wetting Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 239000003570 air Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000012937 correction Methods 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052951 chalcopyrite Inorganic materials 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 4
- 238000002485 combustion reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000010891 electric arc Methods 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010411 cooking Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000002737 fuel gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- -1 particularly Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- ZBFOLPMOGPIUGP-UHFFFAOYSA-N dizinc;oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[Ti+4].[Zn+2].[Zn+2] ZBFOLPMOGPIUGP-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- QHSJIZLJUFMIFP-UHFFFAOYSA-N ethene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F QHSJIZLJUFMIFP-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical compound [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C23C14/5813—Thermal treatment using lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Surface Treatment Of Glass (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
本発明の態様は、以下のとおりである:
〈態様1〉
面のうち少なくとも一つの上にコーティングを備えた基材(1)を得る方法であり、前記コーティングを前記基材(1)の上に被着し、次いで、前記コーティングを走行する前記基材(1)の向かい側にある少なくとも一つの加熱手段(2a)を用いて熱処理する方法であって、前記熱処理の前に、前記コーティングの少なくとも一つの特性の少なくとも一つの測定を走行している前記基材(1)について行い、かつ前記熱処理の条件を前もって得た測定値に応じて適合させるようにする、コーティングを備えた基材(1)を得る方法。
〈態様2〉
前記コーティングをそれぞれ独立に制御可能でありかつ走行する前記基材(1)の向かい側にある少なくとも二つの加熱手段(2a,2b)を用いて熱処理し、各加熱手段(2a,2b)は前記コーティングの異なる領域を処理し、さらに、前記熱処理の前に各前記領域に対して、前記コーティングの少なくとも一つの特性の少なくとも一つの測定を走行している前記基材(1)について行い、かつ前もって得た測定値に応じて各領域の前記熱処理の条件を当該領域に対して適合させるようにする、請求項1に記載の方法。
〈態様3〉
前記加熱手段(2a,2b)を、レーザー、プラズマトーチ、マイクロ波源、バーナー、及びインダクターから選択する、請求項1又は2に記載の方法。
〈態様4〉
前記レーザー(2a,2b)が線状に並んでいる、請求項3に記載の方法。
〈態様5〉
前記熱処理の前に測定する前記コーティングの少なくとも一つの特性を、光学的、電気的、又は寸法的な特性から選択する、請求項1〜4のうちの一つに記載の方法。
〈態様6〉
前記光学的な特性を、吸収率、反射率、透過率、及び色から選択する、請求項5に記載の方法。
〈態様7〉
前記電気的な特性を、抵抗率、導電率、及びシート抵抗から選択する、請求項5に記載の方法。
〈態様8〉
前記熱処理の条件の適合を自動的に行う、請求項1〜7のうちの一つに記載の方法。
〈態様9〉
前記熱処理の条件を、前記加熱手段(2a)から供給されるパワーを変更することによって適合させる、請求項1〜8のうちの一つに記載の方法。
〈態様10〉
前記基材(1)が、ガラス製、ガラスセラミック製、又は高分子有機材料製である、請求項1〜9のうちの一つに記載の方法。
〈態様11〉
前記コーティングが、金属、酸化物、窒化物、炭化物、酸窒化物、又はそれらのいずれかの混合物の少なくとも一つの薄層を含む、請求項1〜10のうちの一つに記載の方法。
〈態様12〉
前記コーティングが銀ベースの層を少なくとも一つ含む、請求項11に記載の方法。
〈態様13〉
前記熱処理工程がコーティングの溶融を、さらには部分的溶融さえも伴わない、請求項1〜12のうちの一つに記載の方法。
〈態様14〉
基材(1)の上に被着したコーティングの熱処理用装置であって、前記基材(1)がそれに向き合って走行し得る少なくとも一つの加熱手段(2a)と、前記加熱手段(2a)の上流に配置され前記コーティングの少なくとも一つの特性を測定するための少なくとも一つの測定手段(3a)と、前もって得た測定値に応じて熱処理条件を適合させるための手段とを含む、コーティングの熱処理用装置。
〈態様15〉
それぞれ独立に制御可能でありかつそれに向き合って前記基材(1)が走行し得る少なくとも二つの加熱手段(2a,2b)であって、おのおのが前記コーティングの異なる領域を処理することのできる加熱手段(2a,2b)と、前記加熱手段(2a,2b)の上流に配置され領域のそれぞれにおける前記コーティングの少なくとも一つの特性を局所的に測定するための手段(3a,3b)と、前もって得た測定値に応じて各領域の熱処理条件を当該領域に対して適合させるための手段とを含む、請求項14に記載の装置。
Claims (14)
- 面のうち少なくとも一つの上にコーティングを備えた、ガラス製、ガラスセラミック製、又は高分子有機材料製である基材(1)を得る方法であり、
前記コーティングを、前記基材(1)の上に被着し、次いで、前記コーティングを、走行する前記基材(1)の向かい側にある少なくとも一つの加熱手段(2a)を用いて熱処理する方法であって、
前記熱処理の前に、前記コーティングの少なくとも一つの特性の少なくとも一つの測定を、走行している前記基材(1)について行い、かつ前記熱処理の条件を、前もって得た測定値に応じて適合させるようにする、
コーティングを備えた基材(1)を得る方法。 - 前記コーティングをそれぞれ独立に制御可能でありかつ走行する前記基材(1)の向かい側にある少なくとも二つの加熱手段(2a,2b)を用いて熱処理し、各加熱手段(2a,2b)は前記コーティングの異なる領域を処理し、さらに、前記熱処理の前に各前記領域に対して、前記コーティングの少なくとも一つの特性の少なくとも一つの測定を走行している前記基材(1)について行い、かつ前もって得た測定値に応じて各領域の前記熱処理の条件を当該領域に対して適合させるようにする、請求項1に記載の方法。
- 前記加熱手段(2a,2b)を、レーザー、プラズマトーチ、マイクロ波源、バーナー、及びインダクターから選択する、請求項1又は2に記載の方法。
- 前記レーザー(2a,2b)が線状に並んでいる、請求項3に記載の方法。
- 前記熱処理の前に測定する前記コーティングの少なくとも一つの特性を、光学的、電気的、又は寸法的な特性から選択する、請求項1〜4のうちの一つに記載の方法。
- 前記光学的な特性を、吸収率、反射率、透過率、及び色から選択する、請求項5に記載の方法。
- 前記電気的な特性を、抵抗率、導電率、及びシート抵抗から選択する、請求項5に記載の方法。
- 前記熱処理の条件の適合を自動的に行う、請求項1〜7のうちの一つに記載の方法。
- 前記熱処理の条件を、前記加熱手段(2a)から供給されるパワーを変更することによって適合させる、請求項1〜8のうちの一つに記載の方法。
- 前記コーティングが、金属、酸化物、窒化物、炭化物、酸窒化物、又はそれらのいずれかの混合物の少なくとも一つの薄層を含む、請求項1〜9のうちの一つに記載の方法。
- 前記コーティングが銀ベースの層を少なくとも一つ含む、請求項10に記載の方法。
- 前記熱処理工程がコーティングの溶融を、さらには部分的溶融さえも伴わない、請求項1〜11のうちの一つに記載の方法。
- 基材(1)の上に被着したコーティングの熱処理用装置であって、
走行している前記基材の上に被着している前記コーティングの熱処理を行うための、少なくとも一つの加熱手段(2a)と、
前記加熱手段(2a)の上流に配置され、走行している前記基材の上に被着している前記コーティングの少なくとも一つの特性を測定するための、少なくとも一つの測定手段(3a)と、
前もって前記測定手段で得た測定値に応じて前記加熱手段による熱処理条件を適合させるための手段とを含み、かつ
前記基材(1)が、ガラス製、ガラスセラミック製、又は高分子有機材料製であり、かつ前記加熱手段(2a)に向き合って走行し得る、
コーティングの熱処理用装置。 - それぞれ独立に制御可能でありかつそれに向き合って前記基材(1)が走行し得る少なくとも二つの加熱手段(2a,2b)であって、おのおのが前記コーティングの異なる領域を処理することのできる加熱手段(2a,2b)と、前記加熱手段(2a,2b)の上流に配置され領域のそれぞれにおける前記コーティングの少なくとも一つの特性を局所的に測定するための手段(3a,3b)と、前もって得た測定値に応じて各領域の熱処理条件を当該領域に対して適合させるための手段とを含む、請求項13に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1350453 | 2013-01-18 | ||
FR1350453A FR3001160B1 (fr) | 2013-01-18 | 2013-01-18 | Procede d'obtention d'un substrat muni d'un revetement |
PCT/FR2014/050090 WO2014111664A1 (fr) | 2013-01-18 | 2014-01-17 | Procede d'obtention d'un substrat muni d'un revêtement |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018232599A Division JP2019089698A (ja) | 2013-01-18 | 2018-12-12 | コーティングを備えた基材を得る方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016510297A JP2016510297A (ja) | 2016-04-07 |
JP6640561B2 true JP6640561B2 (ja) | 2020-02-05 |
Family
ID=48289293
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015553149A Expired - Fee Related JP6640561B2 (ja) | 2013-01-18 | 2014-01-17 | コーティングを備えた基材を得る方法 |
JP2018232599A Withdrawn JP2019089698A (ja) | 2013-01-18 | 2018-12-12 | コーティングを備えた基材を得る方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018232599A Withdrawn JP2019089698A (ja) | 2013-01-18 | 2018-12-12 | コーティングを備えた基材を得る方法 |
Country Status (11)
Country | Link |
---|---|
US (1) | US20160010212A1 (ja) |
EP (1) | EP2946027A1 (ja) |
JP (2) | JP6640561B2 (ja) |
KR (1) | KR20150108383A (ja) |
CN (1) | CN104903489A (ja) |
BR (1) | BR112015015827A2 (ja) |
CA (1) | CA2896742A1 (ja) |
EA (1) | EA201591347A1 (ja) |
FR (1) | FR3001160B1 (ja) |
MX (1) | MX2015009065A (ja) |
WO (1) | WO2014111664A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB201419244D0 (en) * | 2014-10-29 | 2014-12-10 | Kings Metal Fiber Technologies | Use of alumina-chromium alloy in heat treatment |
FR3040319B1 (fr) * | 2015-08-25 | 2017-11-24 | Saint Gobain | Appareil laser modulaire |
FR3048244B1 (fr) * | 2016-02-26 | 2018-03-16 | Saint-Gobain Glass France | Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier |
DE102016223242A1 (de) * | 2016-11-24 | 2018-05-24 | Robert Bosch Gmbh | Verfahren, Vorrichtung und Steuereinheit zum metallischen Beschichten einer Oberfläche eines Bauteils aus einem Dielektrikum |
KR102006060B1 (ko) * | 2017-02-14 | 2019-09-25 | 주식회사 코윈디에스티 | 로이유리 열처리 방법 및 시스템 |
FR3070387A1 (fr) * | 2017-08-30 | 2019-03-01 | Saint-Gobain Glass France | Dispositif de traitement thermique ameliore |
KR102061424B1 (ko) * | 2018-07-27 | 2019-12-31 | 주식회사 코윈디에스티 | 로이 유리 어닐링 장치 |
US10822270B2 (en) | 2018-08-01 | 2020-11-03 | Guardian Glass, LLC | Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same |
JP7162297B2 (ja) * | 2018-08-08 | 2022-10-28 | キレスト株式会社 | カーボン基材上に金属酸化物が固定化された複合体の製造方法 |
GB201902032D0 (en) * | 2019-02-14 | 2019-04-03 | Pilkington Group Ltd | Apparatus and process for determining the distance between a glass substrate and a coater |
US10996165B1 (en) * | 2020-03-19 | 2021-05-04 | The Boeing Company | Apparatus and method for measuring UV coating effectiveness |
MX2022014805A (es) * | 2020-05-26 | 2023-01-18 | Saint Gobain | Metodo para estimar una funcion de calidad de un sustrato transparente de mono o multiples capas. |
CN113321516A (zh) * | 2021-07-22 | 2021-08-31 | 清大赛思迪新材料科技(北京)有限公司 | 一种陶瓷涂料的微波烧结法 |
CN114702252A (zh) * | 2022-04-29 | 2022-07-05 | 上海耀皮玻璃集团股份有限公司 | 一种含有晶态银层的低辐射镀膜夹层玻璃及其制备方法和用途 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176012A (ja) * | 1985-01-31 | 1986-08-07 | 日立コンデンサ株式会社 | 透明電極の製造方法 |
JPS63454A (ja) * | 1986-06-20 | 1988-01-05 | Konica Corp | 透明導電性フイルムの製造方法 |
JPH0643176Y2 (ja) * | 1989-09-04 | 1994-11-09 | トヨタ自動車株式会社 | インライン式成膜装置 |
JPH03184216A (ja) * | 1989-12-12 | 1991-08-12 | Fujitsu Ltd | 透明導電膜の形成方法 |
JPH0414705A (ja) * | 1990-05-07 | 1992-01-20 | Toyobo Co Ltd | 透明導電膜およびその製造方法 |
JPH0417212A (ja) * | 1990-05-10 | 1992-01-22 | Toyobo Co Ltd | 透明導電膜とその製法 |
FR2683086B1 (fr) * | 1991-10-29 | 1997-01-03 | Alsthom Cge Alcatel | Procede de fabrication d'un conducteur souple supraconducteur a haute temperature critique. |
JP3712435B2 (ja) * | 1995-02-16 | 2005-11-02 | 株式会社シンクロン | 真空蒸着装置 |
FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
DE102007009924A1 (de) * | 2007-02-27 | 2008-08-28 | Carl Zeiss Laser Optics Gmbh | Durchlaufbeschichtungsanlage, Verfahren zur Herstellung kristalliner Dünnschichten und Solarzellen sowie Solarzelle |
EP2130234B1 (en) * | 2007-02-27 | 2014-10-29 | Carl Zeiss Laser Optics GmbH | Continuous coating installation and method for producing crystalline thin films |
US7741131B2 (en) * | 2007-05-25 | 2010-06-22 | Electro Scientific Industries, Inc. | Laser processing of light reflective multilayer target structure |
JP5046890B2 (ja) * | 2007-11-29 | 2012-10-10 | 株式会社コベルコ科研 | Ag系スパッタリングターゲット |
FR2929938B1 (fr) * | 2008-04-11 | 2010-05-07 | Saint Gobain | Procede de depot de couche mince. |
US20090255467A1 (en) * | 2008-04-15 | 2009-10-15 | Global Solar Energy, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
FR2946335B1 (fr) * | 2009-06-05 | 2011-09-02 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
JP2012011402A (ja) * | 2010-06-30 | 2012-01-19 | Sharp Corp | ワークの加工方法、ワークの加工用光照射装置およびそれに用いるプログラム |
JP5122670B2 (ja) * | 2010-11-05 | 2013-01-16 | 日東電工株式会社 | 透明導電性フィルムの製造方法 |
-
2013
- 2013-01-18 FR FR1350453A patent/FR3001160B1/fr not_active Expired - Fee Related
-
2014
- 2014-01-17 BR BR112015015827A patent/BR112015015827A2/pt not_active Application Discontinuation
- 2014-01-17 CA CA2896742A patent/CA2896742A1/fr not_active Abandoned
- 2014-01-17 EP EP14705823.4A patent/EP2946027A1/fr not_active Withdrawn
- 2014-01-17 JP JP2015553149A patent/JP6640561B2/ja not_active Expired - Fee Related
- 2014-01-17 MX MX2015009065A patent/MX2015009065A/es unknown
- 2014-01-17 CN CN201480005046.0A patent/CN104903489A/zh active Pending
- 2014-01-17 EA EA201591347A patent/EA201591347A1/ru unknown
- 2014-01-17 KR KR1020157021894A patent/KR20150108383A/ko not_active IP Right Cessation
- 2014-01-17 WO PCT/FR2014/050090 patent/WO2014111664A1/fr active Application Filing
- 2014-01-17 US US14/761,749 patent/US20160010212A1/en not_active Abandoned
-
2018
- 2018-12-12 JP JP2018232599A patent/JP2019089698A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
CA2896742A1 (fr) | 2014-07-24 |
FR3001160A1 (fr) | 2014-07-25 |
EP2946027A1 (fr) | 2015-11-25 |
WO2014111664A1 (fr) | 2014-07-24 |
KR20150108383A (ko) | 2015-09-25 |
US20160010212A1 (en) | 2016-01-14 |
MX2015009065A (es) | 2015-09-23 |
JP2019089698A (ja) | 2019-06-13 |
FR3001160B1 (fr) | 2016-05-27 |
JP2016510297A (ja) | 2016-04-07 |
CN104903489A (zh) | 2015-09-09 |
EA201591347A1 (ru) | 2015-12-30 |
BR112015015827A2 (pt) | 2017-07-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6640561B2 (ja) | コーティングを備えた基材を得る方法 | |
JP6148405B2 (ja) | 導電性透明酸化物膜を含む積重体で被覆された基材の製造方法 | |
JP6204454B2 (ja) | コーティングされた基材の製造方法 | |
JP6054890B2 (ja) | 被覆物を備えた基材を得る方法 | |
KR102289587B1 (ko) | 코팅을 열처리하기 위한 방법 | |
KR101923786B1 (ko) | 불연속적인 얇은 금속 층을 포함하는 코팅이 제공된 기판을 수득하는 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20161219 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180123 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180420 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20180814 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20181212 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20181219 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20190118 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190701 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191008 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191226 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6640561 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |