JP6550381B2 - コンパクトなレーザーデバイス - Google Patents
コンパクトなレーザーデバイス Download PDFInfo
- Publication number
- JP6550381B2 JP6550381B2 JP2016522763A JP2016522763A JP6550381B2 JP 6550381 B2 JP6550381 B2 JP 6550381B2 JP 2016522763 A JP2016522763 A JP 2016522763A JP 2016522763 A JP2016522763 A JP 2016522763A JP 6550381 B2 JP6550381 B2 JP 6550381B2
- Authority
- JP
- Japan
- Prior art keywords
- laser device
- semiconductor chip
- mesas
- laser
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18322—Position of the structure
- H01S5/18327—Structure being part of a DBR
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
- H10F55/20—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the electric light source controls the radiation-sensitive semiconductor devices, e.g. optocouplers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54413—Marks applied to semiconductor devices or parts comprising digital information, e.g. bar codes, data matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54433—Marks applied to semiconductor devices or parts containing identification or tracking information
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
- H01L2223/5448—Located on chip prior to dicing and remaining on chip after dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13188872 | 2013-10-16 | ||
| EP13188872.9 | 2013-10-16 | ||
| PCT/EP2014/071938 WO2015055600A1 (en) | 2013-10-16 | 2014-10-14 | Compact laser device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016533639A JP2016533639A (ja) | 2016-10-27 |
| JP2016533639A5 JP2016533639A5 (enExample) | 2018-08-30 |
| JP6550381B2 true JP6550381B2 (ja) | 2019-07-24 |
Family
ID=49356317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016522763A Active JP6550381B2 (ja) | 2013-10-16 | 2014-10-14 | コンパクトなレーザーデバイス |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10116119B2 (enExample) |
| EP (1) | EP3058592B1 (enExample) |
| JP (1) | JP6550381B2 (enExample) |
| CN (1) | CN105637634A (enExample) |
| RU (1) | RU2672155C2 (enExample) |
| WO (1) | WO2015055600A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018178117A (ja) * | 2017-04-18 | 2018-11-15 | エムス−パテント アクチエンゲゼルシャフト | ポリアミド成形材料及びその成形物 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6550381B2 (ja) * | 2013-10-16 | 2019-07-24 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | コンパクトなレーザーデバイス |
| WO2016162236A1 (en) * | 2015-04-10 | 2016-10-13 | Koninklijke Philips N.V. | Safe laser device for optical sensing applications |
| EP3217428B1 (de) | 2016-03-07 | 2022-09-07 | Infineon Technologies AG | Mehrfachsubstrat sowie verfahren zu dessen herstellung |
| JP2017204640A (ja) | 2016-05-11 | 2017-11-16 | 晶元光電股▲ふん▼有限公司Epistar Corporation | 発光デバイス及びその製造方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5587452A (en) * | 1978-12-26 | 1980-07-02 | Fujitsu Ltd | Manufacture of semiconductor device |
| US6272160B1 (en) * | 1998-02-03 | 2001-08-07 | Applied Micro Circuits Corporation | High-speed CMOS driver for vertical-cavity surface-emitting lasers |
| US6465744B2 (en) * | 1998-03-27 | 2002-10-15 | Tessera, Inc. | Graded metallic leads for connection to microelectronic elements |
| DE19954093A1 (de) | 1999-11-10 | 2001-05-23 | Infineon Technologies Ag | Anordnung für Hochleistungslaser |
| US6465774B1 (en) * | 2000-06-30 | 2002-10-15 | Honeywell International Inc. | Method and system for versatile optical sensor package |
| US6888871B1 (en) * | 2000-07-12 | 2005-05-03 | Princeton Optronics, Inc. | VCSEL and VCSEL array having integrated microlenses for use in a semiconductor laser pumped solid state laser system |
| US6415977B1 (en) | 2000-08-30 | 2002-07-09 | Micron Technology, Inc. | Method and apparatus for marking and identifying a defective die site |
| US7085300B2 (en) * | 2001-12-28 | 2006-08-01 | Finisar Corporation | Integral vertical cavity surface emitting laser and power monitor |
| US7164702B1 (en) | 2003-08-29 | 2007-01-16 | The United States Of America As Represented By The Secretary Of The Army | Optical transmitters and interconnects using surface-emitting lasers and micro-optical elements |
| JP2005158945A (ja) * | 2003-11-25 | 2005-06-16 | Fanuc Ltd | 半導体レーザ装置 |
| JP4584066B2 (ja) * | 2004-12-10 | 2010-11-17 | 韓國電子通信研究院 | 光感知器を備えた面発光レーザ素子及びこれを用いた光導波路素子 |
| JP4839662B2 (ja) * | 2005-04-08 | 2011-12-21 | 富士ゼロックス株式会社 | 面発光半導体レーザアレイおよびそれを用いた光伝送システム |
| JP5055717B2 (ja) | 2005-06-20 | 2012-10-24 | 富士ゼロックス株式会社 | 面発光型半導体レーザ |
| US7233025B2 (en) * | 2005-11-10 | 2007-06-19 | Microsoft Corporation | Electronic packaging for optical emitters and sensors |
| JP5034662B2 (ja) | 2006-06-20 | 2012-09-26 | ソニー株式会社 | 面発光型半導体レーザおよびその製造方法 |
| KR100990702B1 (ko) * | 2006-08-23 | 2010-10-29 | 가부시키가이샤 리코 | 면 발광 레이저 어레이, 광학 주사 장치 및 화상 형성 장치 |
| JP4858032B2 (ja) * | 2006-09-15 | 2012-01-18 | 日亜化学工業株式会社 | 発光装置 |
| US8102893B2 (en) * | 2007-06-14 | 2012-01-24 | Necsel Intellectual Property | Multiple emitter VECSEL |
| KR101360294B1 (ko) * | 2008-05-21 | 2014-02-11 | 광주과학기술원 | 반사형 광학 센서장치 |
| JP5261754B2 (ja) * | 2008-11-27 | 2013-08-14 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
| US8995493B2 (en) * | 2009-02-17 | 2015-03-31 | Trilumina Corp. | Microlenses for multibeam arrays of optoelectronic devices for high frequency operation |
| US7949024B2 (en) | 2009-02-17 | 2011-05-24 | Trilumina Corporation | Multibeam arrays of optoelectronic devices for high frequency operation |
| WO2010097751A2 (en) | 2009-02-25 | 2010-09-02 | Philips Intellectual Property & Standards Gmbh | Output power stabilization for laser diodes using the photon-cooling dependent laser voltage |
| JP6026884B2 (ja) | 2009-08-10 | 2016-11-16 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 能動的なキャリヤの閉じ込めを伴う垂直共振器型面発光レーザ |
| US9620934B2 (en) | 2010-08-31 | 2017-04-11 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Flip-chip assembly comprising an array of vertical cavity surface emitting lasers (VCSELs) |
| JP5874227B2 (ja) | 2011-07-22 | 2016-03-02 | 富士ゼロックス株式会社 | 面発光型半導体レーザアレイ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 |
| US9088134B2 (en) * | 2011-07-27 | 2015-07-21 | Vixar Inc. | Method and apparatus including improved vertical-cavity surface-emitting lasers |
| KR20140134701A (ko) | 2012-03-14 | 2014-11-24 | 코닌클리케 필립스 엔.브이. | Vcsel 모듈 및 그것의 제조 |
| JP5477728B2 (ja) * | 2013-05-13 | 2014-04-23 | 株式会社リコー | 面発光レーザアレイ |
| JP6550381B2 (ja) * | 2013-10-16 | 2019-07-24 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | コンパクトなレーザーデバイス |
-
2014
- 2014-10-14 JP JP2016522763A patent/JP6550381B2/ja active Active
- 2014-10-14 US US15/028,546 patent/US10116119B2/en active Active
- 2014-10-14 WO PCT/EP2014/071938 patent/WO2015055600A1/en not_active Ceased
- 2014-10-14 EP EP14783863.5A patent/EP3058592B1/en active Active
- 2014-10-14 RU RU2016118623A patent/RU2672155C2/ru not_active IP Right Cessation
- 2014-10-14 CN CN201480056961.2A patent/CN105637634A/zh active Pending
-
2018
- 2018-10-18 US US16/164,209 patent/US10707646B2/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018178117A (ja) * | 2017-04-18 | 2018-11-15 | エムス−パテント アクチエンゲゼルシャフト | ポリアミド成形材料及びその成形物 |
| JP7104548B2 (ja) | 2017-04-18 | 2022-07-21 | エムス-パテント アクチエンゲゼルシャフト | ポリアミド成形材料及びその成形物 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015055600A1 (en) | 2015-04-23 |
| JP2016533639A (ja) | 2016-10-27 |
| EP3058592A1 (en) | 2016-08-24 |
| RU2672155C2 (ru) | 2018-11-12 |
| US20190052048A1 (en) | 2019-02-14 |
| US10707646B2 (en) | 2020-07-07 |
| RU2016118623A3 (enExample) | 2018-05-15 |
| RU2016118623A (ru) | 2017-11-20 |
| US10116119B2 (en) | 2018-10-30 |
| CN105637634A (zh) | 2016-06-01 |
| US20160254640A1 (en) | 2016-09-01 |
| EP3058592B1 (en) | 2021-12-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10707646B2 (en) | Compact laser device | |
| CN113273039B (zh) | 确定激光二极管故障的激光器装置和方法 | |
| US8624614B2 (en) | Burn-in method for surface emitting semiconductor laser device | |
| JP7544711B2 (ja) | 発光ユニット及び測距装置 | |
| US20230307894A1 (en) | Light emitting device | |
| JP2020155622A (ja) | 発光装置、光学装置および情報処理装置 | |
| US20210320479A1 (en) | Light-emitting element array chip, light-emitting device, optical device, and information processing device | |
| CN101504477A (zh) | 光传输模块 | |
| WO2021024508A1 (ja) | 発光装置、光学装置及び情報処理装置 | |
| US20220115836A1 (en) | Light-emitting device, optical device, and information processing device | |
| US5065007A (en) | Apparatus for measuring light output from semiconductor light emitting element | |
| US6830940B1 (en) | Method and apparatus for performing whole wafer burn-in | |
| CN117913651A (zh) | 一种垂直腔面发射激光器及其制备方法 | |
| JP7482785B2 (ja) | 面発光レーザ装置の駆動方法および面発光レーザ装置 | |
| JP4501404B2 (ja) | 半導体発光素子の評価方法 | |
| US8178364B2 (en) | Testing method of surface-emitting laser device and testing device thereof | |
| JP2023042123A (ja) | 発光装置及び光測定装置 | |
| Johnson et al. | High output power 670nm VCSELs | |
| US11699893B2 (en) | VCSELs for high current low pulse width applications | |
| JP2003133633A (ja) | 半導体レーザ装置及び光電子装置 | |
| Geib et al. | Fabrication and performance of large (64x64) arrays of integrated VCSELs and detectors | |
| JP2023042124A (ja) | 発光装置及び光測定装置 | |
| JP2021002670A (ja) | 発光装置、光学装置および情報処理装置 | |
| JP2001066222A (ja) | 光素子アレイの試験方法 | |
| JPH05343797A (ja) | 半導体レーザ及びその使用方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20171012 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180718 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20180718 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20180802 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180904 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20181126 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190129 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190304 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190604 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190701 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6550381 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |