JP6505693B2 - ナノ構造及びナノ構造化物品の作製方法 - Google Patents

ナノ構造及びナノ構造化物品の作製方法 Download PDF

Info

Publication number
JP6505693B2
JP6505693B2 JP2016529853A JP2016529853A JP6505693B2 JP 6505693 B2 JP6505693 B2 JP 6505693B2 JP 2016529853 A JP2016529853 A JP 2016529853A JP 2016529853 A JP2016529853 A JP 2016529853A JP 6505693 B2 JP6505693 B2 JP 6505693B2
Authority
JP
Japan
Prior art keywords
substrate
plasma
film
electrode
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016529853A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016532576A5 (enExample
JP2016532576A (ja
Inventor
エム．デイビッド モーゼス
エム．デイビッド モーゼス
ユイ ター−ホワ
ユイ ター−ホワ
エス．ベイツ ダニエル
エス．ベイツ ダニエル
セス ジェイシュリー
セス ジェイシュリー
エス．バーガー マイケル
エス．バーガー マイケル
フランケ カーステン
フランケ カーステン
エフ．ツェントマイアー ゼバスチャン
エフ．ツェントマイアー ゼバスチャン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2016532576A publication Critical patent/JP2016532576A/ja
Publication of JP2016532576A5 publication Critical patent/JP2016532576A5/ja
Application granted granted Critical
Publication of JP6505693B2 publication Critical patent/JP6505693B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22—Plastics; Metallised plastics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128—Processes for removing material
    • B81C2201/013—Etching
    • B81C2201/0132—Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S70/00—Details of absorbing elements
    • F24S70/60—Details of absorbing elements characterised by the structure or construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3341—Reactive etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Laminated Bodies (AREA)
  • Drying Of Semiconductors (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Chemical Vapour Deposition (AREA)
JP2016529853A 2013-07-26 2014-07-23 ナノ構造及びナノ構造化物品の作製方法 Active JP6505693B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361858670P 2013-07-26 2013-07-26
US61/858,670 2013-07-26
US201361867733P 2013-08-20 2013-08-20
US61/867,733 2013-08-20
US201462018761P 2014-06-30 2014-06-30
US62/018,761 2014-06-30
PCT/US2014/047782 WO2015013387A1 (en) 2013-07-26 2014-07-23 Method of making a nanostructure and nanostructured articles

Publications (3)

Publication Number Publication Date
JP2016532576A JP2016532576A (ja) 2016-10-20
JP2016532576A5 JP2016532576A5 (enExample) 2017-08-17
JP6505693B2 true JP6505693B2 (ja) 2019-04-24

Family

ID=52393807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016529853A Active JP6505693B2 (ja) 2013-07-26 2014-07-23 ナノ構造及びナノ構造化物品の作製方法

Country Status (8)

Country Link
US (1) US10119190B2 (enExample)
EP (1) EP3024777B1 (enExample)
JP (1) JP6505693B2 (enExample)
KR (2) KR20210151999A (enExample)
CN (1) CN105431376B (enExample)
BR (1) BR112016001710A2 (enExample)
SG (2) SG11201600606TA (enExample)
WO (1) WO2015013387A1 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015153597A1 (en) 2014-04-03 2015-10-08 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
JP6925973B2 (ja) 2015-02-27 2021-08-25 スリーエム イノベイティブ プロパティズ カンパニー 両面テープ
CN108136065A (zh) * 2015-06-29 2018-06-08 3M创新有限公司 抗微生物制品及其使用方法
TWI769988B (zh) 2015-10-07 2022-07-11 美商3M新設資產公司 拋光墊與系統及其製造與使用方法
CN108348632B (zh) * 2015-11-13 2022-04-15 3M创新有限公司 抗微生物制品及其使用方法
CN108430524B (zh) 2015-11-13 2021-07-20 3M创新有限公司 抗微生物制品及其使用方法
EP3455319A4 (en) * 2016-05-13 2019-12-25 3M Innovative Properties Company HEAT-RESISTANT PROTECTIVE FILM BASED ON SILOXANE
CN106542494B (zh) * 2016-09-26 2017-12-26 西北工业大学 一种用于制备多层不等高微纳结构的方法
CN106549074A (zh) * 2016-12-08 2017-03-29 上海空间电源研究所 一种用于临近空间环境的薄硅太阳电池组件及其制备方法
JP2020519496A (ja) * 2017-05-10 2020-07-02 スリーエム イノベイティブ プロパティズ カンパニー フルオロポリマー物品及び関連する方法
EP3732733A1 (en) 2017-12-29 2020-11-04 3M Innovative Properties Company Anti-reflective surface structures
JP7660372B2 (ja) 2018-01-05 2025-04-11 スリーエム イノベイティブ プロパティズ カンパニー 迷光吸収フィルム
US11661536B2 (en) 2018-02-28 2023-05-30 3M Innovative Properties Company Adhesives comprising polymerized units of secondary hexyl (meth)acrylates
US12099222B2 (en) 2018-08-23 2024-09-24 3M Innovative Properties Company Photochromic articles
WO2020044164A1 (en) 2018-08-31 2020-03-05 3M Innovative Properties Company Articles including nanostructured surfaces and interpenetrating layers, and methods of making same
US12103846B2 (en) 2019-05-08 2024-10-01 3M Innovative Properties Company Nanostructured article
CN113727827B (zh) * 2019-06-11 2024-12-13 纳卢克斯株式会社 在表面具备微细凹凸结构的塑料元件的制造方法
CN110329985B (zh) * 2019-06-18 2022-02-15 长沙新材料产业研究院有限公司 一种金刚石表面复杂结构及其制备方法
WO2021152479A1 (en) * 2020-01-29 2021-08-05 3M Innovative Properties Company Nanostructured article
WO2021260629A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Polishing pads and systems for and methods of using same
WO2022090901A1 (en) 2020-10-30 2022-05-05 3M Innovative Properties Company Ultraviolet c (uv-c) light reflector including fluoropolymer films
EP4284176A1 (en) 2021-01-28 2023-12-06 3M Innovative Properties Company Antimicrobial compositions and articles and related methods
CN114171641B (zh) * 2021-11-30 2024-05-31 北京燕东微电子科技有限公司 氧化钒薄膜的刻蚀方法与半导体器件的制造方法
CN116619860B (zh) * 2023-05-11 2026-04-21 合肥工业大学 一种光驱动柔性薄膜及其制备方法与在船只动力系统中的应用

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4340276A (en) 1978-11-01 1982-07-20 Minnesota Mining And Manufacturing Company Method of producing a microstructured surface and the article produced thereby
DK152140B (da) 1979-02-16 1988-02-01 Kuesters Eduard Maschf Fremgangsmaade og apparat til moenstring af en fremfoert varebane
GB2064987B (en) 1979-11-14 1983-11-30 Toray Industries Process for producing transparent shaped article having enhanced anti-reflective effect
JPS6294955A (ja) * 1985-10-21 1987-05-01 Nec Corp 素子分離方法
US5888594A (en) 1996-11-05 1999-03-30 Minnesota Mining And Manufacturing Company Process for depositing a carbon-rich coating on a moving substrate
US6534409B1 (en) 1996-12-04 2003-03-18 Micron Technology, Inc. Silicon oxide co-deposition/etching process
US6593247B1 (en) 1998-02-11 2003-07-15 Applied Materials, Inc. Method of depositing low k films using an oxidizing plasma
US6582823B1 (en) 1999-04-30 2003-06-24 North Carolina State University Wear-resistant polymeric articles and methods of making the same
JP2004500481A (ja) * 1999-06-03 2004-01-08 ザ　ペン　ステイト　リサーチ　ファンデーション 堆積薄膜ボイド・柱状体網目構造物
EP1208002A4 (en) * 1999-06-03 2006-08-02 Penn State Res Found MATERIALS WITH NETWORK OF SURFACE POROSITY COLUMNS DEPOSITED IN THIN FILM
JP3691689B2 (ja) * 1999-08-03 2005-09-07 住友精密工業株式会社 エッチング表面の親水性化方法
US6391788B1 (en) * 2000-02-25 2002-05-21 Applied Materials, Inc. Two etchant etch method
US6919119B2 (en) 2000-05-30 2005-07-19 The Penn State Research Foundation Electronic and opto-electronic devices fabricated from nanostructured high surface to volume ratio thin films
WO2002025714A1 (en) * 2000-09-20 2002-03-28 Infineon Technologies Sc300 Gmbh & Co. Kg A process for dry-etching a semiconductor wafer surface
US7956525B2 (en) * 2003-05-16 2011-06-07 Nanomix, Inc. Flexible nanostructure electronic devices
US6726979B2 (en) 2002-02-26 2004-04-27 Saint-Gobain Performance Plastics Corporation Protective glazing laminate
US7074723B2 (en) * 2002-08-02 2006-07-11 Applied Materials, Inc. Method of plasma etching a deeply recessed feature in a substrate using a plasma source gas modulated etchant system
DE10241708B4 (de) 2002-09-09 2005-09-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung
EP1799877B2 (en) 2004-08-18 2016-04-20 Dow Corning Corporation Sioc:h coated substrates
CN100593015C (zh) * 2005-12-09 2010-03-03 中国科学院物理研究所 一种表面纳米锥阵列及其制作方法
DE102006017716A1 (de) 2006-04-15 2007-10-18 Forschungszentrum Jülich GmbH Vorrichtung zur Messung biomedizinischer Daten eines Probanden und Verfahren zur Stimulation des Probanden mit in Echtzeit verarbeiteten Daten
SG172428A1 (en) * 2008-12-30 2011-07-28 3M Innovative Properties Co Method for making nanostructured surfaces
JP5438245B2 (ja) * 2010-05-03 2014-03-12 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造の作製方法
CN102653390A (zh) * 2012-04-18 2012-09-05 北京大学 使用混合气体刻蚀制备纳米森林结构的方法

Also Published As

Publication number Publication date
KR20160037961A (ko) 2016-04-06
KR20210151999A (ko) 2021-12-14
EP3024777A4 (en) 2017-01-11
SG10201704677QA (en) 2017-07-28
WO2015013387A1 (en) 2015-01-29
US10119190B2 (en) 2018-11-06
CN105431376A (zh) 2016-03-23
US20170067150A1 (en) 2017-03-09
SG11201600606TA (en) 2016-02-26
BR112016001710A2 (pt) 2017-08-01
EP3024777B1 (en) 2024-05-15
JP2016532576A (ja) 2016-10-20
CN105431376B (zh) 2018-08-31
EP3024777A1 (en) 2016-06-01

Similar Documents

Publication Publication Date Title
EP3024777B1 (en) Method of making a nanostructure
US10134566B2 (en) Method of making a nanostructure and nanostructured articles
JP5438245B2 (ja) ナノ構造の作製方法
EP3115334B1 (en) Method for making nanostructured surfaces using a microstructured surface and a nanoscale mask
US9908772B2 (en) Nanostructured articles and methods of making nanostructured articles
TWI575249B (zh) 抗反射物件及其製作方法
CN103732669B (zh) 纳米结构化制品及其制备方法
EP2686389B1 (en) Nanostructured articles
JPWO2012067230A1 (ja) ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス

Legal Events

Date Code Title Description
RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20170329

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170405

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170710

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170710

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180731

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20181030

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20190226

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20190327

R150 Certificate of patent or registration of utility model

Ref document number: 6505693

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250