JP6491903B2 - 基板洗浄装置および方法 - Google Patents
基板洗浄装置および方法 Download PDFInfo
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- JP6491903B2 JP6491903B2 JP2015030489A JP2015030489A JP6491903B2 JP 6491903 B2 JP6491903 B2 JP 6491903B2 JP 2015030489 A JP2015030489 A JP 2015030489A JP 2015030489 A JP2015030489 A JP 2015030489A JP 6491903 B2 JP6491903 B2 JP 6491903B2
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- substrate
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- 239000000758 substrate Substances 0.000 title claims description 232
- 238000004140 cleaning Methods 0.000 title claims description 97
- 238000000034 method Methods 0.000 title claims description 23
- 238000003825 pressing Methods 0.000 claims description 51
- 230000002093 peripheral effect Effects 0.000 claims description 28
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000001514 detection method Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- 238000012544 monitoring process Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015030489A JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015030489A JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016152382A JP2016152382A (ja) | 2016-08-22 |
| JP2016152382A5 JP2016152382A5 (enExample) | 2018-02-08 |
| JP6491903B2 true JP6491903B2 (ja) | 2019-03-27 |
Family
ID=56696758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015030489A Active JP6491903B2 (ja) | 2015-02-19 | 2015-02-19 | 基板洗浄装置および方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6491903B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023119847A1 (ja) * | 2021-12-24 | 2023-06-29 | 株式会社荏原製作所 | 基板処理方法および基板処理装置 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6792512B2 (ja) | 2017-05-16 | 2020-11-25 | 株式会社荏原製作所 | 基板洗浄装置および基板処理装置 |
| JP7115403B2 (ja) * | 2019-04-11 | 2022-08-09 | 株式会社Sumco | ウェーハの回転検出方法及びウェーハの回転検出システム |
| JP7078602B2 (ja) | 2019-12-25 | 2022-05-31 | 株式会社荏原製作所 | 洗浄装置、研磨装置、洗浄装置において基板の回転速度を算出する装置および方法 |
| CN114472265B (zh) * | 2021-12-31 | 2022-11-08 | 华海清科股份有限公司 | 一种晶圆清洗方法及晶圆清洗装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10289889A (ja) * | 1997-04-16 | 1998-10-27 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JPH11219930A (ja) * | 1998-01-30 | 1999-08-10 | Ebara Corp | 洗浄装置 |
| JP4620911B2 (ja) * | 2001-09-05 | 2011-01-26 | 芝浦メカトロニクス株式会社 | 基板の処理装置及び処理方法 |
| JP2003092278A (ja) * | 2001-09-18 | 2003-03-28 | Shibaura Mechatronics Corp | 基板の処理装置及び処理方法 |
| US7685667B2 (en) * | 2005-06-14 | 2010-03-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Post-CMP cleaning system |
| JP2008270753A (ja) * | 2007-03-09 | 2008-11-06 | Applied Materials Inc | クリーニング時における基板の回転のモニタ方法及び装置 |
| JP6125884B2 (ja) * | 2013-04-23 | 2017-05-10 | 株式会社荏原製作所 | 基板処理装置及び処理基板の製造方法 |
-
2015
- 2015-02-19 JP JP2015030489A patent/JP6491903B2/ja active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023119847A1 (ja) * | 2021-12-24 | 2023-06-29 | 株式会社荏原製作所 | 基板処理方法および基板処理装置 |
| JP2023095345A (ja) * | 2021-12-24 | 2023-07-06 | 株式会社荏原製作所 | 基板処理方法および基板処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016152382A (ja) | 2016-08-22 |
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