JP6489034B2 - 基板搬送装置及び基板搬送方法 - Google Patents
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- 239000000758 substrate Substances 0.000 title claims description 112
- 238000000034 method Methods 0.000 title claims description 17
- 238000012546 transfer Methods 0.000 claims description 97
- 230000007246 mechanism Effects 0.000 claims description 35
- 238000012937 correction Methods 0.000 claims description 28
- 238000001514 detection method Methods 0.000 claims description 17
- 230000003028 elevating effect Effects 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 10
- 238000003860 storage Methods 0.000 claims description 9
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 139
- 238000012360 testing method Methods 0.000 description 23
- 101000662805 Homo sapiens Trafficking protein particle complex subunit 5 Proteins 0.000 description 20
- 102100037497 Trafficking protein particle complex subunit 5 Human genes 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 19
- 238000012545 processing Methods 0.000 description 18
- 230000005856 abnormality Effects 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 14
- 210000000078 claw Anatomy 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 12
- 230000001186 cumulative effect Effects 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 230000007723 transport mechanism Effects 0.000 description 9
- 230000007704 transition Effects 0.000 description 8
- 101150075071 TRS1 gene Proteins 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 230000010485 coping Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
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- H—ELECTRICITY
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
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- B65G47/90—Devices for picking-up and depositing articles or materials
- B65G47/91—Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
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- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
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Description
前記基板の裏面において前記基板保持部に保持される領域の外側領域を支持する載置部と当該基板保持部との間で、前記基板保持部が第1の高さ位置と第2の高さ位置との間を昇降する途中で当該基板の受け渡しが行われるように当該基板保持部を昇降させる昇降機構と、
前記吸引孔に接続され、前記基板保持部に前記基板が保持された状態と、前記基板保持部に前記基板が保持されていない状態とが切り替わることにより圧力が変化する吸引路と、
前記第1の高さ位置と前記第2の高さ位置との間を前記基板保持部が昇降する間における前記吸引路の圧力の時系列データを取得するために、当該吸引路に設けられる圧力センサと、
前記時系列データに基づいて、前記基板の受け渡しが行われた受け渡し高さ位置の情報を取得する検出部と、
前記受け渡し高さ位置の情報に基づいて、前記基板保持部が前記基板を前記載置部に受け渡すときの受け渡し高さ位置に対する前記第1の高さ位置及び前記第2の高さ位置の相対位置を補正する補正機構と、
予め設定された期間内に取得された複数の前記受け渡し高さ位置の情報と、前記補正を行った回数と、を記憶する記憶部が設けられ、
前記記憶部に記憶される前記複数の前記受け渡し高さ位置の情報及び前記補正を行った回数に基づいて前記補正機構による補正を行うか否かを判定する判定部と、
を備えたことを特徴とする。
前記基板の裏面において前記基板保持部に保持される領域の外側領域を支持する載置部と当該基板保持部との間で前記基板の受け渡しを行う工程と、
前記基板保持部が第1の高さ位置と第2の高さ位置との間を昇降する途中で前記基板の受け渡しが行われるように昇降機構によって前記基板保持部を昇降させる工程と、
前記基板保持部に前記基板が保持された状態と、前記基板保持部に前記基板が保持されていない状態とを切り替え、前記吸引孔に接続される吸引路の圧力を変化させる工程と、
前記吸引路に設けられる圧力センサにより、前記第1の高さ位置と前記第2の高さ位置との間を前記基板保持部が移動している間の前記吸引路の圧力の時系列データを取得する工程と、
前記時系列データに基づいて、前記基板の受け渡しが行われた受け渡し高さ位置の情報を取得する工程と、
前記受け渡し高さ位置の情報に基づいて、前記基板保持部が前記基板を前記載置部に受け渡すときの受け渡し高さ位置に対する前記第1の高さ位置及び前記第2の高さ位置の相対位置を補正機構により補正する工程と、
予め設定された期間内に取得された複数の前記受け渡し高さ位置の情報と、前記補正を行った回数とを記憶部に記憶させる工程と、
前記記憶部に記憶される前記複数の前記受け渡し高さ位置の情報及び前記補正を行った回数に基づいて前記補正機構による補正を行うか否かを判定する工程と、
を備えたことを特徴とする。
続いて、本発明に関連して行われた評価試験について説明する。評価試験1として、受け渡しモジュールTRS3にウエハWを載置し、このウエハWから6mm離れた下方に、発明の実施の形態で説明した搬送アームF3のフォーク25を配置し、然る後、当該フォーク25を上昇させてウエハWの受取りを行った。そして、このフォーク25の上昇中に図12〜図14で説明した排気圧の時系列データの取得及び各種の演算処理を行い、図14のグラフで説明したように偏差の累積和の最大値を求め、この最大値に対応するフォーク25の上昇が開始されてからフォーク25によるウエハWの受取りが行われるまでの時間(受取り検出時間とする)、及びフォーク25の上昇開始位置とフォーク25によるウエハWの受取りが行われた位置との距離(移動距離)を求めた。
W ウエハ
1 塗布、現像装置
25 フォーク
26 爪部
27 吸引孔
29 排気管
31 排気圧センサ
4 制御部
43 モータ
Claims (4)
- 基板の裏面を吸引して吸着保持するための吸引孔を備える基板保持部と、
前記基板の裏面において前記基板保持部に保持される領域の外側領域を支持する載置部と当該基板保持部との間で、前記基板保持部が第1の高さ位置と第2の高さ位置との間を昇降する途中で当該基板の受け渡しが行われるように当該基板保持部を昇降させる昇降機構と、
前記吸引孔に接続され、前記基板保持部に前記基板が保持された状態と、前記基板保持部に前記基板が保持されていない状態とが切り替わることにより圧力が変化する吸引路と、
前記第1の高さ位置と前記第2の高さ位置との間を前記基板保持部が昇降する間における前記吸引路の圧力の時系列データを取得するために、当該吸引路に設けられる圧力センサと、
前記時系列データに基づいて、前記基板の受け渡しが行われた受け渡し高さ位置の情報を取得する検出部と、
前記受け渡し高さ位置の情報に基づいて、前記基板保持部が前記基板を前記載置部に受け渡すときの受け渡し高さ位置に対する前記第1の高さ位置及び前記第2の高さ位置の相対位置を補正する補正機構と、
予め設定された期間内に取得された複数の前記受け渡し高さ位置の情報と、前記補正を行った回数と、を記憶する記憶部が設けられ、
前記記憶部に記憶される前記複数の前記受け渡し高さ位置の情報及び前記補正を行った回数に基づいて前記補正機構による補正を行うか否かを判定する判定部と、
を備えたことを特徴とする基板搬送装置。 - 前記昇降機構は、前記基板保持部の高さ位置に応じた高さ信号を出力し、
前記検出部は、前記受け渡し高さの情報として、前記基板の受け渡しが行われたときに出力される前記高さ信号を特定することを特徴とする請求項1記載の基板搬送装置。 - 前記基板保持部は前記基板の周縁部を保持し、
前記基板の載置部を各々構成する複数のモジュール間で前記基板を搬送するために、前記基板保持部を横方向に移動させる移動機構を備えることを特徴とする請求項1または2記載の基板搬送装置。 - 基板保持部に設けられた吸引孔により基板の裏面を吸引して当該基板を前記基板保持部に吸着保持する工程と、
前記基板の裏面において前記基板保持部に保持される領域の外側領域を支持する載置部と当該基板保持部との間で前記基板の受け渡しを行う工程と、
前記基板保持部が第1の高さ位置と第2の高さ位置との間を昇降する途中で前記基板の受け渡しが行われるように昇降機構によって前記基板保持部を昇降させる工程と、
前記基板保持部に前記基板が保持された状態と、前記基板保持部に前記基板が保持されていない状態とを切り替え、前記吸引孔に接続される吸引路の圧力を変化させる工程と、
前記吸引路に設けられる圧力センサにより、前記第1の高さ位置と前記第2の高さ位置との間を前記基板保持部が移動している間の前記吸引路の圧力の時系列データを取得する工程と、
前記時系列データに基づいて、前記基板の受け渡しが行われた受け渡し高さ位置の情報を取得する工程と、
前記受け渡し高さ位置の情報に基づいて、前記基板保持部が前記基板を前記載置部に受け渡すときの受け渡し高さ位置に対する前記第1の高さ位置及び前記第2の高さ位置の相対位置を補正機構により補正する工程と、
予め設定された期間内に取得された複数の前記受け渡し高さ位置の情報と、前記補正を行った回数とを記憶部に記憶させる工程と、
前記記憶部に記憶される前記複数の前記受け渡し高さ位置の情報及び前記補正を行った回数に基づいて前記補正機構による補正を行うか否かを判定する工程と、
を備えたことを特徴とする基板搬送方法。
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