JP6465577B2 - インプリント装置及び物品の製造方法 - Google Patents

インプリント装置及び物品の製造方法 Download PDF

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Publication number
JP6465577B2
JP6465577B2 JP2014143653A JP2014143653A JP6465577B2 JP 6465577 B2 JP6465577 B2 JP 6465577B2 JP 2014143653 A JP2014143653 A JP 2014143653A JP 2014143653 A JP2014143653 A JP 2014143653A JP 6465577 B2 JP6465577 B2 JP 6465577B2
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JP
Japan
Prior art keywords
substrate
mold
gain
resin
imprint apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014143653A
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English (en)
Japanese (ja)
Other versions
JP2016021441A (ja
JP2016021441A5 (enExample
Inventor
哲司 岡田
哲司 岡田
敬恭 長谷川
敬恭 長谷川
浅野　俊哉
俊哉 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014143653A priority Critical patent/JP6465577B2/ja
Priority to KR1020150095139A priority patent/KR101980415B1/ko
Priority to US14/796,009 priority patent/US10011056B2/en
Publication of JP2016021441A publication Critical patent/JP2016021441A/ja
Publication of JP2016021441A5 publication Critical patent/JP2016021441A5/ja
Application granted granted Critical
Publication of JP6465577B2 publication Critical patent/JP6465577B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/58—Measuring, controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/58—Measuring, controlling or regulating
    • B29C2043/5833—Measuring, controlling or regulating movement of moulds or mould parts, e.g. opening or closing, actuating

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014143653A 2014-07-11 2014-07-11 インプリント装置及び物品の製造方法 Active JP6465577B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014143653A JP6465577B2 (ja) 2014-07-11 2014-07-11 インプリント装置及び物品の製造方法
KR1020150095139A KR101980415B1 (ko) 2014-07-11 2015-07-03 임프린트 장치 및 물품 제조 방법
US14/796,009 US10011056B2 (en) 2014-07-11 2015-07-10 Imprint apparatus and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014143653A JP6465577B2 (ja) 2014-07-11 2014-07-11 インプリント装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016021441A JP2016021441A (ja) 2016-02-04
JP2016021441A5 JP2016021441A5 (enExample) 2017-08-31
JP6465577B2 true JP6465577B2 (ja) 2019-02-06

Family

ID=55066922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014143653A Active JP6465577B2 (ja) 2014-07-11 2014-07-11 インプリント装置及び物品の製造方法

Country Status (3)

Country Link
US (1) US10011056B2 (enExample)
JP (1) JP6465577B2 (enExample)
KR (1) KR101980415B1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10264564B2 (en) * 2015-01-30 2019-04-16 Futurewei Technologies, Inc. System and method for resource allocation for massive carrier aggregation
JP6584176B2 (ja) * 2015-07-09 2019-10-02 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
US10538888B2 (en) * 2016-08-30 2020-01-21 Daniel Tesler Water soluble collection bag and method of use
JP6821387B2 (ja) * 2016-10-24 2021-01-27 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP6818523B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6875879B2 (ja) * 2017-02-22 2021-05-26 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6882103B2 (ja) 2017-07-04 2021-06-02 キヤノン株式会社 インプリント装置、および物品の製造方法
US10409178B2 (en) * 2017-12-18 2019-09-10 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography based on real-time system identification
JP7210162B2 (ja) 2018-05-24 2023-01-23 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
CN112584996A (zh) * 2018-07-03 2021-03-30 泰克瑞典公司 用于压纹的方法及模具
US11066296B1 (en) 2018-08-21 2021-07-20 Iowa State University Research Foundation, Inc. Methods, apparatus, and systems for fabricating solution-based conductive 2D and 3D electronic circuits
JP2020047691A (ja) 2018-09-18 2020-03-26 キオクシア株式会社 摺動阻害箇所抽出方法、パターン形成方法、及び半導体装置の製造方法
JP7117955B2 (ja) * 2018-09-18 2022-08-15 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP7278828B2 (ja) * 2019-03-26 2023-05-22 キヤノン株式会社 成形方法、成形装置、インプリント方法、および物品の製造方法
JP7730727B2 (ja) * 2021-11-10 2025-08-28 キヤノン株式会社 インプリント装置、及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1526411A1 (en) * 2003-10-24 2005-04-27 Obducat AB Apparatus and method for aligning surface
JP4533358B2 (ja) 2005-10-18 2010-09-01 キヤノン株式会社 インプリント方法、インプリント装置およびチップの製造方法
JP4923924B2 (ja) * 2005-11-22 2012-04-25 コニカミノルタホールディングス株式会社 インプリント装置及びインプリント方法
KR101238137B1 (ko) * 2007-02-06 2013-02-28 캐논 가부시끼가이샤 임프린트 방법 및 임프린트 장치
WO2008129962A1 (ja) * 2007-04-19 2008-10-30 Konica Minolta Holdings, Inc. 成形装置及びその制御方法
JP2010080714A (ja) 2008-09-26 2010-04-08 Canon Inc 押印装置および物品の製造方法
KR101642545B1 (ko) * 2009-12-26 2016-07-25 캐논 가부시끼가이샤 임프린트 장치 및 물품의 제조 방법
US9864279B2 (en) 2010-08-05 2018-01-09 Asml Netherlands B.V. Imprint lithography
JP2012084732A (ja) * 2010-10-13 2012-04-26 Canon Inc インプリント方法及び装置
JP2013021155A (ja) * 2011-07-12 2013-01-31 Canon Inc インプリント装置、およびそれを用いた物品の製造方法
JP6039917B2 (ja) * 2012-05-22 2016-12-07 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法

Also Published As

Publication number Publication date
KR20160007378A (ko) 2016-01-20
JP2016021441A (ja) 2016-02-04
US10011056B2 (en) 2018-07-03
KR101980415B1 (ko) 2019-05-20
US20160009021A1 (en) 2016-01-14

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