JP6453217B2 - 偏光ビームスプリッタ及びその製造方法 - Google Patents

偏光ビームスプリッタ及びその製造方法

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Publication number
JP6453217B2
JP6453217B2 JP2015528527A JP2015528527A JP6453217B2 JP 6453217 B2 JP6453217 B2 JP 6453217B2 JP 2015528527 A JP2015528527 A JP 2015528527A JP 2015528527 A JP2015528527 A JP 2015528527A JP 6453217 B2 JP6453217 B2 JP 6453217B2
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JP
Japan
Prior art keywords
beam splitter
light
less
polarizing beam
prism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2015528527A
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English (en)
Japanese (ja)
Other versions
JP2015532729A (ja
JP2015532729A5 (OSRAM
Inventor
アンドリュー, ジェイ. アウダーカーク,
アンドリュー, ジェイ. アウダーカーク,
ジョセフ, シー. カールズ,
ジョセフ, シー. カールズ,
スコット, ビー. チャールズ,
スコット, ビー. チャールズ,
キャメロン, ティー. マレー,
キャメロン, ティー. マレー,
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
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3M Innovative Properties Co
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Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2015532729A publication Critical patent/JP2015532729A/ja
Publication of JP2015532729A5 publication Critical patent/JP2015532729A5/ja
Priority to JP2018232082A priority Critical patent/JP7312546B2/ja
Application granted granted Critical
Publication of JP6453217B2 publication Critical patent/JP6453217B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B27/0172Head mounted characterised by optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B27/0176Head mounted characterised by mechanical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G02B27/285Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining comprising arrays of elements, e.g. microprisms
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • G02B27/017Head mounted
    • G02B2027/0178Eyeglass type

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2015528527A 2012-08-22 2013-08-15 偏光ビームスプリッタ及びその製造方法 Expired - Fee Related JP6453217B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2018232082A JP7312546B2 (ja) 2012-08-22 2018-12-12 偏光ビームスプリッタ及びその製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261692071P 2012-08-22 2012-08-22
US61/692,071 2012-08-22
PCT/US2013/055031 WO2014031417A2 (en) 2012-08-22 2013-08-15 Polarizing beam splitter and methods of making same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018232082A Division JP7312546B2 (ja) 2012-08-22 2018-12-12 偏光ビームスプリッタ及びその製造方法

Publications (3)

Publication Number Publication Date
JP2015532729A JP2015532729A (ja) 2015-11-12
JP2015532729A5 JP2015532729A5 (OSRAM) 2016-08-12
JP6453217B2 true JP6453217B2 (ja) 2019-01-16

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2015528527A Expired - Fee Related JP6453217B2 (ja) 2012-08-22 2013-08-15 偏光ビームスプリッタ及びその製造方法
JP2018232082A Active JP7312546B2 (ja) 2012-08-22 2018-12-12 偏光ビームスプリッタ及びその製造方法

Family Applications After (1)

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Country Status (7)

Country Link
US (2) US9488848B2 (OSRAM)
EP (2) EP2888625A2 (OSRAM)
JP (2) JP6453217B2 (OSRAM)
KR (1) KR102069572B1 (OSRAM)
CN (2) CN104620158B (OSRAM)
TW (1) TWI629514B (OSRAM)
WO (1) WO2014031417A2 (OSRAM)

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KR102139501B1 (ko) 2012-08-21 2020-07-30 쓰리엠 이노베이티브 프로퍼티즈 컴파니 관찰 장치
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TW201528379A (zh) * 2013-12-20 2015-07-16 Applied Materials Inc 雙波長退火方法與設備
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JP6989977B2 (ja) * 2020-03-24 2022-01-12 フェニックス電機株式会社 光照射装置、およびこれを備える露光装置
US20230296968A1 (en) * 2020-08-30 2023-09-21 Lumus Ltd. Reflective slm image projector with intermediate image plane
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CN114236855A (zh) * 2022-02-14 2022-03-25 北京瑞波科技术有限公司 光学系统和ar设备

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Also Published As

Publication number Publication date
JP2015532729A (ja) 2015-11-12
TWI629514B (zh) 2018-07-11
CN106444066A (zh) 2017-02-22
US20150219919A1 (en) 2015-08-06
US9488848B2 (en) 2016-11-08
US9864207B2 (en) 2018-01-09
EP2888625A2 (en) 2015-07-01
CN106444066B (zh) 2019-02-26
CN104620158B (zh) 2018-06-08
WO2014031417A3 (en) 2014-04-17
CN104620158A (zh) 2015-05-13
TW201415088A (zh) 2014-04-16
JP7312546B2 (ja) 2023-07-21
JP2019066871A (ja) 2019-04-25
WO2014031417A2 (en) 2014-02-27
KR20150046143A (ko) 2015-04-29
US20170003514A1 (en) 2017-01-05
EP3037868A1 (en) 2016-06-29
KR102069572B1 (ko) 2020-01-28

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