JP6452338B2 - ステージ装置、およびその駆動方法 - Google Patents

ステージ装置、およびその駆動方法 Download PDF

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Publication number
JP6452338B2
JP6452338B2 JP2014156173A JP2014156173A JP6452338B2 JP 6452338 B2 JP6452338 B2 JP 6452338B2 JP 2014156173 A JP2014156173 A JP 2014156173A JP 2014156173 A JP2014156173 A JP 2014156173A JP 6452338 B2 JP6452338 B2 JP 6452338B2
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JP
Japan
Prior art keywords
stage
electromagnet
thrust
actuator
stroke
Prior art date
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Active
Application number
JP2014156173A
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English (en)
Japanese (ja)
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JP2015073083A5 (enExample
JP2015073083A (ja
Inventor
勉 寺尾
勉 寺尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014156173A priority Critical patent/JP6452338B2/ja
Priority to US14/474,411 priority patent/US20150062552A1/en
Priority to KR1020140116973A priority patent/KR101823726B1/ko
Publication of JP2015073083A publication Critical patent/JP2015073083A/ja
Publication of JP2015073083A5 publication Critical patent/JP2015073083A5/ja
Priority to KR1020180008567A priority patent/KR20180043759A/ko
Application granted granted Critical
Publication of JP6452338B2 publication Critical patent/JP6452338B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2014156173A 2013-09-04 2014-07-31 ステージ装置、およびその駆動方法 Active JP6452338B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014156173A JP6452338B2 (ja) 2013-09-04 2014-07-31 ステージ装置、およびその駆動方法
US14/474,411 US20150062552A1 (en) 2013-09-04 2014-09-02 Stage apparatus and its driving method
KR1020140116973A KR101823726B1 (ko) 2013-09-04 2014-09-03 스테이지 장치 및 그 구동 방법
KR1020180008567A KR20180043759A (ko) 2013-09-04 2018-01-24 스테이지 장치 및 그 구동 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013182874 2013-09-04
JP2013182874 2013-09-04
JP2014156173A JP6452338B2 (ja) 2013-09-04 2014-07-31 ステージ装置、およびその駆動方法

Publications (3)

Publication Number Publication Date
JP2015073083A JP2015073083A (ja) 2015-04-16
JP2015073083A5 JP2015073083A5 (enExample) 2017-09-07
JP6452338B2 true JP6452338B2 (ja) 2019-01-16

Family

ID=52582793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014156173A Active JP6452338B2 (ja) 2013-09-04 2014-07-31 ステージ装置、およびその駆動方法

Country Status (3)

Country Link
US (1) US20150062552A1 (enExample)
JP (1) JP6452338B2 (enExample)
KR (2) KR101823726B1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7022527B2 (ja) * 2017-07-07 2022-02-18 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
JP7005344B2 (ja) * 2017-12-28 2022-01-21 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法
WO2019177337A1 (ko) * 2018-03-12 2019-09-19 (주)큐엠씨 발광다이오드 칩을 전사하는 전사 장치 및 방법
KR102042100B1 (ko) * 2018-03-12 2019-11-07 ㈜큐엠씨 발광다이오드 칩을 전사하는 전사 장치
KR102238999B1 (ko) * 2019-07-18 2021-04-12 세메스 주식회사 기판 지지 모듈 및 이를 구비하는 프로브 스테이션
KR102731545B1 (ko) * 2022-04-01 2024-11-18 (주)마이크로모션텍 6자유도 모션 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
JP2003045785A (ja) * 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
US7253576B2 (en) * 2004-04-05 2007-08-07 Nikon Corporation E/I core actuator commutation formula and control method
JP5878676B2 (ja) * 2012-10-09 2016-03-08 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 位置決めの装置、制御装置及び制御方法

Also Published As

Publication number Publication date
KR20150027718A (ko) 2015-03-12
JP2015073083A (ja) 2015-04-16
KR101823726B1 (ko) 2018-01-30
KR20180043759A (ko) 2018-04-30
US20150062552A1 (en) 2015-03-05

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