JP6438219B2 - ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法 - Google Patents

ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法 Download PDF

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Publication number
JP6438219B2
JP6438219B2 JP2014124684A JP2014124684A JP6438219B2 JP 6438219 B2 JP6438219 B2 JP 6438219B2 JP 2014124684 A JP2014124684 A JP 2014124684A JP 2014124684 A JP2014124684 A JP 2014124684A JP 6438219 B2 JP6438219 B2 JP 6438219B2
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Japan
Prior art keywords
stage
signal
control unit
vibration
substrate
Prior art date
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Expired - Fee Related
Application number
JP2014124684A
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English (en)
Japanese (ja)
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JP2016004440A (ja
JP2016004440A5 (enExample
Inventor
智史 圓山
智史 圓山
光男 平田
光男 平田
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014124684A priority Critical patent/JP6438219B2/ja
Priority to KR1020150083121A priority patent/KR101862053B1/ko
Priority to US14/740,705 priority patent/US9720334B2/en
Priority to CN201510336733.7A priority patent/CN105319863B/zh
Publication of JP2016004440A publication Critical patent/JP2016004440A/ja
Publication of JP2016004440A5 publication Critical patent/JP2016004440A5/ja
Application granted granted Critical
Publication of JP6438219B2 publication Critical patent/JP6438219B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Linear Motors (AREA)
  • Control Of Position Or Direction (AREA)
JP2014124684A 2014-06-17 2014-06-17 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法 Expired - Fee Related JP6438219B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014124684A JP6438219B2 (ja) 2014-06-17 2014-06-17 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法
KR1020150083121A KR101862053B1 (ko) 2014-06-17 2015-06-12 스테이지 장치, 리소그래피 장치, 물품의 제조방법, 및 결정방법
US14/740,705 US9720334B2 (en) 2014-06-17 2015-06-16 Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method
CN201510336733.7A CN105319863B (zh) 2014-06-17 2015-06-17 台架装置、光刻装置、物品的制造方法和确定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014124684A JP6438219B2 (ja) 2014-06-17 2014-06-17 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法

Publications (3)

Publication Number Publication Date
JP2016004440A JP2016004440A (ja) 2016-01-12
JP2016004440A5 JP2016004440A5 (enExample) 2017-07-06
JP6438219B2 true JP6438219B2 (ja) 2018-12-12

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JP2014124684A Expired - Fee Related JP6438219B2 (ja) 2014-06-17 2014-06-17 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法

Country Status (4)

Country Link
US (1) US9720334B2 (enExample)
JP (1) JP6438219B2 (enExample)
KR (1) KR101862053B1 (enExample)
CN (1) CN105319863B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021064308A (ja) * 2019-10-17 2021-04-22 株式会社Ｓｕｂａｒｕ 最適制御システム
US11422460B2 (en) * 2019-12-12 2022-08-23 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography using feedback and feedforward control
US11604408B2 (en) * 2021-02-24 2023-03-14 Canon Kabushiki Kaisha Adaptive feedforward and feedback control for controlled viscosity alignment and field-to-field related friction variation

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06202736A (ja) * 1992-12-28 1994-07-22 Yaskawa Electric Corp トルクリップル補償機能付制御装置
DE69412719T2 (de) * 1993-06-24 1999-02-18 Canon K.K., Tokio/Tokyo Steuerung für einen mehrphasigen Motor
JPH07299778A (ja) * 1994-05-10 1995-11-14 Daikin Ind Ltd ロボット制御装置
JP2001075611A (ja) * 1999-09-02 2001-03-23 Kawasaki Steel Corp セットアップモデルの自動構築方法及び装置
JP2001175332A (ja) 1999-12-22 2001-06-29 Nikon Corp ステージの駆動方法、ステージ装置及び露光装置
JP2001297960A (ja) * 2000-04-11 2001-10-26 Nikon Corp ステージ装置および露光装置
JP2002198285A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置およびその制振方法並びに露光装置
JP2003088159A (ja) 2001-09-05 2003-03-20 Yaskawa Electric Corp トルクリップル補正方法および装置
JP4473088B2 (ja) * 2004-10-07 2010-06-02 オークマ株式会社 リニアモータ
JP2006211873A (ja) * 2005-01-31 2006-08-10 Canon Inc 移動体制御装置及び移動体制御方法
JP4678204B2 (ja) 2005-02-18 2011-04-27 横河電機株式会社 Ｘｙステージ
CN1658075A (zh) 2005-03-25 2005-08-24 上海微电子装备有限公司 一种曝光装置
JP2007142093A (ja) * 2005-11-17 2007-06-07 Hitachi High-Technologies Corp ステージ装置、電子線照射装置及び露光装置
JP5007924B2 (ja) * 2006-09-25 2012-08-22 株式会社安川電機 電動機制御装置とその振動抑制方法
KR20100072015A (ko) 2007-09-07 2010-06-29 내셔널 유니버서티 코포레이션 요코하마 내셔널 유니버서티 구동 제어 방법, 구동 제어 장치, 스테이지 제어 방법, 스테이지 제어 장치, 노광 방법, 노광 장치 및 계측 장치
JP5034917B2 (ja) 2007-12-10 2012-09-26 株式会社ニコン ステージ装置、露光装置、およびステージ装置の制御方法
JP2010207038A (ja) * 2009-03-05 2010-09-16 Yokogawa Electric Corp 推力リップル解析方法及び補正方法
JP5540667B2 (ja) * 2009-11-26 2014-07-02 シンフォニアテクノロジー株式会社 制振装置及びこれを備えた車両
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
KR20110108756A (ko) 2010-03-29 2011-10-06 윤경원 다모드 시스템에서 잔류진동 제거 방법
JP6066592B2 (ja) 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法
US9331624B2 (en) * 2013-02-25 2016-05-03 National Taiwan University Thrust ripple mapping system in a precision stage and method thereof

Also Published As

Publication number Publication date
JP2016004440A (ja) 2016-01-12
CN105319863A (zh) 2016-02-10
KR101862053B1 (ko) 2018-05-29
CN105319863B (zh) 2018-05-29
US9720334B2 (en) 2017-08-01
KR20150144705A (ko) 2015-12-28
US20150362846A1 (en) 2015-12-17

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