JP6395539B2 - 液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 - Google Patents
液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 Download PDFInfo
- Publication number
- JP6395539B2 JP6395539B2 JP2014193672A JP2014193672A JP6395539B2 JP 6395539 B2 JP6395539 B2 JP 6395539B2 JP 2014193672 A JP2014193672 A JP 2014193672A JP 2014193672 A JP2014193672 A JP 2014193672A JP 6395539 B2 JP6395539 B2 JP 6395539B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon substrate
- supply path
- substrate
- etching
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14145—Structure of the manifold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014193672A JP6395539B2 (ja) | 2014-09-24 | 2014-09-24 | 液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 |
| US14/860,536 US9669628B2 (en) | 2014-09-24 | 2015-09-21 | Liquid ejection head substrate, method of manufacturing the same, and method of processing silicon substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014193672A JP6395539B2 (ja) | 2014-09-24 | 2014-09-24 | 液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016064540A JP2016064540A (ja) | 2016-04-28 |
| JP2016064540A5 JP2016064540A5 (enExample) | 2017-10-12 |
| JP6395539B2 true JP6395539B2 (ja) | 2018-09-26 |
Family
ID=55524947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014193672A Active JP6395539B2 (ja) | 2014-09-24 | 2014-09-24 | 液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US9669628B2 (enExample) |
| JP (1) | JP6395539B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11014359B2 (en) * | 2018-09-21 | 2021-05-25 | Fujifilm Dimatix, Inc. | Internal print head flow features |
| WO2021008700A1 (en) * | 2019-07-17 | 2021-01-21 | Scrona Ag | Inkjet print head with contamination robustness |
| JP2023097080A (ja) * | 2021-12-27 | 2023-07-07 | 花王株式会社 | インクジェット記録用水系インク |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3984689B2 (ja) | 1996-11-11 | 2007-10-03 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
| JPH11348282A (ja) | 1998-06-09 | 1999-12-21 | Seiko Epson Corp | インクジェットヘッド及びその製造方法 |
| JP2001162802A (ja) | 1999-12-07 | 2001-06-19 | Fuji Xerox Co Ltd | インクジェットヘッド及びその作製方法 |
| US6805432B1 (en) | 2001-07-31 | 2004-10-19 | Hewlett-Packard Development Company, L.P. | Fluid ejecting device with fluid feed slot |
| US6648454B1 (en) * | 2002-10-30 | 2003-11-18 | Hewlett-Packard Development Company, L.P. | Slotted substrate and method of making |
| JP4854336B2 (ja) | 2006-03-07 | 2012-01-18 | キヤノン株式会社 | インクジェットヘッド用基板の製造方法 |
| JP2009006552A (ja) * | 2007-06-27 | 2009-01-15 | Canon Inc | インクジェット記録ヘッドおよびインクジェット記録装置 |
| AT507226B1 (de) * | 2008-08-28 | 2010-09-15 | Univ Wien Tech | Mikrofluidvorrichtung |
| JP5329932B2 (ja) * | 2008-12-08 | 2013-10-30 | 佐藤 一雄 | シリコン微細構造体の製造方法及び微細流路デバイスの製造方法 |
| US8251497B2 (en) * | 2008-12-18 | 2012-08-28 | Eastman Kodak Company | Injection molded mounting substrate |
| KR20100081557A (ko) * | 2009-01-06 | 2010-07-15 | 삼성전자주식회사 | 잉크젯 프린트헤드의 잉크피드홀 및 그 형성방법 |
| JP5455461B2 (ja) * | 2009-06-17 | 2014-03-26 | キヤノン株式会社 | シリコン基板の加工方法及び液体吐出ヘッド用基板の製造方法 |
| JP5738025B2 (ja) * | 2011-03-18 | 2015-06-17 | キヤノン株式会社 | 液体吐出ヘッド |
| JP2013028155A (ja) * | 2011-06-21 | 2013-02-07 | Canon Inc | 液体吐出ヘッド用基板の製造方法 |
| US20140307029A1 (en) * | 2013-04-10 | 2014-10-16 | Yonglin Xie | Printhead including tuned liquid channel manifold |
-
2014
- 2014-09-24 JP JP2014193672A patent/JP6395539B2/ja active Active
-
2015
- 2015-09-21 US US14/860,536 patent/US9669628B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20160082731A1 (en) | 2016-03-24 |
| US9669628B2 (en) | 2017-06-06 |
| JP2016064540A (ja) | 2016-04-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7727411B2 (en) | Manufacturing method of substrate for ink jet head and manufacturing method of ink jet recording head | |
| JP5031492B2 (ja) | インクジェットヘッド基板の製造方法 | |
| JP4480182B2 (ja) | インクジェット記録ヘッド用基板及びインクジェット記録ヘッドの製造方法 | |
| JP5219439B2 (ja) | インクジェット記録ヘッド用基板の製造方法 | |
| JP5455461B2 (ja) | シリコン基板の加工方法及び液体吐出ヘッド用基板の製造方法 | |
| KR20080033111A (ko) | 잉크 젯 프린트 헤드 및 잉크 젯 프린트 헤드의 제조 방법 | |
| JP2009061667A (ja) | シリコン基板の加工方法、及び液体吐出ヘッドの製造方法 | |
| US8951815B2 (en) | Method for producing liquid-discharge-head substrate | |
| JP6395539B2 (ja) | 液体吐出ヘッド用基板の製造方法、及びシリコン基板の加工方法 | |
| JP2012011371A (ja) | ノズルプレート及びその製造方法並びにノズルプレート付きインクジェットプリンタヘッド | |
| JPH11227208A (ja) | 液体噴射記録装置およびその製造方法 | |
| JP2011042167A (ja) | シリコン基板の加工方法および液体吐出ヘッド用基板の製造方法 | |
| JP2010240869A (ja) | 液体吐出ヘッド用基板の製造方法 | |
| CN102470674B (zh) | 液体排出头用基板的制造方法 | |
| JP2013028008A (ja) | 記録ヘッド | |
| US20160347064A1 (en) | Liquid ejection head and method of processing silicon substrate | |
| JP2005066994A (ja) | インクジェット記録ヘッド用チップ、このインクジェット記録ヘッド用チップを有するインクジェット記録ヘッド、このインクジェット記録ヘッドを有するインクジェット記録装置、及び、インクジェット記録ヘッド用チップの製造方法 | |
| JP5959979B2 (ja) | 貫通口を有する基板、液体吐出ヘッド用基板及び液体吐出ヘッドの製造方法 | |
| JP2012121168A (ja) | 液体吐出ヘッド及びその製造方法 | |
| JP4261904B2 (ja) | インクジェット記録ヘッド用基板の製造方法、およびインクジェット記録ヘッドの製造方法 | |
| JP6025581B2 (ja) | 液体吐出ヘッド用基板の製造方法 | |
| JP2005138589A (ja) | 流体イジェクタ装置を形成する方法及び流体イジェクタ | |
| CN101568435A (zh) | 在基材中形成开口的方法以及由此制造的喷墨打印头 | |
| JP2020040227A (ja) | 液体吐出ヘッド用基板、及びその製造方法 | |
| JP2007296694A (ja) | インクジェット記録ヘッドの製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170831 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170831 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180529 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180530 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180725 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180731 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180828 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 6395539 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |