JP6382186B2 - 石油化学製品を製造するための触媒表面および塗膜 - Google Patents
石油化学製品を製造するための触媒表面および塗膜 Download PDFInfo
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- JP6382186B2 JP6382186B2 JP2015515262A JP2015515262A JP6382186B2 JP 6382186 B2 JP6382186 B2 JP 6382186B2 JP 2015515262 A JP2015515262 A JP 2015515262A JP 2015515262 A JP2015515262 A JP 2015515262A JP 6382186 B2 JP6382186 B2 JP 6382186B2
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- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 16
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- 239000010959 steel Substances 0.000 description 11
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- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 2
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- 230000009286 beneficial effect Effects 0.000 description 2
- FDMFQOCGNBYKPY-UHFFFAOYSA-N calcium;dioxido(dioxo)tungsten Chemical compound [Ca+2].[O-][W]([O-])(=O)=O FDMFQOCGNBYKPY-UHFFFAOYSA-N 0.000 description 2
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- 239000001257 hydrogen Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- PPNAOCWZXJOHFK-UHFFFAOYSA-N manganese(2+);oxygen(2-) Chemical class [O-2].[Mn+2] PPNAOCWZXJOHFK-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
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- 229910001256 stainless steel alloy Inorganic materials 0.000 description 2
- 229910052722 tritium Inorganic materials 0.000 description 2
- XSOVSSFUODRADV-UHFFFAOYSA-N CC.[S] Chemical compound CC.[S] XSOVSSFUODRADV-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- KJWZNCXPDZJGSD-UHFFFAOYSA-N [O-2].[Y+3].[W+4].[Ba+2] Chemical compound [O-2].[Y+3].[W+4].[Ba+2] KJWZNCXPDZJGSD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
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- LSNSSRBFBNWYGI-UHFFFAOYSA-N barium;oxotungsten;yttrium Chemical compound [Y].[Ba].[W]=O LSNSSRBFBNWYGI-UHFFFAOYSA-N 0.000 description 1
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- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical class [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/20—Carbon compounds
- B01J27/22—Carbides
- B01J27/224—Silicon carbide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/889—Manganese, technetium or rhenium
- B01J23/8892—Manganese
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/20—Carbon compounds
- B01J27/22—Carbides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/19—Catalysts containing parts with different compositions
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
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- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
- B01J37/0244—Coatings comprising several layers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/30—Tungsten
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/32—Manganese, technetium or rhenium
- B01J23/34—Manganese
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12486—Laterally noncoextensive components [e.g., embedded, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12778—Alternative base metals from diverse categories
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Catalysts (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
Mn系表面:MnO、MnO2、Mn2O3、Mn3O4、MnCr2O4
W系表面:CaWO4、Ba3Y2WO9
・塗膜の形成および塗工
・熱処理によるベース合金を含む塗膜の硬化
・表面生成および触媒的活性化
水素種: H2
キャリアガス/希釈剤 なし、窒素またはアルゴン
温度 400から1000℃
時間: 2から24時間
酸素含有種: 空気、O2、CO2、蒸気
キャリアガス/希釈剤 なし、窒素またはアルゴン
温度 800から1100℃
時間: 4時間から100時間
この実施例は、炭素のガス化を促進するMn系成分の触媒機能を説明する。試験を、Mettler−Toledo TGA/SDTA850システムにおいて、制御された雰囲気下で行った。市販のグラファイト粉末(CERAC、純度99.5%、−325メッシュ)を、炭素指標として使用した。各試験において、グラファイト粉末および試験サンプルの粉末を秤量し、アルミナるつぼにおいてブレンドし、ついで、Mettler−Toledo TGA/SDTA850システムのサンプルホルダ上に置いた。試験中に、サンプル温度を、プログラム制御し、モニターした。サンプルの重量を、連続的に測定し、温度および時間の関数としてプロットした。TGA曲線の開始温度は、炭素のガス化事象の最初の温度を示す。ステップ幅は、グラファイト粉末の重量減少量、すなわち、グラファイトがガス化される量を示す。グラファイト粉末を含み、Mn系成分を添加していない運転を、非触媒炭素ガス化参照として使用した。
この実施例は、発明の塗膜(Mn系表面)の不活性を説明する。コーキング耐性を、3つのMn系表面塗膜サンプルおよび3つの参照サンプルである、アルミナ、酸化KHR45A合金およびニッケルのクーポンにおいて試験した。3つの参照サンプルの中でも、ニッケルは、繊維状コークスを形成するための周知の触媒であり、アルミナは、コークス形成に対して不活性な表面を表す。KHR45Aは、35%Cr−45%Ni−Fe(残部)の組成を有する高温合金である。KHR45Aを、空気において850℃で8時間予備酸化して、触媒的コークス形成に対して不活性な、クロム酸化物であるCr2O3が優位を占める表面を生成した。3.81、7.62および15.42質量%のMnでドープされた3つのMn系表面塗膜サンプルも、同じ条件下で酸化させて、マンガン酸化物表面を生成した。
この実施例では、高温での硫黄暴露下における候補触媒の安定性を評価した。候補触媒の粉末サンプルを、管形の水晶リアクタにおいて、25%のH2Oおよび75%のAr下で処理した。リアクタを、炉設定において900℃に加熱した。設定温度に達すると、シリンジ注入ポンプにより、ジメチルジスルフィド(DMDS)を、リアクタ内に供給し、ガス流において500ppmの硫黄を提供した。硫黄暴露を、4時間継続し、サンプル温度を、リアクタ内に挿入され、サンプルホルダに取り付けられた熱電対により運転の全体にわたってモニターした。全てのサンプルを、硫黄処理の前後において、実施例1(数字は、実施例の最終的な位置に伴って変化される。)に記載された方法により、XRDにより試験し、炭素ガス化活性について試験した。Mn系の候補触媒の結果を、図14(a)および図14(c)に示し、W系の候補触媒を、図14(b)および図14(d)に示す。注目に値する相変化およびガス化活性の変化は、Mn系およびW系両方の候補触媒についてなかった。
この実施例では、MnOを、高い炭素活性条件下においてその熱安定性について評価した。
Claims (16)
- 塗膜であって、
第1の厚みを有する第1の領域及び第2の厚みを有する第2の領域を有し、
前記第1の領域は、MnxOy、MnCr2O4またはそれらの組み合わせ(xおよびyが、1〜7の整数である。)を含み、及び
前記第2の領域は、X6W6(Siz,C1−z)(Xが、NiまたはNiと1種類以上の遷移金属との混合物であり、zが、0〜1である。)を含む、
ことを特徴とする塗膜。 - 前記第2の領域が、10〜45質量%の範囲のNi、1.5〜12質量%の範囲のMn、2〜10質量%の範囲のFe、5〜10質量%の範囲のSiおよび/またはC、35〜80質量%の範囲のW、0.5〜5質量%の範囲のCr、0〜2質量%の範囲のNb、および0〜2質量%の範囲のTiを含む全体組成を有する、請求項1に記載の塗膜。
- 前記第1の厚みが、0.5〜20μmである、請求項1に記載の塗膜。
- 前記第1の厚みが、1〜10μmである、請求項3に記載の塗膜。
- 前記第2の厚みが、100〜1000μmである、請求項1に記載の塗膜。
- 前記第2の厚みが、200〜500μmである、請求項5に記載の塗膜。
- 前記遷移金属が、Fe、Nb、Cr、Mn、Ti、Mo、W、又はそれらの組み合わせを含む、請求項1に記載の塗膜。
- 第1の相及び第2の相を前記第2の領域に有し、
前記第1の相は、前記第2の領域の40〜80%を構成し、そして前記第2の領域の残りの部分が前記第2の相である、請求項1に記載の塗膜。 - 第1の領域が、MnO、Mn2O3、Mn3O4およびMnO2からなる群から選択されるMnxOyを含む、請求項1に記載の塗膜。
- 前記塗膜が、炭素のガス化を触媒する、請求項1に記載の塗膜。
- 前記塗膜が、CaWO4、Ba3Y2WO9またはそれらの組み合わせをさらに含む、請求項1に記載の塗膜。
- 前記CaWO4、Ba3Y2WO9またはそれらの組み合わせが、前記第1の領域の1〜40%を構成する、請求項11に記載の塗膜。
- 前記塗膜が、炭素のガス化を触媒する、請求項12に記載の塗膜。
- 前記第2の領域において、第1の相および第2の相を含み、
前記第1の相は、X 6 W 6 (Si Z ,C 1−Z )の化学量論組成を有する相の混合物であり、及び前記第2の相はXW(Siz,C1−z)を含み、Xが、NiまたはNiと1種類以上の遷移金属との混合物であり、zが、0〜1である、請求項1に記載の塗膜。 - 請求項1に記載の塗膜によりコートされた基材。
- 前記第1の厚みが、1〜10μmであり、前記第2の厚みが、200〜500μmである、請求項1に記載の塗膜。
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