JP6369566B2 - ナノカーボン膜作製用複合基板及びナノカーボン膜の作製方法 - Google Patents

ナノカーボン膜作製用複合基板及びナノカーボン膜の作製方法 Download PDF

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JP6369566B2
JP6369566B2 JP2016566156A JP2016566156A JP6369566B2 JP 6369566 B2 JP6369566 B2 JP 6369566B2 JP 2016566156 A JP2016566156 A JP 2016566156A JP 2016566156 A JP2016566156 A JP 2016566156A JP 6369566 B2 JP6369566 B2 JP 6369566B2
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silicon carbide
thin film
single crystal
crystal silicon
substrate
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JPWO2016104291A1 (ja
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昌次 秋山
昌次 秋山
芳宏 久保田
芳宏 久保田
川合　信
信 川合
小西　繁
繁 小西
弘 茂木
弘 茂木
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Shin Etsu Chemical Co Ltd
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JP2016566156A 2014-12-22 2015-12-16 ナノカーボン膜作製用複合基板及びナノカーボン膜の作製方法 Active JP6369566B2 (ja)

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Application Number Priority Date Filing Date Title
JP2014258810 2014-12-22
JP2014258810 2014-12-22
PCT/JP2015/085237 WO2016104291A1 (ja) 2014-12-22 2015-12-16 複合基板、ナノカーボン膜の作製方法及びナノカーボン膜

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CN107108218A (zh) 2017-08-29
CN111403265A (zh) 2020-07-10
TWI673177B (zh) 2019-10-01
KR20170097056A (ko) 2017-08-25
SG11201704904WA (en) 2017-07-28
EP3239100A4 (de) 2018-07-11
JPWO2016104291A1 (ja) 2017-08-31
EP3239100A1 (de) 2017-11-01
US10781104B2 (en) 2020-09-22
WO2016104291A1 (ja) 2016-06-30
KR102427272B1 (ko) 2022-07-29

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