JP6352816B2 - 樹脂容器用コーティング装置および樹脂容器製造システム - Google Patents
樹脂容器用コーティング装置および樹脂容器製造システム Download PDFInfo
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- JP6352816B2 JP6352816B2 JP2014557488A JP2014557488A JP6352816B2 JP 6352816 B2 JP6352816 B2 JP 6352816B2 JP 2014557488 A JP2014557488 A JP 2014557488A JP 2014557488 A JP2014557488 A JP 2014557488A JP 6352816 B2 JP6352816 B2 JP 6352816B2
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- container
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0235—Containers
- B65G2201/0244—Bottles
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Coating Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Description
コーティング処理が行なわれる初期状態では、4つの容器保持部材5a,5b,5c,5dは全て空の状態、すなわち、樹脂容器は載置されていない状態になっている。この状態をこの初期状態として、図1を参照して以下説明していく。
本出願は、2013年1月18日出願の日本特許出願・出願番号2013-007369に基づくものであり、その内容はここに参照として取り込まれる。
Claims (5)
- 回転台と、
前記回転台を回転させるための駆動機構と、
前記回転台上に設置され、少なくとも4つの樹脂容器を直線上に並んだ状態で保持することが可能な容器保持部材と、
前記容器保持部材と組み合わされた状態において、前記容器保持部材に保持された前記樹脂容器の内面に薄膜を形成するコーティング処理を行うことが可能な電極部材と、
を備え、
前記容器保持部材は、前記樹脂容器が供給される容器供給位置と、前記電極部材と組み合わされた状態で前記コーティング処理が行われるコーティング処理位置と、前記コーティング処理によって薄膜が形成された前記樹脂容器を取り出すことが可能な容器取出位置とに配置されるように前記回転台上に複数設置され、
前記回転台上に複数設置された前記容器保持部材の各々は、前記回転台の回転に伴い、前記容器供給位置と、前記コーティング処理位置と、前記容器取出位置とを順次移動することを特徴とする樹脂容器用コーティング装置。 - 前記容器保持部材は、さらに、前記コーティング処理によって薄膜が形成された前記樹脂容器の内部をクリーニングするクリーニング処理位置に配置されるように、前記回転台上に設置され、
前記回転台上に複数設置された前記容器保持部材の各々は、前記回転台の回転に伴い、前記容器供給位置と、前記コーティング処理位置と、前記クリーニング処理位置と、前記容器取出位置とを順次移動することを特徴とする請求項1に記載の樹脂容器用コーティング装置。 - 請求項1または請求項2において、
前記回転台を回転可能に上面に配置する機台と、
前記機台の下方に配置され前記駆動機構を収容する機台ベースと、
前記回転台に固定され前記駆動機構からの運動を伝達する支軸と、
を更に備え、
複数の前記容器保持部材の各々は、前記支軸を中心として90度間隔で前記回転板の上面に配置され、
複数の前記容器保持部材の各々は、90度毎に間欠的に回転されて前記容器供給位置と、前記コーティング処理位置と、前記容器取出位置とを順次移動する、
ことを特徴とする樹脂容器用コーティング装置。 - 請求項3において、
前記機台の上面の中央部には前記回転台を取り付けるための円形状の凹部が形成されており、
前記回転台の径は、前記機台の凹部の径よりも僅かに小さく形成されており、
前記回転台の上面と前記機台の上面とは略同じ高さとなるように配置されている、
ことを特徴とする樹脂容器用コーティング装置。 - 前記樹脂容器を製造する樹脂容器製造装置と、
請求項1から請求項4のいずれか一項に記載の樹脂容器用コーティング装置と、
前記樹脂容器製造装置によって製造され保持された状態の前記樹脂容器を、前記樹脂容器製造装置から取り出して前記樹脂容器用コーティング装置の前記容器供給位置まで搬送し、前記容器供給位置に配置された前記容器保持部材に少なくとも4つの前記樹脂容器を直線上に並んだ状態で保持させる樹脂容器搬送装置と、を備えることを特徴とする樹脂容器製造システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013007369 | 2013-01-18 | ||
JP2013007369 | 2013-01-18 | ||
PCT/JP2014/050596 WO2014112533A1 (ja) | 2013-01-18 | 2014-01-15 | 樹脂容器用コーティング装置および樹脂容器製造システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2014112533A1 JPWO2014112533A1 (ja) | 2017-01-19 |
JP6352816B2 true JP6352816B2 (ja) | 2018-07-04 |
Family
ID=51209622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014557488A Expired - Fee Related JP6352816B2 (ja) | 2013-01-18 | 2014-01-15 | 樹脂容器用コーティング装置および樹脂容器製造システム |
Country Status (4)
Country | Link |
---|---|
US (1) | US10106886B2 (ja) |
EP (1) | EP2947177B1 (ja) |
JP (1) | JP6352816B2 (ja) |
WO (1) | WO2014112533A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6644696B2 (ja) * | 2014-10-27 | 2020-02-12 | 日精エー・エス・ビー機械株式会社 | 樹脂容器用コーティング装置および樹脂容器製造システム |
JP6480195B2 (ja) * | 2015-01-23 | 2019-03-06 | キリン株式会社 | 物品の処理装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
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US5951373A (en) * | 1995-10-27 | 1999-09-14 | Applied Materials, Inc. | Circumferentially oscillating carousel apparatus for sequentially processing substrates for polishing and cleaning |
US6924001B2 (en) * | 2000-12-25 | 2005-08-02 | Mitsubishi Shoji Plastics Corporation | Production device for DLC film-coated plastic container and production method therefor |
JP4804654B2 (ja) | 2001-06-27 | 2011-11-02 | 株式会社ユーテック | 容器内面成膜用cvd装置及び容器内面成膜方法 |
DE10202311B4 (de) | 2002-01-23 | 2007-01-04 | Schott Ag | Vorrichtung und Verfahren zur Plasmabehandlung von dielektrischen Körpern |
CN100374617C (zh) * | 2002-05-24 | 2008-03-12 | 肖特股份公司 | 化学气相沉积涂涂料设备 |
AU2003237688A1 (en) * | 2002-05-24 | 2003-12-12 | Schott Ag | Method and device for plasma treating workpieces |
JP4149748B2 (ja) * | 2002-06-24 | 2008-09-17 | 三菱商事プラスチック株式会社 | ロータリー型量産用cvd成膜装置及びプラスチック容器内表面へのcvd膜成膜方法 |
JP2005002469A (ja) * | 2003-05-16 | 2005-01-06 | Mitsubishi Heavy Ind Ltd | 樹脂容器の成膜監視装置及び成膜監視方法並びに樹脂容器の製造システム |
JP4437647B2 (ja) * | 2003-07-17 | 2010-03-24 | 三菱商事プラスチック株式会社 | ガスバリア膜コーティングプラスチック容器の製造方法 |
JP2005178890A (ja) * | 2003-12-24 | 2005-07-07 | Dainippon Printing Co Ltd | 包装体の殺菌方法および包装体 |
JP5355860B2 (ja) * | 2007-03-16 | 2013-11-27 | 三菱重工食品包装機械株式会社 | バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器 |
DE102011009057B4 (de) * | 2011-01-20 | 2015-12-10 | Schott Ag | Plasma-Behandlungsvorrichtung zur Herstellung von Beschichtungen und Verfahren zur innenseitigen Plasmabehandlung von Behältern |
CN103649370B (zh) * | 2011-07-06 | 2016-03-23 | 株式会社神户制钢所 | 真空成膜装置 |
-
2014
- 2014-01-15 JP JP2014557488A patent/JP6352816B2/ja not_active Expired - Fee Related
- 2014-01-15 US US14/761,924 patent/US10106886B2/en not_active Expired - Fee Related
- 2014-01-15 WO PCT/JP2014/050596 patent/WO2014112533A1/ja active Application Filing
- 2014-01-15 EP EP14740984.1A patent/EP2947177B1/en active Active
Also Published As
Publication number | Publication date |
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EP2947177B1 (en) | 2021-11-10 |
US20150354057A1 (en) | 2015-12-10 |
EP2947177A4 (en) | 2016-08-24 |
US10106886B2 (en) | 2018-10-23 |
EP2947177A1 (en) | 2015-11-25 |
WO2014112533A1 (ja) | 2014-07-24 |
JPWO2014112533A1 (ja) | 2017-01-19 |
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