CN100374617C - 化学气相沉积涂涂料设备 - Google Patents

化学气相沉积涂涂料设备 Download PDF

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Publication number
CN100374617C
CN100374617C CNB031409881A CN03140988A CN100374617C CN 100374617 C CN100374617 C CN 100374617C CN B031409881 A CNB031409881 A CN B031409881A CN 03140988 A CN03140988 A CN 03140988A CN 100374617 C CN100374617 C CN 100374617C
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China
Prior art keywords
coating
coating station
equipment
workpiece
transport unit
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Expired - Lifetime
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CNB031409881A
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CN1495285A (zh
Inventor
格雷戈尔·阿诺尔德
斯特凡·贝勒
安德烈亚斯·吕特林豪斯-亨克尔
马蒂亚斯·比克尔
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Schott AG
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Schott Glaswerke AG
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Priority claimed from DE2002124934 external-priority patent/DE10224934B4/de
Priority claimed from DE2002125609 external-priority patent/DE10225609A1/de
Priority claimed from DE10227637A external-priority patent/DE10227637A1/de
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Publication of CN1495285A publication Critical patent/CN1495285A/zh
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Publication of CN100374617C publication Critical patent/CN100374617C/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/42—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus being characterised by means for conveying or carrying containers therethrough
    • B08B9/426—Grippers for bottles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42069—Means explicitly adapted for transporting blown article
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G29/00—Rotary conveyors, e.g. rotating discs, arms, star-wheels or cones
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C03C17/004—Coating the inside
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C03C17/005—Coating the outside
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/0004—Use of compounding ingredients, the chemical constitution of which is unknown, broadly defined, or irrelevant
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • B—PERFORMING OPERATIONS; TRANSPORTING
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Abstract

为了经济有效地进行长时间的化学气相沉积涂料，本发明提供了一种化学气相沉积涂料设备，该设备包括一个传送装置；至少一个用于涂料工件的涂料站；至少一个抽空装置以及一个用来至少在涂料站的一个子区域内形成等离子体的装置；在该设备中，该至少的一个涂料站内至少能接收两个工件。

Description

化学气相沉积涂涂料设备
技术领域
本发明涉及一种用于化学气相沉积对工件涂料的设备，特别是一种用来同时对多个工件涂涂料的设备。
背景技术
为了增强塑料容器如塑料瓶的隔离功能，该塑料容器可带有隔离层。这类涂料可通过各种CVD工艺(CVD：化学气相沉积)来沉积到容器壁等的上面。
等离子脉冲CVD(PICVD)法(脉冲的微波等离子)是一种特别适用于塑料容器的沉积方法。与等离子增强型化学气相沉积(PECVD)相比，该PECVD法中的等离子保持连续，PICVD法在许多方面都具有优点，因为该方法能够减少温度敏感塑料的加热程度。此外，在脉冲之间、未激励出等离子的时间段里能够进行气体交换。
为此，在实验室规模的涂料装置中，塑料容器要插到涂料站中，该站带有涂料所需的所有技术装置。这些装置尤其包括真空泵、气源、传感器以及微波引进装置等。在真空密封钟罩关闭后，中空腔体的内外排空，然后对容器的内和/或外壁进行涂料。
对于工业级的涂料来说，其需要一种具有相应更高处理能力的机器。例如，带有几个相同的、沿径向布置的涂料站的连续旋转传送装置就很适于这一需要。
但如果要沉积的层需要很长的时间话就会有一个问题。例如，有些涂层所需的涂料时间单次就可能超过20秒。如果涂料的步骤很多，那么在涂料段所需的停留时间也越长。这一点是可以想象的，例如，当塑料物体表面在涂料之前需要活化处理时，或者是需要连续涂上多层材料时，所需的时间均会增加。此时，连续运转的旋转式传送装置在运行上就不再经济，因为其必须相应地放慢速度，或者是其大小必须与处理时间相匹配这就需要非常大且昂贵的机器。
发明内容
因此，本发明的目的在于使CVD涂料更为经济，即使是在处理时间很长时也是如此。
该目的的实现非常简单，只需权利要求1所述的一种用来CVD涂料工件的设备以及如权利要求22所述的一种用于CVD涂料工件的方法即可。更佳更优的方案构成相应的从属权利要求。
据此，本发明提供了一种化学气相沉积涂料设备，包括：一传送装置；至少一个用于涂料工件的涂料站；至少一个抽空装置以及一个至少在涂料站的一个子区域内形成等离子体的装置；在该设备中，该至少的一个涂料站内至少能接收两个工件。
涂料站同时能接收多个工件即意味着：当产量不变时，处理时间就增加一个系数，该系数对应于涂料站内能接收的工件数量。这样就可确保设备的尺寸很小，但同时涂料时间可以长和产量大。
此外，对于许多实施例来说，最好是至少有一个涂料站随着传送装置一起被传送。
至少在涂料站的一个子区域内形成等离子体的装置优选地包括一个用来形成脉冲等离子体的装置。这类装置可对工件进行PICVD涂料因此其具有上述的优点。
多个工件可用一种非常简单地方式布置在至少一个固定器上，同时该固定器可布置在该至少的一个涂料站中。此时，工件要么处于一个平面内，要么堆叠在立体布置的多个平面内。
此外，设备最好按如下方式配置：传送装置将涂料站从至少一个进给位置连续传送到至少一个抽空位置、至少一个涂料位置以及至少一个卸载位置。注意，设备至少可具有四个涂料站，这四个涂料站布置在传送装置上从而当其中一个涂料站处于涂料位置时，其余三个涂料站分别处于进给位置、抽空位置和卸载位置。这样就可使每一个涂料站均参与到其中一个处理步骤中从而使处理程序在时间上达到最优化。
该处理程序的优化还包括使传送装置在涂料时放慢传送速度．此时，如果传送装置在涂料过程中停下来是最好的。由此所形成的与连续式生产的不同之处在于其能够更好地利用时间长度不同的各个生产阶段。
在本发明的优选实施例中，传送装置包括一个旋转设备。这些特征可使设备更为紧凑，机械结构相对更为简单。然而，还可采用例如直线形式从而可从两侧自由操作涂料站。
在涂料站至少的这一子区域中可用一种简单的方式通过一种能够产生电磁波的装置来形成等离子体。此时，最好生成微波，其很容易就能穿过中空的波导并具有很高的能量密度。
此外，本发明的设备最好包括一个装置，该装置将生成电磁波的装置与该至少的一个涂料站相连。这么做的结果是，生成电磁波的装置不必和涂料站一起被传送。此外，这类装置可以只在达到所确定的涂料区域时再将生成电磁波的装置与该至少的一个涂料站相连。
为了使设备的结构更加简单，用来生成电磁波的装置最好布置在一个固定位置上。这样，装置就不必与至少的这一个涂料站一起被传送了。特别是，这样做可使各个涂料站不再需要各自专门的、随传送装置传送的等离子生成装置，从而大大地降低了CVD涂料设备的装置费用。
为了能够更快地达到等离子涂料所需的最终压力，至少应有两个，优选地为多个泵装置或泵级。泵级可对不同的压力范围进行优化。按顺序切换泵级的开关就能用一台容量大大小于单个泵级的压力泵快速达到最终的压力。
此外，本发明的设备还可包括一个装置，该装置将该至少的一个涂料站与至少的两个泵级按顺序连接。这样例如就可在传送装置的给定位置处与涂料站形成连接例如当采用旋转式传送装置时，给定位置处于专门的旋转位置处。
为了在抽空和涂料过程中将工件牢牢地固定住，本发明的设备最好还包括用于至少两个工件的固定装置。该固定装置可包括用于中空结构工件特别是瓶体的接收装置。
此外，引入生产气体的装置对本发明的所有实施例是有利的。为了涂料中空物体如塑料瓶或玻璃瓶等，该装置在设计上还可使生产气体输入到中空物体。如果中空物体固定于密封的接收装置中，那么此时就能在中空物体的内外区域形成不同的气体组分。此时，就能在中空物体的内壁和外壁上形成不同的层体或者只生成内涂层或外涂层，后者只需选择合适的气体组成使电磁辐射仅在内部区域或外部区域中产生等离子体即可。
在本发明的保护范围中还包括有一种用来对工件进行化学气相沉积涂料的方法，即使在处理时间很长时这种方法也能使涂料经济有效。该化学气相沉积涂料的方法可用本发明的设备来实现。这种对工件化学气相沉积涂料的方法包括以下步骤：
-将至少两个工件引入一涂料站内；
-抽空；
-将该至少的两个工件随传送装置一起传送；
-至少在涂料站的一个子区域内生成等离子体；
-排气；以及
-取下工件。
至少在一个子区域内生成等离子体的过程将使生产气体中形成等离子体的组成成分之间产生化学反应。然后，等离子体中的反应起始材料沉积到工件与等离子体相接触的表面上形成涂层。
在形成有等离子体的一个涂料站内处理多个工件会使处理时间加长但不会减少产量，所加长的时间取决于一同处理或涂料的工件数量。为了充分利用在一个共用涂料站内进行涂料的优点，在至少一个子区域中生成等离子体的步骤最好还包括同时CVD涂料至少两个工件的步骤。
此外，对于本发明的不同方法来说，至少的一个涂料站最好随传送装置一起被传送。此时，工件例如就可与接收工件的涂料站一起向前传送，结果，就可在传送装置的移动过程中完成各个处理步骤。
在该方法中，至少在涂料站的一个子区域中生成等离子体的步骤最好包括生成脉冲等离子体的步骤。脉冲等离子体尤其可使在脉冲时高的功率转到等离子体中，同时整个过程时间上的平均功率保持在很低的水平。
本发明的方法中，工件最好布置在引入涂料站的固定器上，由于这一步骤可在涂料设备外部进行，因此需要给相应的设备如机械夹取臂留下一个相应的空间。
将工件布置在涂料站内至少两个高度上可使其中空间得到充分地利用。这一点例如可通过固定器合适的结构布置来实现。
此外，将涂料站随传送装置一起传送的步骤最好包括将涂料站从进给位置传送到一个抽空位置、一个涂料位置以及至少一个卸载位置的步骤。
为了进一步在时间方面对该方法进行优化，将涂料站随传送装置一起传送的步骤可进一步包括在涂料过程中放慢传送速度的步骤，特别是在涂料过程中停止传送的步骤。
此外，至少在涂料站的一个子区域内生成等离子体的步骤最好包括生成电磁波特别是微波的步骤。此外，生成等离子体的步骤最好包括引入生产气体的步骤。
在本发明的最优实施例中，该方法还可包括将一生成电磁波的装置与该至少的一个涂料站相连的步骤。此时，可用一固定装置来生成电磁波，同时带有涂料站的传送装置可移过该固定装置并与这个生成电磁波的装置相连。
为了更快地达到抽空所需的最终压力，抽空步骤还可包括至少采用两个泵级来按顺序进行抽空的步骤。
为了使中空物体工件如瓶体的内部形成涂层，中空物体工件所包围的腔体最好也被抽空。这样，在本优选实施例中，瓶体例如可通过瓶体内部抽空的方式来进行涂料。此外，为了对这类工件进行涂料，引入生产气体的步骤最好包括将生产气体引入中空物体工件的腔体的步骤。
附图说明
下面结合附图以举例的形式对本发明的优选实施例进行描述。图中相同的部件采用相同的附图标记。附图中：
图1为本发明第一实施例的顶视示意图，其带有旋转传送装置；
图2为本发明第二实施例的顶视示意图，其带有旋转传送装置；
图3为本发明第三实施例的顶视示意图，其带有旋转特送装置；以及
图4为设计成直线型传送器的本发明设备的顶视示意图。
具体实施方式
图1为本发明CVD涂料设备1的第一实施例的顶视示意图。在该实施例中，设备1包括：采用旋转式传送器的传送装置2。四个涂料站31、32、33、34固定于旋转传送装置2上。
要涂料的工件布置在托板形式的固定器51、52、53、54上，并送到涂料站31-34上。
工件采用合适的固定装置或接收装置7固定在托板上。此时，可通过例如机械夹取臂来将工件放在托板上并将它们从托板取下。在图1所示设备1的实施例中，一个托板上有16个接收装置7。因此，每次可在一个涂料站内同时对16个工件涂料。
当传送装置2上的涂料站处于进给位置9时，可将固定于托板51-54中一个托板上的工件供应到涂料站31-34上。该进给位置对应于旋转传送器的一个确定的旋转角或转角范围。
如果有一个涂料站，在图1中是涂料站31，处于进给位置，那么其它的涂料站32、33、34则分别处于抽空位置11、涂料位置13和卸载位置15上。
当托板送到涂料站31上时，后者封闭，然后所有的涂料站都在传送装置2上向前传送直到涂料站31到达抽空位置11。在图1所示的设备状态下，其中已带有托板52的涂料站32正处于抽空位置。在这里，涂料站32通过一个合适的装置与抽空装置19相连。在本实施例中，该连接装置包括有真空管道17。抽空装置例如可包括不同类型的泵的组合，这些泵通过连接装置按顺序相连从而为涂料32内瞬时形成要求的压力提供最佳的排空容量。抽空装置19还可与图1所示的情况相反布置在旋转传送器的内部区域21从而使设备1的结构最为紧凑。
在涂料站抽空之后，传送装置向前移动直到该涂料站31处于涂料位置13上。在该涂料位置13处，用来产生微波的装置25与涂料站相连。例如，可通过合适的中空波导23来实现这种连接，图1中仅展示了一个中空波导。对于这里所述的所有实施例来说，涂料站最好通过多个中空波导23，例如每个工件一个中空波导来进行连接从而在涂料站中产生均匀分布的射线。
此外，在涂料站13中，将适合于涂料的生产气体引入涂料站并通过一个泵装置194调节到所需的处理压力，该泵装置可包括适当数量的泵。此外，这个通过一进气管17与此时处于涂料位置13的涂料站相连的泵装置194能泵送出生产气体，该生产气体在涂料时经图中未示出的一个装置供入，由此在涂料过程中形成气体交换。然后借助于装置25射入涂料站的微波而在涂料站内形成等离子体，结果化学反应在运动中在等离子体中形成，从而使工件上那些位于等离子区域内的表面上形成CVD层。
特别是，在工件为中空物体如塑料瓶时，还可将气体引到中空物体的内部。为此，托板的接收装置7在设计上与固定在其上的工件一起形成一个密闭的空腔，该空腔的部分边界由中空物体工件的内壁形成。然后将生产气体引到该空腔中。当微波射入时，等离子体形成，沉积层就沉积在工件的内部或者沉积在由接收装置7和工件形成的空腔中。此时，就可对中空物体工件的内部进行涂料。如果生产气体仅引入到该空腔中，那么当抽空所形成的压力太低时，空腔的外部不会形成等离子体。作为选择，装置19还可仅用来抽空该空腔，结果涂料站的其它部分就处于正常压力下。此时，由于气体密度很高并且气体分子相应的自由行程很短，因此在涂料站的这些部分中不会形成等离子体。
此外，当工件为中空物体时，可将不同的生产气体引到涂料站的空腔和其余区域中。这样，工件的内外壁可分别具有不同类型的沉积层。例如，塑料瓶的内涂层为扩散隔离层，外层为防UV层。
在涂料操作结束后，将涂料站向前转移并使传送装置处于卸载位置15，这里带有涂料工件的托板由合适的设备取下。
传送装置可按顺序连续地移过整个流程然而，传送装置最好在涂料操作时停下来，这样用来向中空波导23发射微波的固定装置25就可不需移动。当传送装置为静止时，与抽空装置19的连接操作以及泵送出气体的操作在实现上也没那么困难。
下面参见图2，其示意性地展示了本发明设备1的另一个实施例。
本实施例的CVD涂料设备1包括八个涂料站31-38。托板形式的固定器51-58适于每次接收八个工件。与图1所示的实施例相比，涂料站31-38与传送装置一起连续进给到多个抽空位置和涂料位置。块形箭头表示的是旋转式传送器的旋转方向。
在图2所示的状态下，涂料站32处于第一抽空位置处，涂料站33处于第二抽空位置处，涂料站34处于第三抽空位置处
在本实施例中，将涂料站抽空的装置包括：位于各抽空位置处的泵装置191、192以及193，并且位于其中一个位置上的涂料站与这些泵装置191、192、193相连。
这样，这些涂料站就会按步骤排空到确定的负压。这些泵装置优选可优化到不同的压力范围，从而即使在其泵容量相对较低时也能有效抽空涂料站。
此外，图2所示的实施例与图1所示的实施例的不同在于图2所示实施例可在多个位置处进行CVD涂料。在图2所示的设备状态下，涂料站35位于第一涂料位置，涂料站36位于第二涂料位置，涂料站37位于第三涂料位置。在其中的每一个位置处，涂料站都要通过中空波导23与一个用来生成微波的装置相连。然后，经中空波导23进入涂料站的微波就在生产气体的区域内生成等离子体，这里等离子体内形成的反应产物沉积到工件与等离子体接触的表面上。与图1所示的设备一样，本实施例也可在设计上用来涂料中空物体工件如塑料瓶的内表面。也可在不同的位置处供入不同的生产气体，这样就可在不同的位置处进行不同的涂料。为了在涂料操作中进行气体交换，分别处于涂料位置上的涂料站需经进气管道17与另一泵装置194相连。
托板可采用与图1所示实施例相同的方式供入和取下。在图2所示设备1的状态下，涂料站31处于进给位置，涂料站38处于卸载位置。
下面参见图3，其展示的是本发明的另一实施例。该实施例包括十六个涂料站31-45，这些涂料站与图1和2所示的实施例类似地放着托板形式的固定器51-64。托板51-64具有接收装置7，接收装置7每次接收四个工件。与图2所示的实施例一样，这些涂料站经三个真空泵级191、192、193抽空。此时，在图中设备1所示的状态下，涂料站35和36所处的两个抽空位置分配给了最后的泵级193。因此，当涂料站与其它两个泵级相连时，它们会分两次与该最后泵级相连。这一点非常好，因为真空泵的抽气容量会随着压力的下降而下降。
涂料操作分两级进行，第一级有两个涂料位置，第二级有四个涂料位置。为此，涂料站会再一次与中空波导23相连，其中的中空波导23与生成微波的装置251和252相连。在涂料位置的变化过程中，中空波导会被再一次地连上或者随着一起传送从而避免CVD涂料的中断。
图4所示为布置成直线形式的本发明设备的示意图。本实施例的传送装置2包括一个由辊23导引的传送链22。传送链22绕辊24的方向传返如箭头所示。用来接收并固定瓶子4的接收装置7固定在传送链上。该瓶子4可插到传送链22上，并可从另一侧取下。因此设备1的结构非常紧凑。
首先，传送轨上的瓶子4被传送螺杆47传送到设备1上，然后通过推杆27从下面推压到接受装置7中。推杆27优选地设计成能使多个瓶子4同时推入到接收装置7中。瓶子4由传送蜗杆47以给定的间距向下放到推杆27上，该间距对应于传送链上接收装置7的间距。然而，对于推杆来说，也可采用一个或多个机械夹臂或类似的装置来代替。此外，接收装置7还可带有夹具以便将瓶子固定住。
然后，固定在接收装置7中的瓶子通过传送链22传送到另一侧。接着，涂料站3下降从而使瓶子收容在涂料站中的传送装置的顶面上。与前述的实施例不同，本实施例的涂料站不随着传送装置2一起被传送。此时，涂料站3优选设计成：收容在涂料站3中的瓶子4的数量对应于被推杆27同时推入接收装置7中的瓶子的数量，从而就能在本发明的一个共用涂料站中同时涂料多个工件。图4所示的每次用于4个瓶子的涂料站的实施例仅是以举例形式给出。
然后，涂料站的内部经抽空装置19抽空，抽空装置19在图中仅是示意性地表示出来其经一个或多个真空管道17与涂料站3相连。
然后，将生产气体引入瓶子4的内部，这里可通过一个经中空波导23与涂料站3相连并形成微波的装置25激励产生等离子体。产生微波的装置25和抽空装置19例如可固定连接到涂料站3上并可与该涂料站3一起上下移动。这些装置还可通过柔性或可拆的连接与涂料站3相连，这样，装置25和抽空装置19就可布置在固定位置处。
在涂料后，将涂料站的内部排空，然后将涂料站3再次升起，传送链将瓶子向前移直到它们回到传送装置2的下面为止这里，可用移取装置48将瓶子4从接收装置7上取下并向下放到传送带30上从而被传送走。这种布置可使瓶子以直立的状态传送到设备1上，并以直立的状态向前传送，因此就可将这种用于罐装厂中的传送技术用于本发明的传送中，其中不需要进行什么大的改变。
附图标记列表
1              CVD涂料设备
2              传送装置
21             传送装置的内部区域
22             传送链
23             辊
3，31-46       涂料站
51-65          托板
4              瓶子
7              工件的接收装置
9              进给位置
11             抽空位置
13             涂料位置
15             卸载位置
17             真空管道
19             抽空装置
191-194        泵送装置
23             中空波导
24             辊
25、251、252   产生微波的装置
27             推杆
29             传送轨
30             传送带
47             传送蜗杆
48             移取装置

Claims (34)

1.一种化学气相沉积涂料设备(1)，其包括：一传送装置(2)；至少一个用于对工件涂料的涂料站(3，31-46)；至少一个抽空装置(19)；以及在涂料站(3，31-46)的至少一个子区域内形成等离子体的装置；其中该至少一个涂料站(3，31-46)内至少能接收两个工件。
2.如权利要求1所述的设备，其特征在于该至少一个涂料站(3，31-46)随着传送装置(2)一起被传送。
3.如权利要求2所述的设备，其特征在于传送装置(2)将涂料站(31-46)从至少一个进给位置(9)连续地传送到至少一个抽空位置(11)、至少一个涂料位置(13)以及至少一个卸载位置(15)。
4.如权利要求3所述的设备，其特征在于所述的设备至少包括有四个涂料站(31-34)，这四个涂料站布置在传送装置(2)上从而当其中一个涂料站(31-34)处于涂料位置(13)时，其余的三个涂料站(31-34)分别处于该至少一个进给位置(9)、至少一个抽空位置(11)和至少一个卸载位置(15)。
5.如权利要求1到4中任一项所述的设备，其特征在于所述在涂料站(31-46)的至少一个子区域内形成等离子体的装置包括一个用来产生脉冲等离子体的装置。
6.如权利要求1至5中任一项所述的设备，其特征在于工件被布置在至少一个固定器(51-65)上，其中该固定器被接纳在该至少一个涂料站(3，31-46)中。
7.如权利要求1至6中任一项所述的设备，其特征在于工件被布置在涂料站内的至少两个高度上。
8.如权利要求1至7中任一项所述的设备，其特征在于在涂料过程中，传送装置(2)放慢传送速度。
9.如权利要求1至8中任一项所述的设备，其特征在于传送装置(2)包括一个旋转设备。
10.如权利要求1至9中任一项所述的设备，其特征在于传送装置(2)包括一个直线设备。
11.如权利要求1至10中任一项所述的设备，其特征在于所述在涂料站(3、31-46)的至少一个子区域内形成等离子体的装置包括一个用来生成电磁波的装置(25)。
12.如权利要求11所述的设备，其特征在于所述用来生成电磁波的装置包括一个用来产生微波的装置(25)。
13.如权利要求11或12所述的设备，其特征在于所述设备包括一个装置，该装置将所述生成电磁波的装置(25)与该至少一个涂料站(3、31-46)相连。
14.如权利要求11、12或13所述的设备，其特征在于所述用来生成电磁波的装置(25)布置在一个固定位置上。
15.如权利要求1至14中任一项所述的设备，其特征在于抽空装置(19)至少包括两个泵级(191、192、193)。
16.如权利要求15所述的设备，其特征在于所述的设备包括一个装置，该装置将该至少一个涂料站(3，31-46)与该至少两个泵级(191、192、193)相继地连接。
17.如权利要求1至16任一项所述的设备，其特征在于所述的设备包括一个引入生产气体的装置。
18.如权利要求1至17中任一项所述的设备，其特征在于所述的设备包括用于该至少两个工件的固定装置。
19.如权利要求18所述的设备，其特征在于所述固定装置包括用于中空物体工件的接收装置(7)。
20.如权利要求19所述的设备，其特征在于所述抽空装置(19)包括一个装置，该装置用来抽空中空物体工件中的空腔。
21.如权利要求18或19所述的设备，其特征在于所述的设备包括一个装置，该装置用来将生产气体引到中空物体工件的空腔中。
22.一种对工件进行化学气相沉积涂料的方法，其采用一个化学气相沉积涂料设备，特别是权利要求1至21中任一所述的化学气相沉积涂料设备，该方法以下步骤：
-将至少两个工件引入一涂料站(3，31-46)内；
-抽空；
-将该至少一个涂料站(31-46)随一传送装置(2)一起传送；
-在涂料站(31-46)的至少一个子区域内生成等离子体；
-排气；以及
-取下工件。
23.如权利要求22所述的方法，其特征在于还包括将该至少一个涂料站随传送装置一起传送的步骤。
24.如权利要求23所述的方法，其特征在于所述在涂料站(31-46)的至少一个子区域内生成等离子体的步骤包括生成脉冲等离子体的步骤。
25.如权利要求23或24所述的方法，其特征在于所述在至少一个子区域内生成等离子体的步骤包括同时对至少两个工件进行化学气相沉积涂料的步骤。
26.如权利要求22至25中任一项所述的方法，其特征在于所述将至少两个工件引入该至少一个涂料站(31-46)的步骤包括引入一固定器(51-65)的步骤，其中工件就布置在该固定器上。
27.如权利要求22至26中任一项所述的方法，其特征在于所述将涂料站(31-46)随一传送装置(2)一起传送的步骤包括将涂料站从一进给位置(9)传送到一个抽空位置(11)、一个涂料位置(13)以及一个卸载位置(15)的步骤。
28.如权利要求22至27中任一项所述的方法，其特征在于将涂料站(31-46)随一传送装置(2)一起传送的步骤包括在涂料过程中放慢传送速度的步骤。
29.如权利要求22至28中任一项所述的方法，其特征在于所述在涂料站(31-46)的至少一个子区域内生成等离子体的步骤包括生成电磁波的步骤。
30.如权利要求22至29中任一项所述的方法，其特征在于还包括将一个用来生成电磁波的装置(25)与该至少一个涂料站(31-46)相连的步骤。
31.如权利要求22至30中任一项所述的方法，其特征在于所述抽空步骤包括至少采用两个泵级(191、192、193)进行相继抽空的步骤。
32.如权利要求22至31中任一项所述的方法，其特征在于所述抽空步骤包括将中空物体工件的空腔抽空的步骤。
33.如权利要求22至32所述的方法，其特征在于所述用来生成等离子体的步骤包括引入一生产气体的步骤。
34.如权利要求33所述的方法，其特征在于所述引入生产气体的步骤包括将一生产气体引入中空物体工件的腔体的步骤。
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