BR112014015773A8 - aparelho para a formação de película fina - Google Patents

aparelho para a formação de película fina

Info

Publication number
BR112014015773A8
BR112014015773A8 BR112014015773A BR112014015773A BR112014015773A8 BR 112014015773 A8 BR112014015773 A8 BR 112014015773A8 BR 112014015773 A BR112014015773 A BR 112014015773A BR 112014015773 A BR112014015773 A BR 112014015773A BR 112014015773 A8 BR112014015773 A8 BR 112014015773A8
Authority
BR
Brazil
Prior art keywords
film
forming apparatus
vacuum chamber
film forming
thin film
Prior art date
Application number
BR112014015773A
Other languages
English (en)
Other versions
BR112014015773A2 (pt
Inventor
Tabuchi Hiroyasu
Ooshima Hiroyuki
Fujimoto Keiichi
Nakaya Masaki
Original Assignee
Kirin Brewery
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kirin Brewery filed Critical Kirin Brewery
Publication of BR112014015773A2 publication Critical patent/BR112014015773A2/pt
Publication of BR112014015773A8 publication Critical patent/BR112014015773A8/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00Details of bottles or jars not otherwise provided for
    • B65D23/02Linings or internal coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/345Silicon nitride
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/403Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

resumo patente de invenção: "aparelho para a formação de película fina" a presente invenção refere-se a um aparelho formador de película para formar películas finas com alto desempenho bloqueador de gás, tal como uma película de dlc (carbono diamante), uma película de siox, uma película de sioc, uma película de siocn, uma película de sinx, uma película de alox sobre a superfície interna e/ou superfície externa de recipientes tais como garrafas pet. o aparelho formador de película é provido com: uma câmara de vácuo para a formação de, em um estado de vácuo, uma película sobre uma superfície de um recipiente (4) usando-se um elemento gerador de calor (21); um dispositivo de evacuação de vácuo para aspirar a câmara de vácuo; e um dispositivo de deslocamento relativo para deslocar relativamente o recipiente (4) e o elemento gerador de calor (21) na câmara de vácuo depois de iniciar a aspiração da câmara de vácuo.
BR112014015773A 2011-12-27 2012-12-26 aparelho para a formação de película fina BR112014015773A8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011284609 2011-12-27
PCT/JP2012/083679 WO2013099960A1 (ja) 2011-12-27 2012-12-26 薄膜の成膜装置

Publications (2)

Publication Number Publication Date
BR112014015773A2 BR112014015773A2 (pt) 2017-06-13
BR112014015773A8 true BR112014015773A8 (pt) 2017-07-04

Family

ID=48697441

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014015773A BR112014015773A8 (pt) 2011-12-27 2012-12-26 aparelho para a formação de película fina

Country Status (13)

Country Link
US (1) US10612142B2 (pt)
EP (1) EP2799593B1 (pt)
JP (1) JP5809711B2 (pt)
KR (1) KR101552077B1 (pt)
CN (1) CN103998649B (pt)
AU (1) AU2012361615B2 (pt)
BR (1) BR112014015773A8 (pt)
CA (1) CA2860243C (pt)
MY (1) MY167942A (pt)
PH (1) PH12014501448A1 (pt)
SG (1) SG11201403305VA (pt)
TW (1) TWI522282B (pt)
WO (1) WO2013099960A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6480195B2 (ja) * 2015-01-23 2019-03-06 キリン株式会社 物品の処理装置
JP6474673B2 (ja) 2015-04-17 2019-02-27 キリン株式会社 ガスバリア性プラスチック成形体及びその製造方法
EP3318658B1 (en) * 2015-06-30 2022-01-05 Mitsubishi Heavy Industries Machinery Systems, Ltd. Film forming device and film forming method
EP3358040B1 (en) * 2015-10-01 2019-11-27 Mitsubishi Heavy Industries Machinery Systems, Ltd. Film-forming device
EP3366809B1 (en) * 2015-10-19 2023-03-15 Mitsubishi Heavy Industries Machinery Systems, Ltd. Film forming device
KR102229237B1 (ko) 2017-08-31 2021-03-18 새한프라텍 주식회사 우수한 가스 배리어성을 갖는 플라스틱 용기 및 그 제조방법
WO2019058163A2 (en) * 2017-09-20 2019-03-28 C4E Technology Gmbh METHOD AND DEVICE FOR REALIZING A DEPOSITION PROCESS ON THE EXTERNAL SIDE AND / OR THE INTERNAL SIDE OF A BODY

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2201858A1 (de) * 1971-01-22 1972-08-10 Cockerill Vorrichtung zur Aufbringung eines metallischen UEberzugs an der Innenwandung eines Hohlkoerpers
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
US5679412A (en) * 1993-10-28 1997-10-21 Manfred R. Kuehnle Method and apparatus for producing gas impermeable, chemically inert container structures for food and volatile substances
US5565248A (en) 1994-02-09 1996-10-15 The Coca-Cola Company Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance
US5521351A (en) * 1994-08-30 1996-05-28 Wisconsin Alumni Research Foundation Method and apparatus for plasma surface treatment of the interior of hollow forms
US6223683B1 (en) * 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
EP0943699B1 (de) * 1998-02-19 2003-12-17 Applied Films GmbH & Co. KG Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
EP1229068B1 (en) * 2001-02-06 2005-09-14 Shibuya Kogyo Co., Ltd. Method and apparatus for modifying the inner surface of containers made of polymeric compound
CN100335376C (zh) * 2002-04-26 2007-09-05 北海制罐株式会社 内表面经涂覆的塑料容器及其制造方法
AU2003245890A1 (en) * 2002-05-24 2003-12-12 Schott Ag Multistation coating device and method for plasma coating
DE50302862D1 (de) * 2002-05-24 2006-05-18 Schott Ag Vorrichtung für CVD-Beschichtungen
EP1510595A4 (en) * 2002-06-05 2007-05-09 Mitsubishi Shoji Plastics Corp METHOD AND DEVICE FOR CLEANING A GAS INSERTION TUBE OF RAW MATERIALS USED IN A VAPOR PHASE CHEMICAL DEPOSITION FILM FORMING APPARATUS
JP2004107781A (ja) 2002-09-20 2004-04-08 Mitsubishi Heavy Ind Ltd 炭素膜コーティング方法および装置
JP2005048272A (ja) * 2003-07-31 2005-02-24 Tokyo Electron Ltd 成膜装置および成膜方法
JP4789234B2 (ja) * 2005-02-03 2011-10-12 三菱重工食品包装機械株式会社 成膜装置,整合器,及びインピーダンス制御方法
US8186301B2 (en) * 2005-05-27 2012-05-29 Kirin Beer Kabushiki Kaisha Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container
JP2006335379A (ja) 2005-05-31 2006-12-14 Yoshino Kogyosho Co Ltd 被膜を備える合成樹脂製容器と、合成樹脂製容器に被膜を形成する方法及び装置
JP2007105999A (ja) * 2005-10-13 2007-04-26 Toyobo Co Ltd 多層成形体およびそれからなる多層延伸成形体並びに多層成形体の製造方法
JP4954679B2 (ja) 2006-11-20 2012-06-20 麒麟麦酒株式会社 バリア膜被覆プラスチック容器の製造方法及びその製造装置
JP5355860B2 (ja) * 2007-03-16 2013-11-27 三菱重工食品包装機械株式会社 バリア膜形成装置、バリア膜形成方法及びバリア膜被覆容器
US8062470B2 (en) * 2008-05-12 2011-11-22 Yuri Glukhoy Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
KR20120042748A (ko) * 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 코팅된 표면 검사를 위한 가스제거 방법

Also Published As

Publication number Publication date
MY167942A (en) 2018-10-04
JPWO2013099960A1 (ja) 2015-05-11
EP2799593B1 (en) 2020-03-04
US10612142B2 (en) 2020-04-07
US20140366806A1 (en) 2014-12-18
NZ626604A (en) 2015-03-27
CN103998649A (zh) 2014-08-20
KR101552077B1 (ko) 2015-09-09
JP5809711B2 (ja) 2015-11-11
CA2860243A1 (en) 2013-07-04
AU2012361615A1 (en) 2014-07-17
EP2799593A4 (en) 2015-08-05
KR20140105773A (ko) 2014-09-02
EP2799593A1 (en) 2014-11-05
WO2013099960A1 (ja) 2013-07-04
TW201332844A (zh) 2013-08-16
TWI522282B (zh) 2016-02-21
CN103998649B (zh) 2016-05-11
SG11201403305VA (en) 2014-09-26
BR112014015773A2 (pt) 2017-06-13
PH12014501448A1 (en) 2014-10-08
AU2012361615B2 (en) 2015-08-06
CA2860243C (en) 2016-07-12

Similar Documents

Publication Publication Date Title
BR112014015773A8 (pt) aparelho para a formação de película fina
ES2596903T3 (es) Artículos que incluyen revestimientos anticondensación y/o de baja emisividad y/o métodos para la fabricación de los mismos
AR089602A1 (es) Articulo generador de aerosoles para usar con un dispositivo generador de aerosoles
AR111347A1 (es) Unidad susceptora multicapas para calentar por inducción un sustrato formador de aerosol
PH12016500069B1 (en) Light-shielding barrier laminate
PH12015502208A1 (en) Protective film-forming film and protective film-forming composite sheet
BR112016023589A2 (pt) artigo gerador de aerossol com susceptor multimaterial
MY162680A (en) Laminating apparatus
GB201110117D0 (en) method and device for manufacturing a barrie layer on a flexible substrate
AR104819A1 (es) Películas recubiertas y paquetes formados a partir de ellas
AR100862A1 (es) Artículo generador de aerosol con susceptor multimaterial
IN2014CN04267A (pt)
BR112014026964A2 (pt) material de estrutura plana termofixável
BR112018017009A2 (pt) filme com múltiplas camadas para embalagem a vácuo de tipo pele, método de formação de embalagem e embalagem obtida com o mesmo
CO2017007657A2 (es) Técnicas de recubrimiento de barrera contra gas y artículos producidos mediante las mismas
CL2008002158A1 (es) Proceso para conformar una cuchilla de afeitar que comprende los pasos de proporcionar un sustrato, conformar un borde afilado, colocar el sustrato en una camara de vacio,junto con un primer objetivo solido, y suministrar un gas a la cama de vacio que al ionizarse forma un recubrimiento de pelicula delgada sobre dicho borde afilado
BR112012008642A2 (pt) inibição de transporte de excesso de precursor entre zonas de precursor separadas em um sistema de deposição de camada atômica.
BR112014000395A2 (pt) películas de barreira de óxido de metal misto e método de deposição de camada atômica para preparar películas de barreira de óxido de metal misto
BR112016006775A2 (pt) pilha de filmes ópticos e artigo
BR112012023928A2 (pt) proteção térmica para componentes de freio a disco
BR112012023478A2 (pt) método para proporcionar um substrato com uma barreira e um substrato que compreende uma barreira.
MX2018015235A (es) Material laminado y vidrio doble de atenuacion de la luz.
ES2571384T3 (es) Película esterilizable para envasado aséptico
BR112018003014A2 (pt) técnicas para o crescimento direto de grafeno sobre vidro em baixa temperatura
AR098187A1 (es) Películas basadas en poliolefina con tasas mejoradas de transmisión de vapor de agua

Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B08F Application fees: application dismissed [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO ARQUIVAMENTO PUBLICADO NA RPI 2495 DE 30/10/2018.

B350 Update of information on the portal [chapter 15.35 patent gazette]