PH12015502208A1 - Protective film-forming film and protective film-forming composite sheet - Google Patents
Protective film-forming film and protective film-forming composite sheetInfo
- Publication number
- PH12015502208A1 PH12015502208A1 PH12015502208A PH12015502208A PH12015502208A1 PH 12015502208 A1 PH12015502208 A1 PH 12015502208A1 PH 12015502208 A PH12015502208 A PH 12015502208A PH 12015502208 A PH12015502208 A PH 12015502208A PH 12015502208 A1 PH12015502208 A1 PH 12015502208A1
- Authority
- PH
- Philippines
- Prior art keywords
- protective film
- forming
- film
- composite sheet
- protective
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
- C08J2463/02—Polyglycidyl ethers of bis-phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
- C08J2463/04—Epoxynovolacs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2463/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
- C08J2463/10—Epoxy resins modified by unsaturated compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
[Problem] To provide a protective film-forming film that minimizes warping of a wafer, and is capable of forming a highly-reliable protective film on a chip. [Solution] This protective film-forming film is thermally curable, has a glass transition temperature after being thermally cured of 150 to 300oC, and has a modulus of elasticity at a temperature of 23oC after being thermally cured of 0.5 to 10 GPa.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013059951 | 2013-03-22 | ||
PCT/JP2014/058038 WO2014148642A1 (en) | 2013-03-22 | 2014-03-24 | Protective film-forming film and protective film-forming composite sheet |
Publications (2)
Publication Number | Publication Date |
---|---|
PH12015502208B1 PH12015502208B1 (en) | 2016-02-01 |
PH12015502208A1 true PH12015502208A1 (en) | 2016-02-01 |
Family
ID=51580310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PH12015502208A PH12015502208A1 (en) | 2013-03-22 | 2015-09-22 | Protective film-forming film and protective film-forming composite sheet |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP5615471B1 (en) |
KR (4) | KR102541666B1 (en) |
CN (1) | CN104937712B (en) |
PH (1) | PH12015502208A1 (en) |
SG (1) | SG11201507775XA (en) |
TW (1) | TWI516530B (en) |
WO (1) | WO2014148642A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016143192A1 (en) * | 2015-03-12 | 2016-09-15 | リンテック株式会社 | Film for forming protection film |
JP6454580B2 (en) * | 2015-03-30 | 2019-01-16 | デクセリアルズ株式会社 | Thermosetting adhesive sheet and method for manufacturing semiconductor device |
JP6517588B2 (en) * | 2015-05-27 | 2019-05-22 | デクセリアルズ株式会社 | Thermosetting adhesive sheet and method of manufacturing semiconductor device |
JP2017011134A (en) * | 2015-06-23 | 2017-01-12 | 株式会社ディスコ | Method for manufacturing device chip |
JP6660156B2 (en) * | 2015-11-13 | 2020-03-04 | 日東電工株式会社 | Manufacturing method of laminated body and combined body / semiconductor device |
KR102456771B1 (en) * | 2016-04-28 | 2022-10-20 | 린텍 가부시키가이샤 | A film for forming a protective film and a composite sheet for forming a protective film |
CN109071845A (en) * | 2016-04-28 | 2018-12-21 | 琳得科株式会社 | Protective film formation film and protective film formation composite sheet |
JP6863375B2 (en) * | 2016-05-20 | 2021-04-21 | 昭和電工マテリアルズ株式会社 | Release film |
JP6921644B2 (en) * | 2017-06-27 | 2021-08-18 | 日東電工株式会社 | Backside protective film with integrated dicing tape |
JP6950330B2 (en) * | 2017-07-28 | 2021-10-13 | 東レ株式会社 | Laminated body and resin film |
TW201930511A (en) * | 2017-12-28 | 2019-08-01 | 日商日東電工股份有限公司 | Semiconductor back surface adhering film |
JP2020101708A (en) * | 2018-12-21 | 2020-07-02 | 日東電工株式会社 | Semiconductor reverse surface adhesive film |
JP2020102553A (en) * | 2018-12-21 | 2020-07-02 | 日東電工株式会社 | Semiconductor backside adhesion film |
JP7211804B2 (en) * | 2018-12-21 | 2023-01-24 | 日東電工株式会社 | Semiconductor back adhesion film |
WO2019131850A1 (en) * | 2017-12-28 | 2019-07-04 | 日東電工株式会社 | Semiconductor back surface adhering film |
JP7169093B2 (en) * | 2017-12-28 | 2022-11-10 | 日東電工株式会社 | Semiconductor back adhesion film |
JP7211803B2 (en) * | 2018-12-21 | 2023-01-24 | 日東電工株式会社 | Semiconductor back adhesion film |
JPWO2019208402A1 (en) * | 2018-04-24 | 2021-05-13 | 三菱瓦斯化学株式会社 | Laminated board, printed wiring board, multilayer printed wiring board, laminated body, and manufacturing method of laminated board |
JP7108516B2 (en) * | 2018-10-25 | 2022-07-28 | リンテック株式会社 | Sheet pasting method |
CN112703239B (en) * | 2018-11-22 | 2022-10-04 | 琳得科株式会社 | Film for forming thermosetting protective film, composite sheet for forming protective film, and method for producing chip |
JP7217175B2 (en) * | 2019-03-01 | 2023-02-02 | 日東電工株式会社 | Semiconductor back adhesion film and dicing tape integrated semiconductor back adhesion film |
JP6867522B2 (en) * | 2020-01-21 | 2021-04-28 | デクセリアルズ株式会社 | Manufacturing method of thermosetting adhesive sheet and semiconductor device |
JP2023043538A (en) | 2021-09-16 | 2023-03-29 | リンテック株式会社 | Protective film forming film, composite sheet for forming protective film and method for manufacturing workpiece article with protective film |
WO2023145590A1 (en) | 2022-01-28 | 2023-08-03 | リンテック株式会社 | Thermosetting resin film, composite sheet, semiconductor chip, and production method for semiconductor chip |
JP2024514991A (en) | 2022-03-23 | 2024-04-04 | エルジー・ケム・リミテッド | Polycarbonate resin and its manufacturing method |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4364508B2 (en) | 2002-12-27 | 2009-11-18 | リンテック株式会社 | Protective film forming sheet for chip back surface and manufacturing method of chip with protective film |
JP5435685B2 (en) * | 2007-02-28 | 2014-03-05 | ナミックス株式会社 | Resin film for sealing |
WO2008108131A1 (en) * | 2007-03-01 | 2008-09-12 | Nitto Denko Corporation | Thermosetting die bonding film |
CN101597417B (en) * | 2008-06-05 | 2011-04-13 | 中国科学院化学研究所 | High-temperature resistant and high-toughness epoxy matrix resin as well as preparation method and application thereof |
JP5681377B2 (en) | 2010-04-20 | 2015-03-04 | 日東電工株式会社 | Manufacturing method of semiconductor device and flip chip type semiconductor device |
JP5384443B2 (en) * | 2010-07-28 | 2014-01-08 | 日東電工株式会社 | Flip chip type semiconductor back film, dicing tape integrated semiconductor back film, semiconductor device manufacturing method, and flip chip type semiconductor device |
JP6051630B2 (en) * | 2011-07-13 | 2016-12-27 | 味の素株式会社 | Semiconductor package |
-
2014
- 2014-03-24 KR KR1020217018041A patent/KR102541666B1/en active IP Right Grant
- 2014-03-24 SG SG11201507775XA patent/SG11201507775XA/en unknown
- 2014-03-24 TW TW103110834A patent/TWI516530B/en active
- 2014-03-24 JP JP2014530843A patent/JP5615471B1/en active Active
- 2014-03-24 KR KR1020217018040A patent/KR102377100B1/en active IP Right Grant
- 2014-03-24 KR KR1020157026015A patent/KR20150135284A/en not_active IP Right Cessation
- 2014-03-24 KR KR1020227007805A patent/KR20220035981A/en not_active IP Right Cessation
- 2014-03-24 CN CN201480004970.7A patent/CN104937712B/en active Active
- 2014-03-24 WO PCT/JP2014/058038 patent/WO2014148642A1/en active Application Filing
-
2015
- 2015-09-22 PH PH12015502208A patent/PH12015502208A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20210074413A (en) | 2021-06-21 |
PH12015502208B1 (en) | 2016-02-01 |
KR20220035981A (en) | 2022-03-22 |
KR20150135284A (en) | 2015-12-02 |
KR102377100B1 (en) | 2022-03-21 |
JP5615471B1 (en) | 2014-10-29 |
TWI516530B (en) | 2016-01-11 |
TW201510008A (en) | 2015-03-16 |
KR102541666B1 (en) | 2023-06-13 |
WO2014148642A1 (en) | 2014-09-25 |
CN104937712B (en) | 2018-03-27 |
CN104937712A (en) | 2015-09-23 |
JPWO2014148642A1 (en) | 2017-02-16 |
KR20210074414A (en) | 2021-06-21 |
SG11201507775XA (en) | 2015-10-29 |
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