JP6348927B2 - シリコンウェーハ研磨用組成物 - Google Patents

シリコンウェーハ研磨用組成物 Download PDF

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Publication number
JP6348927B2
JP6348927B2 JP2016089114A JP2016089114A JP6348927B2 JP 6348927 B2 JP6348927 B2 JP 6348927B2 JP 2016089114 A JP2016089114 A JP 2016089114A JP 2016089114 A JP2016089114 A JP 2016089114A JP 6348927 B2 JP6348927 B2 JP 6348927B2
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polishing
group
polishing composition
silicon wafer
less
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Japanese (ja)
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JP2016171332A5 (enrdf_load_stackoverflow
JP2016171332A (ja
Inventor
公亮 土屋
公亮 土屋
久典 丹所
久典 丹所
裕介 須賀
裕介 須賀
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Fujimi Inc
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Fujimi Inc
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP2016089114A 2016-04-27 2016-04-27 シリコンウェーハ研磨用組成物 Active JP6348927B2 (ja)

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JP2016089114A JP6348927B2 (ja) 2016-04-27 2016-04-27 シリコンウェーハ研磨用組成物

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JP2016089114A JP6348927B2 (ja) 2016-04-27 2016-04-27 シリコンウェーハ研磨用組成物

Related Parent Applications (1)

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JP2014129497A Division JP6185432B2 (ja) 2014-06-24 2014-06-24 シリコンウェーハ研磨用組成物

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JP2016171332A JP2016171332A (ja) 2016-09-23
JP2016171332A5 JP2016171332A5 (enrdf_load_stackoverflow) 2017-07-20
JP6348927B2 true JP6348927B2 (ja) 2018-06-27

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023189812A1 (ja) 2022-03-31 2023-10-05 株式会社フジミインコーポレーテッド 研磨用組成物
WO2024029457A1 (ja) 2022-08-05 2024-02-08 株式会社フジミインコーポレーテッド 研磨用組成物

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6893835B2 (ja) * 2017-06-23 2021-06-23 花王株式会社 シリコンウェーハ用仕上げ研磨液組成物
JP7103823B2 (ja) * 2018-03-30 2022-07-20 株式会社フジミインコーポレーテッド シリコンウェーハの研磨方法および研磨用組成物
CN117229717A (zh) * 2023-08-23 2023-12-15 上海集成电路材料研究院有限公司 一种化学机械抛光液及其制备方法和用途
CN117229716A (zh) * 2023-08-23 2023-12-15 上海集成电路材料研究院有限公司 一种含吗啉环水溶性小分子的用途及化学机械抛光液

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103890114B (zh) * 2011-10-24 2015-08-26 福吉米株式会社 研磨用组合物、使用了其的研磨方法和基板的制造方法
JP2014041978A (ja) * 2012-08-23 2014-03-06 Fujimi Inc 研磨用組成物、研磨用組成物の製造方法、及び研磨用組成物原液の製造方法
CN104603227B (zh) * 2012-08-31 2017-03-08 福吉米株式会社 研磨用组合物和基板的制造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023189812A1 (ja) 2022-03-31 2023-10-05 株式会社フジミインコーポレーテッド 研磨用組成物
WO2024029457A1 (ja) 2022-08-05 2024-02-08 株式会社フジミインコーポレーテッド 研磨用組成物

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