JP6341351B1 - 感光性樹脂組成物、硬化物及び画像表示装置 - Google Patents

感光性樹脂組成物、硬化物及び画像表示装置 Download PDF

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JP6341351B1
JP6341351B1 JP2018511166A JP2018511166A JP6341351B1 JP 6341351 B1 JP6341351 B1 JP 6341351B1 JP 2018511166 A JP2018511166 A JP 2018511166A JP 2018511166 A JP2018511166 A JP 2018511166A JP 6341351 B1 JP6341351 B1 JP 6341351B1
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group
ring
mass
resin composition
photosensitive resin
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JPWO2018052024A1 (ja
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植松　卓也
卓也 植松
直人 関口
直人 関口
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Mitsubishi Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
    • C07D307/79—Benzo [b] furans; Hydrogenated benzo [b] furans with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C07D307/80—Radicals substituted by oxygen atoms

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
JP2018511166A 2016-09-16 2017-09-13 感光性樹脂組成物、硬化物及び画像表示装置 Active JP6341351B1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018093292A JP6977662B2 (ja) 2016-09-16 2018-05-14 感光性樹脂組成物、硬化物及び画像表示装置
JP2021184145A JP7283519B2 (ja) 2016-09-16 2021-11-11 感光性樹脂組成物、硬化物及び画像表示装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016181932 2016-09-16
JP2016181932 2016-09-16
PCT/JP2017/033037 WO2018052024A1 (ja) 2016-09-16 2017-09-13 感光性樹脂組成物、硬化物及び画像表示装置

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JP2018093292A Division JP6977662B2 (ja) 2016-09-16 2018-05-14 感光性樹脂組成物、硬化物及び画像表示装置

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JP6341351B1 true JP6341351B1 (ja) 2018-06-13
JPWO2018052024A1 JPWO2018052024A1 (ja) 2018-09-13

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JP2018511166A Active JP6341351B1 (ja) 2016-09-16 2017-09-13 感光性樹脂組成物、硬化物及び画像表示装置
JP2018093292A Active JP6977662B2 (ja) 2016-09-16 2018-05-14 感光性樹脂組成物、硬化物及び画像表示装置
JP2021184145A Active JP7283519B2 (ja) 2016-09-16 2021-11-11 感光性樹脂組成物、硬化物及び画像表示装置

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JP2021184145A Active JP7283519B2 (ja) 2016-09-16 2021-11-11 感光性樹脂組成物、硬化物及び画像表示装置

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JP (3) JP6341351B1 (enrdf_load_stackoverflow)
KR (1) KR102402726B1 (enrdf_load_stackoverflow)
CN (1) CN109791357B (enrdf_load_stackoverflow)
TW (1) TWI745431B (enrdf_load_stackoverflow)
WO (1) WO2018052024A1 (enrdf_load_stackoverflow)

Cited By (1)

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Publication number Priority date Publication date Assignee Title
JP2021167905A (ja) * 2020-04-10 2021-10-21 東京応化工業株式会社 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜

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KR101848567B1 (ko) * 2016-11-18 2018-04-12 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
WO2019065456A1 (ja) * 2017-09-26 2019-04-04 富士フイルム株式会社 硬化性組成物、硬化膜、固体撮像装置、及び、硬化膜の製造方法
WO2019065789A1 (ja) * 2017-09-27 2019-04-04 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
CN113646882A (zh) * 2019-03-27 2021-11-12 东丽株式会社 感光性树脂组合物、感光性树脂片、中空结构的制造方法及电子部件
CN114127638A (zh) 2019-07-10 2022-03-01 东丽株式会社 负型感光性树脂组合物、固化膜、有机el显示器及固化膜的制造方法
JP7382768B2 (ja) * 2019-09-06 2023-11-17 日鉄ケミカル＆マテリアル株式会社 ブラックレジスト用感光性樹脂組成物及びその硬化塗膜、並びにカラーフィルター遮光膜の製造方法
JP7570169B2 (ja) * 2019-09-17 2024-10-21 Jsr株式会社 硬化性組成物
JP7453023B2 (ja) 2020-03-12 2024-03-19 東京応化工業株式会社 着色感光性組成物、着色膜及び着色膜の製造方法
KR20230098142A (ko) * 2020-10-30 2023-07-03 미쯔비시 케미컬 주식회사 카르복시기 함유 수지 함유액의 제조 방법 및 카르복시기 함유 수지의 안정화 방법
WO2024004732A1 (ja) * 2022-06-29 2024-01-04 富士フイルム株式会社 感光性組成物、膜、光学フィルタ、固体撮像素子および画像表示装置

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JP2010204174A (ja) * 2009-02-27 2010-09-16 Fujifilm Corp 感光性積層体及び感光性フィルム、並びに、プリント基板の製造方法
JP2011105713A (ja) * 2009-10-23 2011-06-02 Mitsubishi Chemicals Corp ケトオキシムエステル系化合物及びその利用
WO2015036910A1 (en) * 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
WO2015046178A1 (ja) * 2013-09-25 2015-04-02 三菱化学株式会社 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液
JP2017045056A (ja) * 2015-08-27 2017-03-02 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置

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JP2010204174A (ja) * 2009-02-27 2010-09-16 Fujifilm Corp 感光性積層体及び感光性フィルム、並びに、プリント基板の製造方法
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WO2015036910A1 (en) * 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
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Publication number Priority date Publication date Assignee Title
JP2021167905A (ja) * 2020-04-10 2021-10-21 東京応化工業株式会社 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜

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KR20190051976A (ko) 2019-05-15
JP2018156093A (ja) 2018-10-04
KR102402726B1 (ko) 2022-05-27
WO2018052024A1 (ja) 2018-03-22
TW201818152A (zh) 2018-05-16
CN109791357A (zh) 2019-05-21
TWI745431B (zh) 2021-11-11
JPWO2018052024A1 (ja) 2018-09-13
JP7283519B2 (ja) 2023-05-30
JP6977662B2 (ja) 2021-12-08
CN109791357B (zh) 2023-01-10
JP2022028782A (ja) 2022-02-16

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