JP6330818B2 - 導電性基板、導電性基板の製造方法 - Google Patents

導電性基板、導電性基板の製造方法 Download PDF

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Publication number
JP6330818B2
JP6330818B2 JP2015545281A JP2015545281A JP6330818B2 JP 6330818 B2 JP6330818 B2 JP 6330818B2 JP 2015545281 A JP2015545281 A JP 2015545281A JP 2015545281 A JP2015545281 A JP 2015545281A JP 6330818 B2 JP6330818 B2 JP 6330818B2
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Japan
Prior art keywords
layer
conductive substrate
blackened
copper
blackening
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JP2015545281A
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English (en)
Japanese (ja)
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JPWO2015064664A1 (ja
Inventor
渡辺　宏幸
宏幸 渡辺
山岸　浩一
浩一 山岸
永田　純一
純一 永田
高塚　裕二
裕二 高塚
貞之 横林
貞之 横林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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Publication of JPWO2015064664A1 publication Critical patent/JPWO2015064664A1/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/06—Coating on the layer surface on metal layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/20—Inorganic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202—Conductive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/412—Transparent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/416—Reflective
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208—Touch screens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP2015545281A 2013-10-31 2014-10-29 導電性基板、導電性基板の製造方法 Active JP6330818B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013227517 2013-10-31
JP2013227517 2013-10-31
JP2014074591 2014-03-31
JP2014074591 2014-03-31
PCT/JP2014/078817 WO2015064664A1 (ja) 2013-10-31 2014-10-29 導電性基板、導電性基板の製造方法

Publications (2)

Publication Number Publication Date
JPWO2015064664A1 JPWO2015064664A1 (ja) 2017-03-09
JP6330818B2 true JP6330818B2 (ja) 2018-05-30

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JP2015545281A Active JP6330818B2 (ja) 2013-10-31 2014-10-29 導電性基板、導電性基板の製造方法

Country Status (5)

Country Link
JP (1) JP6330818B2 (ko)
KR (1) KR102170097B1 (ko)
CN (1) CN105706182B (ko)
TW (1) TWI646870B (ko)
WO (1) WO2015064664A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6164145B2 (ja) * 2014-03-31 2017-07-19 住友金属鉱山株式会社 導電性基板、導電性基板の製造方法
TWI595507B (zh) * 2014-06-18 2017-08-11 Geomatec Co Ltd Laminates, methods of making the same, and electronic machines
JP6369393B2 (ja) * 2015-05-25 2018-08-08 住友金属鉱山株式会社 導電性基板、及び導電性基板の製造方法
JPWO2016190224A1 (ja) * 2015-05-25 2018-03-29 住友金属鉱山株式会社 黒化めっき液、導電性基板
JP6365422B2 (ja) * 2015-06-04 2018-08-01 住友金属鉱山株式会社 導電性基板の製造方法
JP2017008405A (ja) * 2015-06-25 2017-01-12 住友金属鉱山株式会社 導電性基板の製造方法
JP6973076B2 (ja) * 2015-07-31 2021-11-24 住友金属鉱山株式会社 導電性基板
CN107850965B (zh) * 2015-07-31 2021-01-29 住友金属矿山股份有限公司 导电性基板、导电性基板的制造方法
WO2017033740A1 (ja) * 2015-08-26 2017-03-02 住友金属鉱山株式会社 導電性基板
JP6439628B2 (ja) * 2015-08-26 2018-12-19 住友金属鉱山株式会社 導電性基板の製造方法
JP6687033B2 (ja) * 2015-09-30 2020-04-22 住友金属鉱山株式会社 導電性基板
JP6531699B2 (ja) * 2016-04-05 2019-06-19 住友金属鉱山株式会社 導電性基板
JP7049759B2 (ja) * 2016-07-12 2022-04-07 住友金属鉱山株式会社 積層体基板、導電性基板、積層体基板の製造方法、導電性基板の製造方法
CN106445225A (zh) * 2016-08-03 2017-02-22 深圳市骏达光电股份有限公司 一种触摸屏及其加工方法
CN109375815A (zh) * 2018-11-16 2019-02-22 信利光电股份有限公司 一种金属网格触摸屏的黑化方法及金属网格触摸屏
CN109857276A (zh) * 2019-01-31 2019-06-07 信利光电股份有限公司 一种降低金属网格触摸屏线条可见性结构和方法
KR102704936B1 (ko) * 2022-09-23 2024-09-09 주식회사 나노코어 디스플레이 배면 플레이트, 디스플레이 장치 및 디스플레이 배면 플레이트 제조방법
KR102704937B1 (ko) * 2022-09-23 2024-09-09 주식회사 나노코어 디스플레이 배면 플레이트, 디스플레이 장치 및 이들의 제조 방법.

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TW445303B (en) * 1996-02-26 2001-07-11 Kuramoto Seisakusho Co Ltd Low reflection film substrate
JP2002050892A (ja) * 2000-07-31 2002-02-15 Mitsubishi Rayon Co Ltd 網目構造物、電磁波シールドフィルタ及びその製法
JP4086132B2 (ja) 2001-11-16 2008-05-14 株式会社ブリヂストン 透明導電性フィルムおよびタッチパネル
KR100780283B1 (ko) * 2004-09-01 2007-11-28 삼성코닝 주식회사 전자파 차폐 필름 및 이의 제조방법
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Also Published As

Publication number Publication date
KR102170097B1 (ko) 2020-10-26
TWI646870B (zh) 2019-01-01
TW201540137A (zh) 2015-10-16
CN105706182A (zh) 2016-06-22
KR20160081925A (ko) 2016-07-08
WO2015064664A1 (ja) 2015-05-07
CN105706182B (zh) 2017-07-28
JPWO2015064664A1 (ja) 2017-03-09

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