JP6319626B2 - 導電性硬化物の製造方法及び導電性硬化物並びにパルス光硬化性組成物の硬化方法 - Google Patents
導電性硬化物の製造方法及び導電性硬化物並びにパルス光硬化性組成物の硬化方法 Download PDFInfo
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- JP6319626B2 JP6319626B2 JP2014068294A JP2014068294A JP6319626B2 JP 6319626 B2 JP6319626 B2 JP 6319626B2 JP 2014068294 A JP2014068294 A JP 2014068294A JP 2014068294 A JP2014068294 A JP 2014068294A JP 6319626 B2 JP6319626 B2 JP 6319626B2
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Description
さらに、本発明によれば、厚膜硬化可能であり、深部硬化性に優れている。
また、本発明のパルス光硬化性組成物は、無溶剤でも溶剤系と同様の性能とすることが可能である。無溶剤とした場合、塗布又は印刷時に揮発成分がないので、粘度が変わらずにすみ、安定性や再現性に優れ、製品にばらつきがでないといった効果がある。また、無溶剤とした場合、硬化物の収縮が少なく、大面積でも応力が発生しないという効果も達成される。
また、上記導電性粉末の他、ネオデカン酸銀や、オレイン酸銀等のカルボン酸銀塩;銀アセチルアセトナート錯体や、銀アミン錯体等の銀錯体等を更に添加することができる。これらを添加することにより、前記パルス光硬化性組成物の硬化物をより低抵抗化することができる。
前記(B)導電性粉末のタップ密度は、1.0〜7.0g/cm3が好ましく、3.0〜5.0g/cm3がより好ましい。
前記アミン−イミダゾールアダクト系潜在性硬化剤の市販品としては、例えば、富士化成株式会社製、商品名:フジキュアFXR−1121等が挙げられる。
また、前記アミン−尿素アダクト系潜在性硬化剤の市販品としては、例えば、富士化成株式会社製、商品名:フジキュアFXE−1000、フジキュアFXR−1020、フジキュアFXR−1030等が挙げられる。
ポリイソブテン、パラフィン等が好ましい。特に、高分子可塑剤である、ポリプロピレングリコールやその誘導体等のポリエーテル系可塑剤やポリ(メタ)アクリル酸エステル可
塑剤が好ましい。可塑剤を使用する場合、(A)成分の樹脂100質量部に対して1〜200質量部、さらには5〜150質量部添加することが好ましい。
a工程;プリント配線板やフレキシブルプリント基板の上に本発明に係るパルス光硬化性組成物を塗布又は印刷してパルス光照射して回路や電極を形成する工程、
b工程;多層基板のスルーホールに本発明に係るパルス光硬化性組成物を充填しパルス光照射して層間の電気的導通を得る工程、
c工程;プリント基板上にディスペンス、スクリーン印刷ないしステンシル印刷で本発明に係るパルス光硬化性組成物を塗布又は印刷した上に、半導体素子やチップ部品を搭載しパルス光照射して接合する工程。
また、無機系基材としては、例えば、メタル・ベース、メタル・コア、ホーロー等の金属系基板;アルミナ基板、窒化アルミニウム基板(AlN)、炭化ケイ素基板(SiC)、低温焼成基板等のセラミック系基板;ガラス基板等が挙げられるが、これらに限定されない。
表1に示した如く、ビスフェノールF型エポキシ樹脂(商品名「エポトート YDF−8170C」、新日鉄住金株式会社製)60質量部、アミノフェノール型エポキシ樹脂(商品名「アラルダイト MY−0510」、ハンツマン株式会社製)40質量部、アミンアダクト型の硬化剤(商品名「アジキュア PN−23」、味の素ファインテクノ株式会社製)20質量部、及び銀フィラー(商品名「シルコート AgC−224」、福田金属箔粉工業株式会社製)450質量部を真空遊星式攪拌装置により混合し、ペースト状の一液型のパルス光硬化性組成物を調製した。
・エポトート YD−8170C:ビスフェノールF型エポキシ樹脂(エポキシ当量155〜165、新日鉄住金化学社製)。
・アラルダイド MY0510:アミノフェノール型エポキシ樹脂(エポキシ当量101、ハンツマン・アドバンテスト・マテリアルズ社製)。
・アミキュア PN−23:アミン−エポキシアダクト型潜在性硬化剤(味の素ファインテクノ社製)。
・アミキュア PN−H:アミン−エポキシアダクト型潜在性硬化剤(味の素ファインテクノ社製)。
・フジキュア FXR−1121:イミダゾール−エポキシアダクト型潜在性硬化剤(T&K TOKA社製)
・フジキュア FXR−1020:アミン−イソシアネートアダクト型潜在性硬化剤(T&K TOKA社製)。
・シルコートAgC−224:フレーク状銀粉(比表面積0.25〜0.37m2/g、タップ密度4.50〜5.30g/cm3、50%平均粒径7.0〜9.5μm、福田金属箔粉工業社製)。
・シルコートAgC−B:福田金属箔粉工業(株)製の商品名、比表面積1.35m2/g、タップ密度4.6g/cm3、50%平均粒径4μm、フレーク状銀粉。
・シルコートAgC−G:福田金属箔粉工業(株)製の商品名、比表面積2.5m2/g、タップ密度1.4g/cm3、粒状銀粉(還元粉))。
1)パルス光照射による硬化性試験
パルス光硬化性組成物を用いて、厚さ75μmのメタルマスクを用いて、PETフィルム(厚さ100μm、ルミラー100S、東レ(株)社製)に導体幅1.0mm、導体間隔1mm、長さ70.0mmで回路パターンを孔版印刷し、印刷後直ちに米国Xenon Corporation製キセノンパルス照射装置RC−802を用い下記照射条件によりパルス光を照射した。
・パルス幅:168μsec
・照射時間:15秒
・照射距離:25mm
・積算照射エネルギー量:55J/cm2
・ランプの種類:LH−810(パルスエネルギー 207J/パルス)
照射後、パルス光硬化性組成物が硬化したことを下記評価基準で評価した。結果を表2に示す。
・評価基準 ○:硬化、△:一部未硬化、×:未硬化。
パルス光硬化性組成物を用いて、上述したパルス光照射による硬化性試験と同様の方法によりPETフィルムに回路パターンを形成した後、120℃の乾燥機で1時間加熱を行い、硬化状態をパルス光照射による硬化性試験と同様の評価基準で評価した。結果を表2に示す。
上述したパルス光照射による硬化性試験後、日置電機株式会社製抵抗計RM3548にて両端間の抵抗値を測定した。測定上限である1.0MΩを超えた場合はN.D.とした。また、四探針法により体積抵抗値を測定した。結果を表2に示した。
表1に示した如く、配合物質を変更した以外は実施例1と同様の方法によりパルス光硬化性組成物を調製し、測定を行った。結果を表2に示した。
表3に示した如く、配合物質を変更した以外は実施例1と同様の方法により組成物を調製し、測定を行った。結果を表4に示した。
表5に示した如く、配合物質を変更した以外は実施例1と同様の方法により組成物を調製し、測定を行った。結果を表6に示した。
・EPICLON B−570−H:テトラヒドロフタル酸無水物(DIC社製)。
Claims (5)
- (A)常温で液体であるエポキシ樹脂、
(B)導電性粉末、及び
(C)パルス光潜在性硬化剤を前記(A)エポキシ樹脂100質量部に対して10〜50質量部、
を含み、前記(B)導電性粉末が銀粉および/又は銀メッキ粉であるパルス光硬化性組成物に対し、パルス化された光を照射することにより、導電性硬化物を形成することを特徴とする導電性硬化物の製造方法。 - 前記(B)導電性粉末の比表面積が0.1〜7.0m 2 /gであり、タップ密度が1.0〜7.0g/cm 3 であることを特徴とする請求項1記載の導電性硬化物の製造方法。
- (A)常温で液体であるエポキシ樹脂、
(B)導電性粉末、及び
(C)パルス光潜在性硬化剤を前記(A)エポキシ樹脂100質量部に対して10〜50質量部、
を含み、前記(B)導電性粉末が銀粉および/又は銀メッキ粉であるパルス光硬化性組成物に対し、パルス化された光を照射することにより、硬化せしめることを特徴とするパルス光硬化性組成物の硬化方法。 - 請求項1又は2記載の方法により製造されてなることを特徴とする導電性硬化物。
- 請求項4記載の導電性硬化物を用いてなることを特徴とする電子回路。
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