JP6315343B2 - 光学系の少なくとも１つの欠陥を補償する方法 - Google Patents

光学系の少なくとも１つの欠陥を補償する方法 Download PDF

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Publication number
JP6315343B2
JP6315343B2 JP2014558009A JP2014558009A JP6315343B2 JP 6315343 B2 JP6315343 B2 JP 6315343B2 JP 2014558009 A JP2014558009 A JP 2014558009A JP 2014558009 A JP2014558009 A JP 2014558009A JP 6315343 B2 JP6315343 B2 JP 6315343B2
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Prior art keywords
optical element
optical
birefringence
local
defect
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Japanese (ja)
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JP2015509662A (ja
JP2015509662A5 (https=
Inventor
ウラジミール ドミトリエフ
ウラジミール ドミトリエフ
インゴ ゼンガー
インゴ ゼンガー
フランク シュレゼナー
フランク シュレゼナー
マルクス メンゲル
マルクス メンゲル
ヨハネス ルオッフ
ヨハネス ルオッフ
Original Assignee
カール ツァイス エスエムエス リミテッド
カール ツァイス エスエムエス リミテッド
カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G02B5/3091—Birefringent or phase retarding elements for use in the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014558009A 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法 Active JP6315343B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2012/052909 WO2013123973A1 (en) 2012-02-21 2012-02-21 Method and apparatus for compensating at least one defect of an optical system

Publications (3)

Publication Number Publication Date
JP2015509662A JP2015509662A (ja) 2015-03-30
JP2015509662A5 JP2015509662A5 (https=) 2015-05-07
JP6315343B2 true JP6315343B2 (ja) 2018-04-25

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JP2014558009A Active JP6315343B2 (ja) 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法

Country Status (3)

Country Link
US (1) US9798249B2 (https=)
JP (1) JP6315343B2 (https=)
WO (1) WO2013123973A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
CA2941274C (en) 2014-03-04 2020-02-25 Novadaq Technologies Inc. Spatial and spectral filtering apertures and optical imaging systems including the same
CN106605164B (zh) 2014-03-04 2020-04-24 诺瓦达克技术公司 用于宽带成像的中继透镜系统
JP2018505537A (ja) * 2014-12-22 2018-02-22 エムエージー インストルメント インコーポレイテッド Ｌｅｄをヒートシンクに直接実装した効率改善照明装置
CN108431649B (zh) * 2015-08-31 2021-08-24 史赛克欧洲运营有限公司 偏振依赖滤波器、使用其的系统以及相关联的工具包和方法
CN105444996A (zh) * 2015-11-25 2016-03-30 上海小糸车灯有限公司 一种皮纹散射检测支架
DE102017208340A1 (de) * 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission
CN112639612B (zh) * 2018-07-17 2024-12-06 卡尔蔡司Sms有限公司 决定要引入光刻掩模的基板的一个或多个像素的效应的方法和设备
WO2025234336A1 (ja) * 2024-05-10 2025-11-13 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用ガラス基板およびｅｕｖリソグラフィ用マスクブランク

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6728021B1 (en) * 2002-11-18 2004-04-27 Carl Zeiss Smt Ag Optical component and method of inducing a desired alteration of an optical property therein
US7289223B2 (en) 2003-01-31 2007-10-30 Carl Zeiss Smt Ag Method and apparatus for spatially resolved polarimetry
JP4018564B2 (ja) * 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法
DE60315986T2 (de) * 2003-10-09 2008-05-21 Asml Netherlands B.V. Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE102004011733A1 (de) 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
JP5159027B2 (ja) * 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
EP2030070A1 (en) * 2006-06-16 2009-03-04 Carl Zeiss SMT AG Projection objective of a microlithographic projection exposure apparatus
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
KR100809329B1 (ko) * 2006-09-08 2008-03-07 삼성전자주식회사 광학계의 수차를 보정하기 위한 미러를 포함하는포토리소그래피 장치 및 수차 보정부를 포함하는 미러
JP5240190B2 (ja) 2007-04-09 2013-07-17 旭硝子株式会社 位相差板の製造方法
DE102008009601A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
JP5722074B2 (ja) * 2010-02-25 2015-05-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
DE102011076435B4 (de) * 2011-05-25 2013-09-19 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik

Also Published As

Publication number Publication date
WO2013123973A1 (en) 2013-08-29
JP2015509662A (ja) 2015-03-30
US20140347646A1 (en) 2014-11-27
US9798249B2 (en) 2017-10-24

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