JP2016524182A5 - - Google Patents
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- Publication number
- JP2016524182A5 JP2016524182A5 JP2016513362A JP2016513362A JP2016524182A5 JP 2016524182 A5 JP2016524182 A5 JP 2016524182A5 JP 2016513362 A JP2016513362 A JP 2016513362A JP 2016513362 A JP2016513362 A JP 2016513362A JP 2016524182 A5 JP2016524182 A5 JP 2016524182A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- intensity
- object field
- illumination light
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims description 146
- 238000013461 design Methods 0.000 claims description 110
- 238000009826 distribution Methods 0.000 claims description 104
- 239000000758 substrate Substances 0.000 claims description 54
- 230000003287 optical effect Effects 0.000 claims description 26
- 238000001459 lithography Methods 0.000 claims description 24
- 238000003384 imaging method Methods 0.000 claims description 16
- 238000012937 correction Methods 0.000 description 47
- 230000000007 visual effect Effects 0.000 description 47
- 238000000034 method Methods 0.000 description 25
- 238000006073 displacement reaction Methods 0.000 description 18
- 230000006978 adaptation Effects 0.000 description 13
- 230000008569 process Effects 0.000 description 11
- 210000001747 pupil Anatomy 0.000 description 10
- 238000004364 calculation method Methods 0.000 description 9
- 230000008901 benefit Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000001419 dependent effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000010354 integration Effects 0.000 description 5
- 230000003679 aging effect Effects 0.000 description 4
- 210000002381 plasma Anatomy 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000012935 Averaging Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011295 pitch Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013209093.5A DE102013209093A1 (de) | 2013-05-16 | 2013-05-16 | Verfahren zum Herstellen einer Maske für ein lithographisches Beleuchtungssystem |
| DE102013209093.5 | 2013-05-16 | ||
| PCT/EP2014/059944 WO2014184292A1 (de) | 2013-05-16 | 2014-05-15 | System zum herstellen von strukturen in einem substrat |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016524182A JP2016524182A (ja) | 2016-08-12 |
| JP2016524182A5 true JP2016524182A5 (https=) | 2018-11-22 |
| JP6502325B2 JP6502325B2 (ja) | 2019-04-17 |
Family
ID=50729508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016513362A Active JP6502325B2 (ja) | 2013-05-16 | 2014-05-15 | 基板内に構造を生成するためのシステム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9880474B2 (https=) |
| JP (1) | JP6502325B2 (https=) |
| DE (1) | DE102013209093A1 (https=) |
| WO (1) | WO2014184292A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017200637A1 (de) | 2017-01-17 | 2017-11-02 | Carl Zeiss Smt Gmbh | Mikrolithographisches Belichtungsverfahren |
| JP7446069B2 (ja) * | 2019-09-03 | 2024-03-08 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
| CN114746806A (zh) * | 2019-11-19 | 2022-07-12 | Asml控股股份有限公司 | 使用非均匀照射强度分布进行优化 |
| KR20220090668A (ko) | 2020-12-22 | 2022-06-30 | 삼성디스플레이 주식회사 | 임계선폭 오차 관리방법 및 이를 이용한 포토마스크 제조방법 |
| EP4063955A1 (en) * | 2021-03-25 | 2022-09-28 | ASML Netherlands B.V. | Lithographic apparatus and method for illumination uniformity correction |
| WO2022221540A1 (en) * | 2021-04-14 | 2022-10-20 | Advanced Growing Resources Inc. | Optical spectroscopy scanner |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0952491A3 (en) * | 1998-04-21 | 2001-05-09 | Asm Lithography B.V. | Lithography apparatus |
| JP3762102B2 (ja) * | 1998-06-04 | 2006-04-05 | キヤノン株式会社 | 走査型投影露光装置及びそれを用いたデバイスの製造方法 |
| JP4098502B2 (ja) * | 2001-07-30 | 2008-06-11 | 株式会社東芝 | マスクの製造方法とｌｓｉの製造方法 |
| DE10214247A1 (de) * | 2002-03-26 | 2003-10-23 | Infineon Technologies Ag | Verfahren zur Korrektur von Maskenstrukturen |
| US7173688B2 (en) * | 2004-12-28 | 2007-02-06 | Asml Holding N.V. | Method for calculating an intensity integral for use in lithography systems |
| JP2007207821A (ja) * | 2006-01-31 | 2007-08-16 | Nikon Corp | 可変スリット装置、照明装置、露光装置、露光方法及びデバイスの製造方法 |
| JP4797764B2 (ja) * | 2006-04-14 | 2011-10-19 | 株式会社ニコン | 露光装置の較正方法及び露光装置 |
| DE102008001553B4 (de) * | 2008-05-05 | 2015-04-30 | Carl Zeiss Smt Gmbh | Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage |
| JP2011197520A (ja) * | 2010-03-23 | 2011-10-06 | Toppan Printing Co Ltd | フォトマスク製造方法 |
| JP5556505B2 (ja) * | 2010-08-27 | 2014-07-23 | 富士通セミコンダクター株式会社 | マスクパターン補正方法及びマスクパターン補正装置 |
| NL2007306A (en) * | 2010-09-23 | 2012-03-26 | Asml Netherlands Bv | Source polarization optimization. |
| DE102011005881A1 (de) | 2011-03-22 | 2012-05-03 | Carl Zeiss Smt Gmbh | Verfahren zur Einstellung eines Beleuchtungssystems einer Projektionsbelichtungsanlage für die Projektionslithographie |
| DE102011006189A1 (de) * | 2011-03-28 | 2012-06-06 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Belichten einer lichtempfindlichen Schicht |
| JP6168614B2 (ja) | 2011-12-28 | 2017-07-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィのためのマスク及び走査投影露光方法 |
| DE102012207572A1 (de) * | 2012-05-08 | 2013-05-08 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik |
-
2013
- 2013-05-16 DE DE102013209093.5A patent/DE102013209093A1/de not_active Ceased
-
2014
- 2014-05-15 WO PCT/EP2014/059944 patent/WO2014184292A1/de not_active Ceased
- 2014-05-15 JP JP2016513362A patent/JP6502325B2/ja active Active
-
2015
- 2015-11-12 US US14/939,536 patent/US9880474B2/en not_active Expired - Fee Related
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