JP2015509662A5 - - Google Patents

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Publication number
JP2015509662A5
JP2015509662A5 JP2014558009A JP2014558009A JP2015509662A5 JP 2015509662 A5 JP2015509662 A5 JP 2015509662A5 JP 2014558009 A JP2014558009 A JP 2014558009A JP 2014558009 A JP2014558009 A JP 2014558009A JP 2015509662 A5 JP2015509662 A5 JP 2015509662A5
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Japan
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optical element
retardation
area
defect
partial
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JP2014558009A
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Japanese (ja)
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JP2015509662A (ja
JP6315343B2 (ja
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Priority claimed from PCT/EP2012/052909 external-priority patent/WO2013123973A1/en
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Publication of JP2015509662A5 publication Critical patent/JP2015509662A5/ja
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JP2014558009A 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法 Active JP6315343B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2012/052909 WO2013123973A1 (en) 2012-02-21 2012-02-21 Method and apparatus for compensating at least one defect of an optical system

Publications (3)

Publication Number Publication Date
JP2015509662A JP2015509662A (ja) 2015-03-30
JP2015509662A5 true JP2015509662A5 (https=) 2015-05-07
JP6315343B2 JP6315343B2 (ja) 2018-04-25

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JP2014558009A Active JP6315343B2 (ja) 2012-02-21 2012-02-21 光学系の少なくとも１つの欠陥を補償する方法

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US (1) US9798249B2 (https=)
JP (1) JP6315343B2 (https=)
WO (1) WO2013123973A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
CA2941274C (en) 2014-03-04 2020-02-25 Novadaq Technologies Inc. Spatial and spectral filtering apertures and optical imaging systems including the same
CN106605164B (zh) 2014-03-04 2020-04-24 诺瓦达克技术公司 用于宽带成像的中继透镜系统
JP2018505537A (ja) * 2014-12-22 2018-02-22 エムエージー インストルメント インコーポレイテッド Ｌｅｄをヒートシンクに直接実装した効率改善照明装置
CN108431649B (zh) * 2015-08-31 2021-08-24 史赛克欧洲运营有限公司 偏振依赖滤波器、使用其的系统以及相关联的工具包和方法
CN105444996A (zh) * 2015-11-25 2016-03-30 上海小糸车灯有限公司 一种皮纹散射检测支架
DE102017208340A1 (de) * 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission
CN112639612B (zh) * 2018-07-17 2024-12-06 卡尔蔡司Sms有限公司 决定要引入光刻掩模的基板的一个或多个像素的效应的方法和设备
WO2025234336A1 (ja) * 2024-05-10 2025-11-13 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用ガラス基板およびｅｕｖリソグラフィ用マスクブランク

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6728021B1 (en) * 2002-11-18 2004-04-27 Carl Zeiss Smt Ag Optical component and method of inducing a desired alteration of an optical property therein
US7289223B2 (en) 2003-01-31 2007-10-30 Carl Zeiss Smt Ag Method and apparatus for spatially resolved polarimetry
JP4018564B2 (ja) * 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法
DE60315986T2 (de) * 2003-10-09 2008-05-21 Asml Netherlands B.V. Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE102004011733A1 (de) 2004-03-04 2005-09-22 Carl Zeiss Smt Ag Transmissionsfiltervorrichtung
JP5159027B2 (ja) * 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
EP2030070A1 (en) * 2006-06-16 2009-03-04 Carl Zeiss SMT AG Projection objective of a microlithographic projection exposure apparatus
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
KR100809329B1 (ko) * 2006-09-08 2008-03-07 삼성전자주식회사 광학계의 수차를 보정하기 위한 미러를 포함하는포토리소그래피 장치 및 수차 보정부를 포함하는 미러
JP5240190B2 (ja) 2007-04-09 2013-07-17 旭硝子株式会社 位相差板の製造方法
DE102008009601A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
JP5722074B2 (ja) * 2010-02-25 2015-05-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
DE102011076435B4 (de) * 2011-05-25 2013-09-19 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik

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