JP6304582B2 - 波長可変レーザの制御方法 - Google Patents
波長可変レーザの制御方法 Download PDFInfo
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- JP6304582B2 JP6304582B2 JP2014014781A JP2014014781A JP6304582B2 JP 6304582 B2 JP6304582 B2 JP 6304582B2 JP 2014014781 A JP2014014781 A JP 2014014781A JP 2014014781 A JP2014014781 A JP 2014014781A JP 6304582 B2 JP6304582 B2 JP 6304582B2
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- wavelength
- tunable laser
- etalon
- temperature
- oscillation
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- 238000000034 method Methods 0.000 title claims description 20
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims description 45
- 230000010355 oscillation Effects 0.000 claims description 26
- 238000002834 transmittance Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 33
- 239000010408 film Substances 0.000 description 27
- 230000003287 optical effect Effects 0.000 description 22
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- 238000010586 diagram Methods 0.000 description 7
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- 239000010931 gold Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910010282 TiON Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
- H01S5/0687—Stabilising the frequency of the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0612—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02415—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling by using a thermo-electric cooler [TEC], e.g. Peltier element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0287—Facet reflectivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0617—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium using memorised or pre-programmed laser characteristics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1209—Sampled grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1206—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers having a non constant or multiplicity of periods
- H01S5/1212—Chirped grating
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014014781A JP6304582B2 (ja) | 2013-10-30 | 2014-01-29 | 波長可変レーザの制御方法 |
| US14/528,919 US9564735B2 (en) | 2013-10-30 | 2014-10-30 | Method for controlling wavelength tunable laser |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013226014 | 2013-10-30 | ||
| JP2013226014 | 2013-10-30 | ||
| JP2014014781A JP6304582B2 (ja) | 2013-10-30 | 2014-01-29 | 波長可変レーザの制御方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015111644A JP2015111644A (ja) | 2015-06-18 |
| JP2015111644A5 JP2015111644A5 (enExample) | 2017-03-02 |
| JP6304582B2 true JP6304582B2 (ja) | 2018-04-04 |
Family
ID=52995416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014014781A Active JP6304582B2 (ja) | 2013-10-30 | 2014-01-29 | 波長可変レーザの制御方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US9564735B2 (enExample) |
| JP (1) | JP6304582B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015050284A (ja) * | 2013-08-30 | 2015-03-16 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの制御方法 |
| JP6292499B2 (ja) * | 2013-08-30 | 2018-03-14 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの制御方法 |
| JP7019283B2 (ja) * | 2016-02-15 | 2022-02-15 | 古河電気工業株式会社 | 波長可変型レーザモジュールおよびその波長制御方法 |
| JP6821901B2 (ja) | 2016-07-11 | 2021-01-27 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザの駆動条件設定方法及び波長可変レーザシステム |
| JP7207651B2 (ja) * | 2018-12-27 | 2023-01-18 | 住友電工デバイス・イノベーション株式会社 | 波長可変レーザ装置の制御方法 |
| CN112397996B (zh) * | 2019-08-16 | 2022-04-15 | 中国移动通信有限公司研究院 | 波长调整方法、装置及光模块 |
| JP7488053B2 (ja) * | 2020-02-06 | 2024-05-21 | 古河電気工業株式会社 | レーザ装置およびその制御方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6291813B1 (en) * | 1999-06-07 | 2001-09-18 | Agere Systems Optoelectronics Guardian Corp. | Method and system for deriving a control signal for a frequency stabilized optical source |
| US6400737B1 (en) * | 1999-12-14 | 2002-06-04 | Agere Systems Guardian Corp. | Automatic closed-looped gain adjustment for a temperature tuned, wavelength stabilized laser source in a closed-loop feedback control system |
| EP1291988A1 (en) * | 2001-09-10 | 2003-03-12 | Intune Technologies Limited | Frequency locking of multi-section laser diodes |
| US6931038B2 (en) * | 2002-07-08 | 2005-08-16 | Technology Asset Trust | Wavelength locked semiconductor laser module |
| JP4943255B2 (ja) | 2007-07-20 | 2012-05-30 | 住友電工デバイス・イノベーション株式会社 | 半導体レーザの制御方法 |
| JP2009081512A (ja) * | 2007-09-25 | 2009-04-16 | Fujitsu Ltd | 光送信装置および設定値決定方法 |
| US8290376B2 (en) * | 2008-12-05 | 2012-10-16 | Sumitomo Electric Industries, Ltd. | Optical receiver for the WDM system and the method for controlling the same |
| JP5229163B2 (ja) * | 2009-09-01 | 2013-07-03 | 富士通オプティカルコンポーネンツ株式会社 | 波長制御方法および光送信装置 |
| JP2011108910A (ja) * | 2009-11-19 | 2011-06-02 | Sumitomo Electric Ind Ltd | 光半導体装置 |
-
2014
- 2014-01-29 JP JP2014014781A patent/JP6304582B2/ja active Active
- 2014-10-30 US US14/528,919 patent/US9564735B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015111644A (ja) | 2015-06-18 |
| US20150117479A1 (en) | 2015-04-30 |
| US9564735B2 (en) | 2017-02-07 |
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