JP6283092B2 - 多面体オリゴマー状シルセスキオキサンナノ結晶安定化リガンド - Google Patents

多面体オリゴマー状シルセスキオキサンナノ結晶安定化リガンド Download PDF

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JP6283092B2
JP6283092B2 JP2016501860A JP2016501860A JP6283092B2 JP 6283092 B2 JP6283092 B2 JP 6283092B2 JP 2016501860 A JP2016501860 A JP 2016501860A JP 2016501860 A JP2016501860 A JP 2016501860A JP 6283092 B2 JP6283092 B2 JP 6283092B2
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quantum dot
ligand
binding
alkylene
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JP2016521251A (ja
JP2016521251A5 (enExample
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ウィリアム・ピー・フリーマン
ポール・ティー・フルタ
ロバート・ダブロー
ジェイ・ウォラス・パース
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ナノシス・インク．
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/88—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing selenium, tellurium or unspecified chalcogen elements
    • C09K11/881—Chalcogenides
    • C09K11/883—Chalcogenides with zinc or cadmium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
    • C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Luminescent Compositions (AREA)
  • Silicon Polymers (AREA)
JP2016501860A 2013-03-14 2014-03-13 多面体オリゴマー状シルセスキオキサンナノ結晶安定化リガンド Active JP6283092B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361781392P 2013-03-14 2013-03-14
US61/781,392 2013-03-14
PCT/US2014/025486 WO2014159936A1 (en) 2013-03-14 2014-03-13 Polyhedral oligomeric silsesquioxane nanocrystal stabilization ligands

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JP2016521251A JP2016521251A (ja) 2016-07-21
JP2016521251A5 JP2016521251A5 (enExample) 2017-04-20
JP6283092B2 true JP6283092B2 (ja) 2018-02-21

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US (1) US9133394B2 (enExample)
EP (1) EP2970341B1 (enExample)
JP (1) JP6283092B2 (enExample)
KR (1) KR102204761B1 (enExample)
CN (1) CN105143235B (enExample)
CA (1) CA2905913C (enExample)
WO (1) WO2014159936A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250051054A (ko) 2022-08-23 2025-04-16 신에쓰 가가꾸 고교 가부시끼가이샤 잉크 조성물, 잉크 조성물의 제조방법 및 컬러필터의 제조방법
KR20250107820A (ko) 2022-11-11 2025-07-14 신에쓰 가가꾸 고교 가부시끼가이샤 경화성 수지 조성물

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9574043B2 (en) 2009-01-12 2017-02-21 University Of Massachusetts Lowell Polyisobutylene-based polyurethanes
US9139770B2 (en) * 2012-06-22 2015-09-22 Nanosys, Inc. Silicone ligands for stabilizing quantum dot films
CN105247010B (zh) 2013-03-14 2017-10-24 纳米系统公司 无溶剂的量子点交换方法
JP5895958B2 (ja) * 2014-02-20 2016-03-30 横浜ゴム株式会社 偏波保持光ファイバー用接着剤組成物
US10442823B2 (en) 2014-10-07 2019-10-15 Nbd Nanotechnologies, Inc. Functionalized F-POSS monomer compositions and uses thereof
JP2018510862A (ja) * 2015-03-09 2018-04-19 エヌビーディー ナノテクノロジーズ， インコーポレイテッドＮｂｄ Ｎａｎｏｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． 官能化ｆ−ｐｏｓｓモノマー組成物およびその使用
US10056533B2 (en) 2015-12-02 2018-08-21 Nanosys, Inc. Quantum dot encapsulation techniques
TW201729901A (zh) 2015-12-02 2017-09-01 奈米系統股份有限公司 於顯示裝置中基於量子點之色轉換層
JP6621226B2 (ja) * 2016-02-15 2019-12-18 国立研究開発法人産業技術総合研究所 シロキサン及びその製造方法
JP7202352B2 (ja) * 2017-07-11 2023-01-11 ティーシーエル テクノロジー グループ コーポレーション 量子ドット及び量子ドットの製造方法
KR102712599B1 (ko) * 2017-10-17 2024-10-02 엘지디스플레이 주식회사 발광체, 이를 포함하는 발광 필름, 발광다이오드 및 발광장치
CN109671837B (zh) * 2017-10-17 2021-08-10 乐金显示有限公司 发光体以及包括其的发光膜、发光二极管和发光装置
JP6959119B2 (ja) * 2017-12-04 2021-11-02 信越化学工業株式会社 量子ドット及びその製造方法、並びに樹脂組成物、波長変換材料、発光素子
KR102713384B1 (ko) 2018-01-11 2024-10-08 삼성전자주식회사 양자점 집단과 이를 포함하는 조성물
US11472911B2 (en) 2018-01-17 2022-10-18 Cardiac Pacemakers, Inc. End-capped polyisobutylene polyurethane
CN108832014B (zh) * 2018-06-22 2020-12-25 南京邮电大学通达学院 基于CdTe/CdS量子点的发光二极管及其制备方法
CN109735203B (zh) * 2018-12-25 2021-01-29 陕西科技大学 一种半封闭笼状三官能环氧醚基poss组合料、涂料及制备方法
KR102121055B1 (ko) 2019-06-07 2020-06-11 주식회사 신아티앤씨 카르복시기를 포함하는 (메타)아크릴레이트 구조의 양자점 리간드용 화합물, 상기 화합물로 형성된 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 화합물의 제조방법
KR102286274B1 (ko) 2019-06-07 2021-08-05 주식회사 신아티앤씨 카르복시기를 포함하는 (메타)아크릴레이트 구조의 양자점 리간드용 화합물, 상기 화합물로 형성된 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 화합물의 제조방법
KR102071688B1 (ko) 2019-06-07 2020-04-01 주식회사 신아티앤씨 티올기와, 하이드록시기 또는 카르복시기를 포함하는 양자점 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 양자점 리간드의 제조방법
KR102207329B1 (ko) 2020-01-06 2021-01-25 주식회사 신아티앤씨 티올기와, 하이드록시기 또는 카르복시기를 포함하는 양자점 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 양자점 리간드의 제조방법
KR102174457B1 (ko) 2020-06-03 2020-11-04 주식회사 신아티앤씨 카르복시기를 포함하는 (메타)아크릴레이트 구조의 양자점 리간드용 화합물, 상기 화합물로 형성된 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 화합물의 제조방법
KR102207330B1 (ko) 2020-06-03 2021-01-28 주식회사 신아티앤씨 카르복시기를 포함하는 (메타)아크릴레이트 구조의 양자점 리간드용 화합물, 상기 화합물로 형성된 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 화합물의 제조방법
KR102207331B1 (ko) 2020-06-03 2021-01-28 주식회사 신아티앤씨 카르복시기를 포함하는 (메타)아크릴레이트 구조의 양자점 리간드용 화합물, 상기 화합물로 형성된 리간드를 포함하는 양자점 입자, 상기 양자점 입자를 포함하는 양자점 입자 조성물, 및 상기 화합물의 제조방법
KR20220169985A (ko) * 2021-06-21 2022-12-29 삼성디스플레이 주식회사 양자점, 상기 양자점의 제조방법, 상기 양자점을 포함한 조성물, 상기 양자점을 포함한 광학 부재 및 상기 양자점을 포함한 전자 장치
JP7335520B2 (ja) * 2021-06-21 2023-08-30 日亜化学工業株式会社 波長変換部材、発光装置及び画像表示装置
JP7734616B2 (ja) * 2022-03-30 2025-09-05 日鉄ケミカル＆マテリアル株式会社 アミノ化合物、当該アミノ化合物を用いたポリアミド酸及びポリイミド、並びにこれらの製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6607829B1 (en) 1997-11-13 2003-08-19 Massachusetts Institute Of Technology Tellurium-containing nanocrystalline materials
US6322901B1 (en) 1997-11-13 2001-11-27 Massachusetts Institute Of Technology Highly luminescent color-selective nano-crystalline materials
US6501091B1 (en) 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
US6225198B1 (en) 2000-02-04 2001-05-01 The Regents Of The University Of California Process for forming shaped group II-VI semiconductor nanocrystals, and product formed using process
DE60143622D1 (de) 2000-10-04 2011-01-20 Univ Arkansas Synthese von kolloidalen metall chalcogenide nanokristallen
DE10220853A1 (de) * 2002-05-08 2003-11-20 Creavis Tech & Innovation Gmbh Funktionalisierte polyedrische oligomere Silizium-Sauerstoff-Cluster als Vernetzer
CA2497451A1 (en) 2002-09-05 2004-03-18 Nanosys, Inc. Organic species that facilitate charge transfer to or from nanostructures
WO2004023527A2 (en) 2002-09-05 2004-03-18 Nanosys, Inc. Nanostructure and nanocomposite based compositions and photovoltaic devices
US7572393B2 (en) 2002-09-05 2009-08-11 Nanosys Inc. Organic species that facilitate charge transfer to or from nanostructures
US7053167B2 (en) * 2002-09-13 2006-05-30 Chisso Corporation Silsesquioxane derivative having functional group
US7319129B2 (en) * 2002-09-13 2008-01-15 Chisso Corporation Silsesquioxane derivative and process for producing the same
JP2005023199A (ja) * 2003-07-02 2005-01-27 Chisso Corp 機能性超薄膜およびその形成方法
WO2005067524A2 (en) 2004-01-15 2005-07-28 Nanosys, Inc. Nanocrystal doped matrixes
US7267865B2 (en) 2004-02-20 2007-09-11 Saint-Gobain Performance Plastics Corporation Draw resonant resistant multilayer films
US8563133B2 (en) 2004-06-08 2013-10-22 Sandisk Corporation Compositions and methods for modulation of nanostructure energy levels
TW201341440A (zh) * 2004-06-08 2013-10-16 Sandisk Corp 奈米結構之沉積後包封：併入該包封體之組成物、裝置及系統
US8343575B2 (en) 2008-12-30 2013-01-01 Nanosys, Inc. Methods for encapsulating nanocrystals and resulting compositions
US8283412B2 (en) * 2009-05-01 2012-10-09 Nanosys, Inc. Functionalized matrices for dispersion of nanostructures
KR102098682B1 (ko) 2010-11-10 2020-05-22 나노시스, 인크. 양자 도트 필름들, 조명 디바이스들, 및 조명 방법들

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250051054A (ko) 2022-08-23 2025-04-16 신에쓰 가가꾸 고교 가부시끼가이샤 잉크 조성물, 잉크 조성물의 제조방법 및 컬러필터의 제조방법
KR20250107820A (ko) 2022-11-11 2025-07-14 신에쓰 가가꾸 고교 가부시끼가이샤 경화성 수지 조성물

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CN105143235B (zh) 2018-06-08
EP2970341B1 (en) 2020-07-29
EP2970341A1 (en) 2016-01-20
JP2016521251A (ja) 2016-07-21
US20140275598A1 (en) 2014-09-18
KR102204761B1 (ko) 2021-01-18
CN105143235A (zh) 2015-12-09
CA2905913A1 (en) 2014-10-02
EP2970341A4 (en) 2016-09-07
WO2014159936A1 (en) 2014-10-02
CA2905913C (en) 2021-07-13
KR20150128988A (ko) 2015-11-18
US9133394B2 (en) 2015-09-15

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